Patents by Inventor Jakub NALASKOWSKI

Jakub NALASKOWSKI has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Mixed abrasive polishing compositions
    Patent number: 9340706
    Abstract: The invention provides chemical-mechanical polishing compositions and methods of chemically-mechanically polishing a substrate with the chemical-mechanical polishing compositions. The polishing compositions comprise first abrasive particles, wherein the first abrasive particles are ceria particles, second abrasive particles, wherein the second abrasive particles are ceria particles, surface-modified silica particles, or organic particles, a pH-adjusting agent, and an aqueous carrier. The polishing compositions also exhibit multimodal particle size distributions.
    Type: Grant
    Filed: October 10, 2013
    Date of Patent: May 17, 2016
    Assignee: Cabot Microelectronics Corporation
    Inventors: Brian Reiss, Jakub Nalaskowski, Viet Lam, Renhe Jia, Jeffrey Dysard
  • MIXED ABRASIVE POLISHING COMPOSITIONS
    Publication number: 20150102012
    Abstract: The invention provides chemical-mechanical polishing compositions and methods of chemically-mechanically polishing a substrate with the chemical-mechanical polishing compositions. The polishing compositions comprise first abrasive particles, wherein the first abrasive particles are ceria particles, second abrasive particles, wherein the second abrasive particles are ceria particles, surface-modified silica particles, or organic particles, a pH-adjusting agent, and an aqueous carrier. The polishing compositions also exhibit multimodal particle size distributions.
    Type: Application
    Filed: October 10, 2013
    Publication date: April 16, 2015
    Inventors: Brian REISS, Jakub NALASKOWSKI, Viet LAM, Renhe JIA, Jeffrey DYSARD