Patents by Inventor James A. Jubinsky

James A. Jubinsky has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Structure and fabrication of SiCr microfuses
    Patent number: 5340775
    Abstract: A SiCr microfuse, deletable either by electrical voltage pulses or by laser pulses, for rerouting the various components in an integrated circuit, as where redundancy in array structures is implemented, and the method of fabricating same, at any wiring level of the chip, by utilizing a direct resist masking of the SiCr fuse layer to eliminate problems of mask damage and residual metal adjacent the fuse.
    Type: Grant
    Filed: November 9, 1993
    Date of Patent: August 23, 1994
    Assignee: International Business Machines Corporation
    Inventors: Roy A. Carruthers, Fernand J. Dorleans, John A. Fitzsimmons, Richard Flitsch, James A. Jubinsky, Gerald R. Larsen, Geraldine C. Schwartz, Paul J. Tsang, Robert W. Zielinski
  • SiCr microfuses
    Patent number: 5285099
    Abstract: A SiCr microfuse, deletable either by electrical voltage pulses or by laser pulses, for rerouting the various components in an integrated circuit, as where redundancy in array structures is implemented, and the method of fabricating same, at any wiring level of the chip, by utilizing a direct resist masking of the SiCr fuse layer to eliminate problems of mask damage and residual metal adjacent the fuse.
    Type: Grant
    Filed: December 15, 1992
    Date of Patent: February 8, 1994
    Assignee: International Business Machines Corporation
    Inventors: Roy A. Carruthers, Fernand J. Dorleans, John A. Fitzsimmons, Richard Flitsch, James A. Jubinsky, Gerald R. Larsen, Geraldine C. Schwartz, Paul J. Tsang, Robert W. Zielinski
  • Resists with enhanced sensitivity and contrast
    Patent number: 5227280
    Abstract: A PMGI bilayer resist for integrated circuit fabrication having increased sensitivity to light and formed by the addition of cyclic anhydrides to the resist and the formation of an accompanying bilayer resist structure of a portable conforming mask having a desirable undercut profile for lift-off of patterned metallic circuitry.
    Type: Grant
    Filed: September 4, 1991
    Date of Patent: July 13, 1993
    Assignee: International Business Machines Corporation
    Inventors: James A. Jubinsky, Steven M. Katz, Christopher F. Lyons, Wayne M. Moreau