Abstract: A metrology target is designed for measuring a feature at the bottom of a trench in a device under test, such as a tungsten recess vertical profile in a wordline in a three-dimensional (3D) NAND. The metrology target follows the design rules for the device under test and includes a tier stack with a plurality of tier stack pairs including, each including a conductor layer, such as tungsten, and an insulator layer, such as silicon dioxide and a trench that extends through the tier stack pairs. The metrology target includes a via that extends through the tier stack pairs and is positioned a lateral distance to the trench to promote access of light to a bottom of the trench, via plasmonic resonance, for measurement of a characteristic of the trench, such as the tungsten recess at the bottom of the wordline slit.

Abstract: The present disclosure is directed to opposables including a body having a plurality of cavities disposed therein. Each cavity can be designed to contain one or more reagents, liquids, or fluids which may be applied to a specimen-bearing surface. In some embodiments, the cavities include one or more reagent chambers, the reagent chambers can have one or more seals such that the reagents, liquids, or fluids contained therein may be stored and released to the specimen-bearing surface.

Abstract: The present disclosure is directed to opposables including a body having a plurality of cavities disposed therein. Each cavity can be designed to contain one or more reagents, liquids, or fluids which may be applied to a specimen-bearing surface. In some embodiments, the cavities include one or more reagent chambers, the reagent chambers can have one or more seals such that the reagents, liquids, or fluids contained therein may be stored and released to the specimen-bearing surface.

Abstract: A non-destructive opto-acoustic metrology device detects the presence and location of non-uniformities in a film stack that includes a large number, e.g., 50 or more, transparent layers. A transducer layer at the bottom of the film stack produces an acoustic wave in response to an excitation beam. A probe beam is reflected from the layer interfaces of the film stack and the acoustic wave to produce an interference signal that encodes data in a time domain from destructive and constructive interference as the acoustic wave propagates upward in the film stack. The data may be analyzed across the time domain to determine the presence and location of one or more non-uniformities in the film stack. An acoustic metrology target may be produced with a transducer layer configured to generate an acoustic wave with a desired acoustic profile based on characteristics of the film stack.

Abstract: Characteristics of a standard logic cell, e.g., a random logic cell, are determined using an effective cell approximation. The effective cell approximation is smaller than the standard logic cell and represents the density of lines and spaces of the standard logic cell. The effective cell approximation may be produced based on a selected area from the standard logic cell and include the same non-periodic patterns as the selected area. The effective cell approximation, alternatively, may represent non-periodic patterns in the standard logic cell using periodic patterns having a same density of lines and spaces as found in the standard logic cell. A structure on the sample, such as a logic cell or a metrology target produced based on the effective cell approximation is measured to acquire data, which is compared to the data for the effective cell approximation to determine a characteristic of the standard logic cell.

Abstract: Overlay is determined for a device using signals measured from the device and a signal response to overlay determined from a plurality of calibration targets. Each calibration target has the same design as the device, but includes a known overlay shift. The calibration targets may be located in a scribe line, within a product area on the wafer, or on a separate calibration wafer. Each calibration target may have a different overlay shift, including zero overlay shift. The device may serve as a calibration target with zero overlay shift. The overlay shift may be in two orthogonal directions. The signal response to overlay may be determined based on a set of signals obtained from the calibration targets. A second set of signals may then be obtained from the device and the overlay determined based on the second set of signals and the determined signal response to overlay.

Abstract: A non-destructive opto-acoustic metrology device detects the presence and location of non-uniformities in a film stack that includes a large number, e.g., 50 or more, transparent layers. A transducer layer at the bottom of the film stack produces an acoustic wave in response to an excitation beam. A probe beam is reflected from the layer interfaces of the film stack and the acoustic wave to produce an interference signal that encodes data in a time domain from destructive and constructive interference as the acoustic wave propagates upward in the film stack. The data may be analyzed across the time domain to determine the presence and location of one or more non-uniformities in the film stack. An acoustic metrology target may be produced with a transducer layer configured to generate an acoustic wave with a desired acoustic profile based on characteristics of the film stack.

Abstract: A metrology target is designed for measuring a feature at the bottom of a trench in a device under test, such as a tungsten recess vertical profile in a wordline in a three-dimensional (3D) NAND. The metrology target follows the design rules for the device under test and includes a tier stack with a plurality of tier stack pairs including, each including a conductor layer, such as tungsten, and an insulator layer, such as silicon dioxide and a trench that extends through the tier stack pairs. The metrology target includes a via that extends through the tier stack pairs and is positioned a lateral distance to the trench to promote access of light to a bottom of the trench, via plasmonic resonance, for measurement of a characteristic of the trench, such as the tungsten recess at the bottom of the wordline slit.

Abstract: Grating-coupled surface plasmon resonance response of a calibration grating is used to calibrate the azimuth angle offset between a sample on the stage and the plane of incidence (POI) of the optical system of an optical metrology device. The calibration grating is configured to produce grating-coupled surface plasmon resonance in response to the optical characteristics of the optical metrology device. The calibration grating is coupled to the stage and positioned at a known azimuth angle with respect to the optical channel of the optical metrology device while the grating-coupled surface plasmon resonance response of the calibration grating is measured. The azimuth angle between an orientation of the calibration grating and the POI of the optical system is determined based on the grating-coupled surface plasmon resonance response. The determined azimuth angle may then be used to correct for an azimuth angle offset between the sample and the POI.

Abstract: Disclosed are specimen processing systems capable of processing specimens carried on slides. The specimen processing systems comprise opposables having at least one fluid control element. The fluid control elements may be positioned between spacers or gapping elements the opposable edges. The fluid control elements may comprise an edge, such as a beveled edge or a stepped edge, as described herein, and the edge may be continuous or segmented.

Abstract: A diesel exhaust fluid (DEF) tank for an off-road vehicle including a retaining bar configured to support the DEF tank and a channel molded into a side of the DEF tank. The channel is configured to interface with the retaining rod. The DEF tank further including a cutout formed within the channel, wherein the cutout establishes a gap between the retaining bar and a body of the DEF tank. The DEF tank also includes a drain channel molded into an exterior surface of the DEF tank. The drain channel is configured to provide structural support to the DEF tank, and the gap is configured to enable DEF flow downwardly into the drain channel without contacting the retaining bar.

Abstract: The present disclosure is directed to opposables including a body having a plurality of cavities disposed therein. Each cavity can be designed to contain one or more reagents, liquids, or fluids which may be applied to a specimen-bearing surface. In some embodiments, the cavities include one or more reagent chambers, the reagent chambers can have one or more seals such that the reagents, liquids, or fluids contained therein may be stored and released to the specimen-bearing surface.

Abstract: A metrology target is designed for monitoring variations in a multiple patterning process, such as a self-aligned doubled patterning (SADP) or self-aligned quadruple patterning (SAQP) process. The metrology target may include a plurality of sub-patterns. For example, the metrology target may be a three-dimensional (3D) target rather than a conventional two-dimensional line-space target design. The 3D target design includes multiple sub-patterns arranged with a pitch in a direction that is different than the pitch of the lines and trenches. The pitch of the sub-patterns is sufficient so that multiple sub-patterns are simultaneously within the field of measurement.

Abstract: Disclosed are specimen processing systems capable of processing specimens carried on slides. The specimen processing systems comprise opposables having at least one fluid control element. The fluid control elements may be positioned between spacers or gapping elements the opposable edges. The fluid control elements may comprise an edge, such as a beveled edge or a stepped edge, as described herein, and the edge may be continuous or segmented.

Abstract: A system includes a mounting assembly for a muffler of an off-road vehicle including a first mounting pad rotatably coupled to a first support. The first mounting pad is configured to rotate in a first direction and in a second direction, opposite the first direction, about a first rotation axis. The mounting assembly also includes a second mounting pad rotatably coupled to a second support. The second mounting pad is configured to rotate in the first direction and in the second direction about a second rotation axis. Moreover, the first and second mounting pads are laterally offset from one another relative to a longitudinal axis of the muffler, the first and second mounting pads are configured to support the muffler, and the first and second mounting pads are configured to independently rotate relative to the respective supports about the respective rotation axes.

Abstract: A diesel exhaust fluid (DEF) tank for an off-road vehicle including a retaining bar configured to support the DEF tank and a channel molded into a side of the DEF tank. The channel is configured to interface with the retaining rod. The DEF tank further including a cutout formed within the channel, wherein the cutout establishes a gap between the retaining bar and a body of the DEF tank. The DEF tank also includes a drain channel molded into an exterior surface of the DEF tank. The drain channel is configured to provide structural support to the DEF tank, and the gap is configured to enable DEF flow downwardly into the drain channel without contacting the retaining bar.

Abstract: A diesel exhaust fluid (DEF) tank for an off-road vehicle including a first conduit channel molded into an exterior surface of the DEF tank, at a first depth, in which the first conduit channel is configured to guide a first conduit along the exterior surface of the DEF tank. The DEF tank further including a second conduit channel molded into the exterior surface of the DEF tank at a second depth, different than the first depth, in which the second conduit channel is configured to guide a second conduit, and the first depth and the second depth are selected to create a vertical gap between the first conduit and the second conduit at an intersection of the conduits.

Abstract: An apparatus can be used to apply and remove fluid substances for processing biological samples. The fluid substances can be delivered between a first substrate and a second substrate. One substrate carries a specimen. A layer of the fluid substance is retained in a gap defined by the first and second substrates. One substrate is moved with respect to the second substrate to disperse the fluid substance in the gap.

Abstract: A metrology target is designed for monitoring variations in a multiple patterning process, such as a self-aligned doubled patterning (SADP) or self-aligned quadruple patterning (SAQP) process. The metrology target may include a plurality of sub-patterns. For example, the metrology target may be a three-dimensional (3D) target rather than a conventional two-dimensional line-space target design. The 3D target design includes multiple sub-patterns arranged with a pitch in a direction that is different than the pitch of the lines and trenches. The pitch of the sub-patterns is sufficient so that multiple sub-patterns are simultaneously within the field of measurement.

Abstract: A system includes a mounting assembly for a muffler of an off-road vehicle including a first mounting pad rotatably coupled to a first support. The first mounting pad is configured to rotate in a first direction and in a second direction, opposite the first direction, about a first rotation axis. The mounting assembly also includes a second mounting pad rotatably coupled to a second support. The second mounting pad is configured to rotate in the first direction and in the second direction about a second rotation axis. Moreover, the first and second mounting pads are laterally offset from one another relative to a longitudinal axis of the muffler, the first and second mounting pads are configured to support the muffler, and the first and second mounting pads are configured to independently rotate relative to the respective supports about the respective rotation axes.