Patents by Inventor James A. Liddle

James A. Liddle has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20200345277
    Abstract: A system and method for determining a patient force during a motion includes a tether adapted to be biased during a motion so that a tension force is applied. The tether is connected a motor and generates a tether force about the motor. The system controls the motor by generating a motor torque in a direction opposite the tether force. A recording module stores the motor torque at a plurality of intervals during the motion and a position of the tether. A display module generates a plot of a position of the patient versus a force generated by the patient. The position of the patient corresponds to the cumulative rotation of the shaft in the first direction about the axis of rotation of the shaft at each of the intervals. The force generated by the patient corresponds to the amount of motor torque at each of the intervals.
    Type: Application
    Filed: April 27, 2020
    Publication date: November 5, 2020
    Inventors: Eric Howard Ledet, Laura Jean Bentivegna, Christian Bossio, Benjamin James Liddle, Arthur L. Jenkins, III
  • Patent number: 9616255
    Abstract: A safety restraint anchor system may include, but is not limited to: a pole portion; a circumferential frame portion disposed about an axis of the pole; and at least one safety line anchor.
    Type: Grant
    Filed: May 11, 2012
    Date of Patent: April 11, 2017
    Assignee: Skytie, Inc.
    Inventor: James Liddle
  • Patent number: 7042645
    Abstract: A micro-lens array and a method for making are described. The micro-lens array includes a base element and a plurality of lenses formed of an epoxy and including nanoparticles. The micro-lens array is formed from a master micro-lens array, which is placed within a replica micro-lens making assembly. The master micro-lens array is coated with an anti-stiction material prior to having an elastomeric material positioned over it and cured. Removal of the elastomeric material provides a plurality of cavities, which are filled with an epoxy including nanoparticles. Curing of the epoxy finishes the fabrication of the micro-lens array. The lenses of the micro-lens array are formed from a colloidal suspension of nanoparticles and resin.
    Type: Grant
    Filed: December 22, 2003
    Date of Patent: May 9, 2006
    Assignees: Agere Systems Inc., Triquint Technology Holding Co.
    Inventors: Francis M. Houlihan, Madanagopal V. Kunnavakkam, James A. Liddle, Omkaram Nalamasu
  • Patent number: 6906846
    Abstract: A MEMS device and a method for making a MEMS device are described. The MEMS device includes a support member, an optical device, and a flexible member. In one aspect, the flexible member is formed separately from the support member and the optical device. In one aspect, the flexible member is dimensioned to enable flex in one direction while maintaining stiffness in two orthogonal directions. In one fabrication embodiment, the MEMS device is formed by etching an opening into the structural layer to create a structural support member and an optical device. The structural support member and optical device are mounted on a support substrate with a sacrificial layer. A flexible member is conformally deposited over the structural support member and the optical device and then etched. The sacrificial layer is partially etched away to leave the structural support member anchored to the support substrate.
    Type: Grant
    Filed: August 14, 2002
    Date of Patent: June 14, 2005
    Assignees: Triquint Technology Holding Co., Agere Systems, Inc.
    Inventors: Raymond A. Cirelli, James A. Liddle, Michael P. Schlax
  • Publication number: 20040130794
    Abstract: A micro-lens array and a method for making are described. The micro-lens array includes a base element and a plurality of lenses formed of an epoxy and including nanoparticles. The micro-lens array is formed from a master micro-lens array, which is placed within a replica micro-lens making assembly. The master micro-lens array is coated with an anti-stiction material prior to having an elastomeric material positioned over it and cured. Removal of the elastomeric material provides a plurality of cavities, which are filled with an epoxy including nanoparticles. Curing of the epoxy finishes the fabrication of the micro-lens array. The lenses of the micro-lens array are formed from a colloidal suspension of nanoparticles and resin.
    Type: Application
    Filed: December 22, 2003
    Publication date: July 8, 2004
    Inventors: Francis M. Houlihan, Madanagopal V. Kunnavakkam, James A. Liddle, Omkaram Nalamasu
  • Patent number: 6700708
    Abstract: A micro-lens array and a method for making are described. The micro-lens array includes a base element and a plurality of lenses formed of an epoxy and including nanoparticles. The micro-lens array is formed from a master micro-lens array, which is placed within a replica micro-lens making assembly. The master micro-lens array is coated with an anti-stiction material prior to having an elastomeric material positioned over it and cured. Removal of the elastomeric material provides a plurality of cavities, which are filled with an epoxy including nanoparticles. Curing of the epoxy finishes the fabrication of the micro-lens array. The lenses of the micro-lens array are formed from a colloidal suspension of nanoparticles and resin.
    Type: Grant
    Filed: May 30, 2002
    Date of Patent: March 2, 2004
    Assignees: Agere Systems, Inc., Triquint Technology Holding Co.
    Inventors: Francis M. Houlihan, Madanagopal V. Kunnavakkam, James A. Liddle, Omkaram Nalamasu
  • Publication number: 20040032639
    Abstract: A MEMS device and a method for making a MEMS device are described. The MEMS device includes a support member, an optical device, and a flexible member. In one aspect, the flexible member is formed separately from the support member and the optical device. In one aspect, the flexible member is dimensioned to enable flex in one direction while maintaining stiffness in two orthogonal directions. In one fabrication embodiment, the MEMS device is formed by etching an opening into the structural layer to create a structural support member and an optical device. The structural support member and optical device are mounted on a support substrate with a sacrificial layer. A flexible member is conformally deposited over the structural support member and the optical device and then etched. The sacrificial layer is partially etched away to leave the structural support member anchored to the support substrate.
    Type: Application
    Filed: August 14, 2002
    Publication date: February 19, 2004
    Inventors: Raymond A. Cirelli, James A. Liddle, Michael P. Schlax
  • Publication number: 20040022494
    Abstract: A fiber tap with configurable wavelength and polarization sensitivities and which may include a fiber connector is described. In one embodiment, light reflected from an interface between a pair of fibers is reflected into a photodetector with the option of an intermediate light pipe. In another embodiment, light reflected from an interface between a pair of fiber sections is reflected into an etched opening. The opening is filled with an index matching material and includes a mirrored surface. The reflected light is directed from the mirrored surface to a photodetector. In each embodiment, an assembly technique for tapping arrays of several fibers is supported.
    Type: Application
    Filed: August 5, 2002
    Publication date: February 5, 2004
    Inventors: James A. Liddle, Stuart T. Stanton, Kurt S. Werder
  • Publication number: 20030227688
    Abstract: A micro-lens array and a method for making are described. The micro-lens array includes a base element and a plurality of lenses formed of an epoxy and including nanoparticles. The micro-lens array is formed from a master micro-lens array, which is placed within a replica micro-lens making assembly. The master micro-lens array is coated with an anti-stiction material prior to having an elastomeric material positioned over it and cured. Removal of the elastomeric material provides a plurality of cavities, which are filled with an epoxy including nanoparticles. Curing of the epoxy finishes the fabrication of the micro-lens array. The lenses of the micro-lens array are formed from a colloidal suspension of nanoparticles and resin.
    Type: Application
    Filed: May 30, 2002
    Publication date: December 11, 2003
    Inventors: Francis M. Houlihan, Madanagopal V. Kunnavakkam, James A. Liddle, Omkaram Nalamasu
  • Patent number: 6528799
    Abstract: An electron beam lithographic apparatus has an electron gun providing a beam of accelerated electrons, a mask stage adapted to hold a mask in a path of the beam of accelerated electrons, and a workpiece stage adapted to hold a workpiece in a path of electrons that have passed through the mask. The electron gun has a cathode having an electron emission surface, an anode adapted to be connected to a high-voltage power supply to provide an electric field between the cathode and the anode to accelerate electrons emitted from the cathode toward the anode, and a current-density-profile control grid disposed between the anode and the cathode. The current-density-profile control grid is configured to provide an electron gun that produces an electron beam having a non-uniform current density profile.
    Type: Grant
    Filed: October 20, 2000
    Date of Patent: March 4, 2003
    Assignees: Lucent Technologies, Inc., eLITH LLC
    Inventors: Victor Katsap, James A. Liddle, Masis Mkrtchyan, Stuart T. Stanton
  • Patent number: 5561008
    Abstract: The invention is directed to a method and apparatus of projection lithography in which the contrast introduced into a radiation sensitive material caused by the proximity effect is effectively removed in a single exposure. Patterned radiation is transmitted through a lens system with at least one lens and a back focal plane filter. The back focal plane filter has at least two apertures, an image aperture and a proximity effect correction aperture. Patterned radiation is transmitted through the image aperture and introduces the desired image into the energy sensitive resist material. A portion of the inverse pattern radiation is transmitted through the proximity effect correction aperture and onto the energy sensitive resist material to effectively remove the contrast therein caused by the proximity effect.
    Type: Grant
    Filed: January 27, 1995
    Date of Patent: October 1, 1996
    Assignee: Lucent Technologies Inc.
    Inventors: Steven D. Berger, James A. Liddle, George P. Watson
  • Patent number: 5500312
    Abstract: A process for controlling the stress of multilayer films formed on a substrate is disclosed. A plurality of periods, each period having at least two layers of material wherein one of the layers of material is under compressive stress and the other layer of material is under tensile stress, are formed in a substrate. The stress in the multilayer film is controlled by selecting a thickness for the layer under compressive stress and a thickness for the layer under tensile stress that will provide a multilayer film of the desired stress. The thickness of each layer is about 0.5 nm to about 10 nm. Multilayer films with a stress of about -50 MPa to about 50 MPa are obtained using the present process. The present invention is also directed to masks with such multilayer films.
    Type: Grant
    Filed: October 11, 1994
    Date of Patent: March 19, 1996
    Assignee: AT&T Corp.
    Inventors: Lloyd R. Harriott, James A. Liddle, Cynthia A. Volkert, Warren K. Waskiewicz, David L. Windt
  • Patent number: 5316879
    Abstract: Fabrication of sub-micron design rule integrated circuits entails imposition of patterning information, consisting of degree of scattering, on a projected scanning beam of accelerated electrons by means of a mask, imaging being dependent upon passage through a back focal plane filter including a plurality of apertures for selectively passing relatively unscattered electrons.
    Type: Grant
    Filed: July 14, 1992
    Date of Patent: May 31, 1994
    Assignee: AT&T Bell Laboratories
    Inventors: Steven D. Berger, James A. Liddle
  • Patent number: 5279925
    Abstract: It has been found that for a SCALPEL lithographic system thermal effects dictate that the acceleration voltage for the exposing electrons be maintained within a specific range. This range depends on a variety of factors but is generally in the 50 to 150 KeV region. Additionally, thermal considerations also dictate the method of scanning the mask to print an entire wafer.
    Type: Grant
    Filed: December 16, 1992
    Date of Patent: January 18, 1994
    Assignee: AT&T Bell Laboratories
    Inventors: Steven D. Berger, James A. Liddle
  • Patent number: 5260151
    Abstract: Fabrication of submicron design rule large scale integrated circuits depends upon use of a strut-segmented mask with struts providing mechanical support to permit thinned mask segments consequently yielding improved resolution. "Stitching"--positioning of projected segment images to yield a satisfactory continuous image--is aided by lithographically defined skirts forming a continuous border within strut-supported segments.
    Type: Grant
    Filed: December 30, 1991
    Date of Patent: November 9, 1993
    Assignee: AT&T Bell Laboratories
    Inventors: Steven D. Berger, Marvin Leventhal, James A. Liddle