Abstract: The present disclosure relates to polyaxial bone screws and methods that enable the positioning of the polyaxial bone screws to be reliably determined using a surgical navigation system including a navigation probe. In an embodiment, a polyaxial bone screw comprises a threaded shaft inserted in bone and a head connected to the shaft, the head being rotatable relative to the shaft about a centre of rotation of the head of the bone screw. The position of a navigation probe is monitored using a navigation device. A first mating surface of the head of the bone screw is engaged with a second mating surface of the navigation probe; and the location of the centre of rotation of the head of the bone screw is determined based on the monitored position of the navigation probe when the first mating surface and the second mating surface are engaged.

Abstract: Embodiments of this disclosure describe a feedback loop that can be used to maintain a nearly constant sheath voltage and thus creating a mono-energetic IEDF at the surface of the substrate. The system described herein consequently enables a precise control over the shape of IEDF and the profile of the features formed in the surface of the substrate.

Abstract: Embodiments of this disclosure describe a feedback loop that can be used to maintain a nearly constant sheath voltage and thus creating a mono-energetic IEDF at the surface of the substrate. The system described herein consequently enables a precise control over the shape of IEDF and the profile of the features formed in the surface of the substrate.

Abstract: The present disclosure relates to an aerosol delivery device filling system. The system includes multiple source containers each respectively including a differing aerosol precursor composition. The system further includes a mixing container configured to engage the source containers to receive and mix the aerosol precursor compositions to form a mixed aerosol precursor composition. An aerosol delivery device may engage the mixing container to receive at least a portion of the mixed aerosol precursor composition. A related method for customizing an aerosol precursor composition is also provided.

Abstract: A surgical connection device for a spine is disclosed including a stabilization member, compression arms and traction arms, the device being used in conjunction with first anchor points fixed to vertebrae at a first lateral side of the spine and second anchor points fixed to vertebrae at a second lateral side of the spine. A first spinal rod may be attached to the first anchor points and a second spinal rod may be attached to the second anchor points. The compression arms connect the stabilization member to the first and second anchor points or rods and bear compressive forces. The traction arms connect the stabilization member to the first and o second anchor points or rods and bear tensile forces. Application of both tensile and compressive forces via the device may serve to straighten, change a direction of bending or increase a degree of bending of the rods and/or spine. The use of the traction arms may also provide for a more flexible construct.

Abstract: The present disclosure relates to polyaxial bone screws and methods that enable the positioning of the polyaxial bone screws to be reliably determined using a surgical navigation system including a navigation probe. In an embodiment, a polyaxial bone screw comprises a threaded shaft inserted in bone and a head connected to the shaft, the head being rotatable relative to the shaft about a centre of rotation of the head of the bone screw. The position of a navigation probe is monitored using a navigation device. A first mating surface of the head of the bone screw is engaged with a second mating surface of the navigation probe; and the location of the centre of rotation of the head of the bone screw is determined based on the monitored position of the navigation probe when the first mating surface and the second mating surface are engaged.

Abstract: Embodiments described herein provide methods and apparatus used to control a processing result profile proximate to a circumferential edge of a substrate during the plasma assisted processing thereof. In one embodiment a substrate support assembly features a first base plate and a second base plate circumscribing the first base plate. The first and second base plates each have one or more respective first and second cooling disposed therein. The substrate support assembly further features a substrate support disposed on and thermally coupled to the first base plate and a biasing ring disposed on and thermally coupled to the second base plate. Here, the substrate support and the biasing ring are each formed of a dielectric material. The substrate support assembly further includes an edge ring biasing electrode embedded the dielectric material of the biasing ring and an edge ring disposed on the biasing ring.

Abstract: A system for aiding surgery on a patient is described including a display device and a storage device that stores an image of at least a portion of the anatomy of the patient, including one or more surgical navigation markers positioned on the patient, for display on the display device. An analyser is adapted to receive positional data of a probe based on positioning of the probe relative to the one or more markers on the patient. Based on the positional data, the analyser outputs correctional data to adjust an alignment of the image on the display device to match locations of said one or more markers.

Abstract: Embodiments for the present application include methods and apparatus for operating a plasma enhanced substrate processing system using dual level pulsed radio frequency (RF) power. More specifically, embodiments of the present disclosure allow for frequency and power tuning in a process chamber using dual level pulsed power by using a tuning controller coupled to a matching network and/or a RF power generator. In one embodiment, a tuning system includes a tuning controller disposed in a tuning system, the tuning controller configured to tune dual level RF pulsing data from a RF power generator, wherein the tuning system is connectable to a plasma processing chamber, and a memory connecting to the tuning controller, wherein the tuning controller is configured to couple to a RF power generator and a matching network disposed in the plasma processing chamber.

Abstract: The present disclosure relates to apparatus and methods that manipulate the amplitude and phase of the voltage or current of an edge ring. The apparatus includes an electrostatic chuck having a chucking electrode embedded therein for chucking a substrate to the electrostatic chuck. The apparatus further includes a baseplate underneath the substrate to feed RF power to the substrate. The apparatus further includes an edge ring disposed over the electrostatic chuck. The apparatus further includes an edge ring electrode located underneath the edge ring. The apparatus further includes a radio frequency (RF) circuit including a first variable capacitor coupled to the edge ring electrode.

Abstract: Helmets and methods for manufacturing a helmet are described. An example helmet includes a shell and a shock absorbing liner attached to the shell. The shock absorbing liner includes a cavity. The helmet a shock absorbing insert formed of a material different than the material of the shock absorbing liner. The cavity is configured to retain the shock absorbing insert.

Abstract: The present disclosure relates to an aerosol delivery device filling system. The system includes multiple source containers each respectively including a differing aerosol precursor composition. The system further includes a mixing container configured to engage the source containers to receive and mix the aerosol precursor compositions to form a mixed aerosol precursor composition. An aerosol delivery device may engage the mixing container to receive at least a portion of the mixed aerosol precursor composition. A related method for customizing an aerosol precursor composition is also provided.

Abstract: Embodiments of this disclosure describe an electrode biasing scheme that enables maintaining a nearly constant sheath voltage and thus creating a mono-energetic IEDF at the surface of the substrate that consequently enables a precise control over the shape of IEDF and the profile of the features formed in the surface of the substrate.

Abstract: A surface cleaning apparatus is described including a floor head, a housing supporting a suction source and a dirt collection container having an elongate axis (A). The device further includes an elongate member having an elongate axis (B), said elongate member connecting the floor head to the housing, said elongate member including a passage for carrying dirt-laden air from the floor head to the dirt collection container. The elongate axis (B) of the elongate member intersects or substantially intersects the elongate axis (A) of the dirt collection container.

Abstract: Embodiments of this disclosure describe an electrode biasing scheme that enables maintaining a nearly constant sheath voltage and thus creating a mono-energetic IEDF at the surface of the substrate that consequently enables a precise control over the shape of IEDF and the profile of the features formed in the surface of the substrate.

Abstract: Embodiments described herein provide methods and apparatus used to control a processing result profile proximate to a circumferential edge of a substrate during the plasma assisted processing thereof. In one embodiment a substrate support assembly features a first base plate and a second base plate circumscribing the first base plate. The first and second base plates each have one or more respective first and second cooling disposed therein. The substrate support assembly further features a substrate support disposed on and thermally coupled to the first base plate and a biasing ring disposed on and thermally coupled to the second base plate. Here, the substrate support and the biasing ring are each formed of a dielectric material. The substrate support assembly further includes an edge ring biasing electrode embedded the dielectric material of the biasing ring and an edge ring disposed on the biasing ring.

Abstract: Embodiments of a slot bar configured to secure one or more sheet materials are disclosed herein. The slot bar being configured to receive one or more retaining strips. The slot bar includes a base section and a first slot base extending substantially perpendicularly from the base section. The base section and first slot base define a first ledge region. The slot bar also includes a first slot wall extending from the first slot base and a first slot arm extending from the first slot wall. The first slot arm is also substantially parallel to and spatially disposed from the first slot base. The first slot base, the first slot wall, and the first slot arm define a first slot configured to receive the first retaining strip so as to secure a first sheet material between the first retaining strip and the first ledge region.

Abstract: The present disclosure relates to apparatus and methods that manipulate the amplitude and phase of the voltage or current of an edge ring. The apparatus includes an electrostatic chuck having a chucking electrode embedded therein for chucking a substrate to the electrostatic chuck. The apparatus further includes a baseplate underneath the substrate to feed RF power to the substrate. The apparatus further includes an edge ring disposed over the electrostatic chuck. The apparatus further includes an edge ring electrode located underneath the edge ring. The apparatus further includes a radio frequency (RF) circuit including a first variable capacitor coupled to the edge ring electrode.

Abstract: Systems and methods for creating arbitrarily-shaped ion energy distribution functions using shaped-pulse—bias. In an embodiment, a method includes applying a positive jump voltage to an electrode of a process chamber to neutralize a wafer surface, applying a negative jump voltage to the electrode to set a wafer voltage, and modulating the amplitude of the wafer voltage to produce a predetermined number of pulses to determine an ion energy distribution function. In another embodiment a method includes applying a positive jump voltage to an electrode of a process chamber to neutralize a wafer surface, applying a negative jump voltage to the electrode to set a wafer voltage, and applying a ramp voltage to the electrode that overcompensates for ion current on the wafer or applying a ramp voltage to the electrode that undercompensates for ion current on the wafer.

Abstract: A surface cleaning apparatus including a housing supporting a suction source including a motor with an axle that rotates a fan and a dirt collection container having an elongate axis (A). The elongate axis (A) of the dirt collection container is transverse to an axis of the axle of the motor, and the axis of the axle of the motor is offset from the elongate axis of the dirt collection container.