Patents by Inventor James A. Sozanski

James A. Sozanski has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • RF amplifier modulation circuit and related techniques
    Patent number: 8224264
    Abstract: A power supply stage includes a digital signal generation means to generate n bit digital signal, a selection means for power supply voltages in dependence on n bit digital signal and an adjusting means for receiving the selected power supply voltage and the envelope signal and adapted to generate an adjusted selected power supply voltage tracking the envelope signal.
    Type: Grant
    Filed: November 13, 2009
    Date of Patent: July 17, 2012
    Assignee: Auriga Measurement Systems, LLC
    Inventors: Yusuke Tajima, Mark A. Royer, James A. Sozanski
  • Transformer shielding
    Patent number: 7477120
    Abstract: An electrical transformer having a core with two core portions having a shield for electrically shielding one core portion from the other core portion.
    Type: Grant
    Filed: August 13, 2001
    Date of Patent: January 13, 2009
    Assignee: Bose Corporation
    Inventors: Wenjian Gu, Robert P. Parker, James A. Sozanski
  • Transformer shielding
    Publication number: 20030030534
    Abstract: An electrical transformer having a core with two core portions having a shield for electrically shielding one core portion from the other core portion.
    Type: Application
    Filed: August 13, 2001
    Publication date: February 13, 2003
    Inventors: Wenjian Gu, Robert P. Parker, James A. Sozanski
  • Alignment system for use in lithography utilizing a spherical reflector having a centered etched-on projection object
    Patent number: 5483345
    Abstract: A system for aligning substrates when preparing flat panel displays by lithography. A spherical reflector (imaging mirror) is used to focus a small geometric object, such as a cross, etched at the center of the reflector. The cross is projected toward a beam splitter and is then reflected onto the mirror which, in turn, images it on the surface of the substrate being used in the lithographic process. This optical system, which has a numerical aperture of about 0.05 radians, provides maximum depth of field with essentially no aberrations, and produces a relatively large probe image on a large alignment mark.The surface of the substrate carries a grid of stepped patterns as an alignment mark. The steps diffract the light received, and the diffracted light passes through a lens system to a sensor associated with the lens system. The amount of light diffracted is dependent upon where the image strikes the steps in the grid.
    Type: Grant
    Filed: September 6, 1994
    Date of Patent: January 9, 1996
    Assignee: MRS Technology, Inc.
    Inventors: J. Casey Donaher, David S. Holbrook, Shepard D. Johnson, James A. Sozanski