Abstract: Methods and systems for direct lithographic pattern definition based upon electron beam induced alteration of the surface chemistry of a substrate are described. The methods involve an initial chemical treatment for global definition of a specified surface chemistry (SC). Electron beam induced surface reactions between a gaseous precursor and the surface are then used to locally alter the SC. High resolution patterning of stable, specified surface chemistries upon a substrate can thus be achieved. The defined patterns can then be utilized for selective material deposition via methods which exploit the specificity of certain SC combinations or by differences in surface energy. It is possible to perform all steps in-situ without breaking vacuum.

Abstract: A multi-turn measurement system includes a plurality of gears, a plurality of pinions engaging the plurality of gears, a plurality of magnets each disposed on one of the plurality of gears, and a plurality of magnetic field sensors. Rotation of the pinions about a center axis drives rotation of the plurality of gears. The magnets each have a magnetic field that changes based on an angular position of the one of the plurality of gears. The magnetic field sensors are each positioned to sense the magnetic field of one of the plurality of magnets.

Abstract: Various methods and systems are provided for imaging a sample under low vacuum with a charged particle beam. A magnetic field is provided in a detection area of the detector. Gas and plasma are provided in the detection area while detecting charged particles emitted from the sample. Sample image is formed based on the detected charged particles.

Abstract: Various methods and systems are provided for imaging a sample under low vacuum with a charged particle beam. A magnetic field is provided in a detection area of the detector. Gas and plasma are provided in the detection area while detecting charged particles emitted from the sample. Sample image is formed based on the detected charged particles.

Abstract: A balloon (10) extending generally axially from an opening (14) at a first end. The balloon comprises an elastomeric film (11) having a first thickness and a plurality of intersecting ribs (12) of a second, greater thickness formed on the film. The ribs are adapted so as to be angled with respect to the axis (13) of the balloon and any axis perpendicular thereto. Such a balloon has increased tear resistance, and can be manufactured with conventional dipping techniques without compromising the integrity of the film. The ribs may comprise a plurality of helices. There is also a former for making such a balloon and a method of using such a former to make such a balloon.

Abstract: A multi-turn measurement system includes a plurality of gears, a plurality of pinions engaging the plurality of gears, a plurality of magnets each disposed on one of the plurality of gears, and a plurality of magnetic field sensors. Rotation of the pinions about a center axis drives rotation of the plurality of gears. The magnets each have a magnetic field that changes based on an angular position of the one of the plurality of gears. The magnetic field sensors are each positioned to sense the magnetic field of one of the plurality of magnets.

Abstract: Methods and systems for direct lithographic pattern definition based upon electron beam induced alteration of the surface chemistry of a substrate are described. The methods involve an initial chemical treatment for global definition of a specified surface chemistry (SC). Electron beam induced surface reactions between a gaseous precursor and the surface are then used to locally alter the SC. High resolution patterning of stable, specified surface chemistries upon a substrate can thus be achieved. The defined patterns can then be utilized for selective material deposition via methods which exploit the specificity of certain SC combinations or by differences in surface energy. It is possible to perform all steps in-situ without breaking vacuum.

Abstract: Methods and systems for direct lithographic pattern definition based upon electron beam induced alteration of the surface chemistry of a substrate are described. The methods involve an initial chemical treatment for global definition of a specified surface chemistry (SC). Electron beam induced surface reactions between a gaseous precursor and the surface are then used to locally alter the SC. High resolution patterning of stable, specified surface chemistries upon a substrate can thus be achieved. The defined patterns can then be utilized for selective material deposition via methods which exploit the specificity of certain SC combinations or by differences in surface energy. It is possible to perform all steps in-situ without breaking vacuum.

Abstract: Methods and systems for direct lithographic pattern definition based upon electron beam induced alteration of the surface chemistry of a substrate are described. The methods involve an initial chemical treatment for global definition of a specified surface chemistry (SC). Electron beam induced surface reactions between a gaseous precursor and the surface are then used to locally alter the SC. High resolution patterning of stable, specified surface chemistries upon a substrate can thus be achieved. The defined patterns can then be utilized for selective material deposition via methods which exploit the specificity of certain SC combinations or by differences in surface energy. It is possible to perform all steps in-situ without breaking vacuum.

Abstract: In respect of a balloon (10) having an illumination device (20), including a light emitting member, which is mounted onto the wall inside the balloon cavity, at least one sheet (22, 24) of flexible material is connected to the illumination device inside the balloon cavity to serve as a parachute for the illumination device (20) in the event of rupture of the wall of the balloon when in an inflated condition. In embodiments where the illumination device is provided with a projection (12) and is mounted to the wall of the balloon by an attachment element, such as elastic band (18), engaging said projection from outside the balloon, the or each sheet of flexible material (22, 24) serving as the parachute may be connected to the illumination device (20) and to the balloon wall by location over the projection (12) and engagement by the same attachment member.

Abstract: A balloon (10) extending generally axially from an opening (14) at a first end. The balloon comprises an elastomeric film (11) having a first thickness and a plurality of intersecting ribs (12) of a second, greater thickness formed on the film The ribs are adapted so as to be angled with respect to the axis (13) of the balloon and any axis perpendicular thereto. Such a balloon has increased tear resistance, and can be manufactured with conventional dipping techniques without compromising the integrity of the film. The ribs may comprise a plurality of helices. There is also a former for making such a balloon and a method of using such a former to make such a balloon.