Patents by Inventor James Bradley Sundin

James Bradley Sundin has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method and apparatus for immersion treatment of semiconductor and other devices
    Patent number: 6641675
    Abstract: Method and apparatus for cleaning semiconductor devices and other workpieces using an aqueous rinse solution which is de-oxygenated by passing the aqueous rinse solution and a carrier gas through an osmotic membrane degasifier. A cleaning chamber is also disclosed for carrying out the cleaning method.
    Type: Grant
    Filed: May 25, 2001
    Date of Patent: November 4, 2003
    Assignee: Z Cap, L.L.C.
    Inventors: Paul William Dryer, Richard Scott Tirendi, James Bradley Sundin
  • Method and apparatus for immersion treatment of semiconductor and other devices
    Publication number: 20010023700
    Abstract: Method and apparatus for cleaning semiconductor devices and other workpieces using an aqueous rinse solution which is de-oxygenated by passing the aqueous rinse solution and a carrier gas through an osmotic membrane degasifier. A cleaning chamber is also disclosed for carrying out the cleaning method.
    Type: Application
    Filed: May 25, 2001
    Publication date: September 27, 2001
    Inventors: Paul William Drayer, Richard Scott Tirendi, James Bradley Sundin
  • Method and apparatus for immersion treatment of semiconductor and other devices
    Patent number: 6284055
    Abstract: Method and apparatus for cleaning semiconductor devices and other workpieces using an aqueous rinse solution which is de-oxygenated by passing the aqueous rinse solution and a carrier gas through an osmotic membrane degasifier. A cleaning chamber is also disclosed for carrying out the cleaning method.
    Type: Grant
    Filed: July 11, 2000
    Date of Patent: September 4, 2001
    Assignee: Z Cap L.L.C.
    Inventors: Paul William Dryer, Richard Scott Tirendi, James Bradley Sundin
  • Method and apparatus for immersion treatment of semiconductor and other devices
    Patent number: 6244280
    Abstract: Method and apparatus for cleaning semiconductor devices and other workpieces using an aqueous rinse solution which is de-oxygenated by passing the aqueous rinse solution and a carrier gas through an osmotic membrane degasifier. A cleaning chamber is also disclosed for carrying out the cleaning method.
    Type: Grant
    Filed: November 18, 1999
    Date of Patent: June 12, 2001
    Assignee: Speedfam-IPEC Corporation
    Inventors: Paul William Dryer, Richard Scott Tirendi, James Bradley Sundin
  • Semiconductor wafer treatment
    Patent number: 6146468
    Abstract: Method and apparatus for cleaning semiconductor devices and other workpieces using an aqueous rinse solution which is de-oxygenated and hydrogen enriched by passing the aqueous rinse solution and a treatment fluid through an osmotic membrane degasifier. In the preferred embodiment, only a single component, forming gas, is employed to provide both functions of oxygen removal and hydrogen injection.
    Type: Grant
    Filed: March 5, 1999
    Date of Patent: November 14, 2000
    Assignee: Speedfam-IPEC Corporation
    Inventors: Paul William Dryer, Richard Scott Tirendi, James Bradley Sundin
  • Method and apparatus for immersion cleaning of semiconductor devices
    Patent number: 6021791
    Abstract: Method and apparatus for cleaning semiconductor devices and other workpieces using an aqueous rinse solution which is de-oxygenated by passing the aqueous rinse solution and a carrier gas through an osmotic membrane degasifier. A cleaning chamber is also disclosed for carrying out the cleaning method.
    Type: Grant
    Filed: June 29, 1998
    Date of Patent: February 8, 2000
    Assignee: Speedfam-IPEC Corporation
    Inventors: Paul William Dryer, Richard Scott Tirendi, James Bradley Sundin