Abstract: A fluoride ion cleaning system includes a retort for cleaning at least one component via a working fluid supplied to the retort, a post-retort subsystem for processing a post-retort fluid stream exiting the retort at a first temperature, and a scrubber downstream from the post-retort subsystem. The post-retort subsystem includes a separator in flow communication with the retort. The separator includes an inlet for receiving the post-retort fluid stream from the retort and an outlet for the post-retort fluid stream exiting the separator. The post-retort subsystem also includes a cooling device for selectively cooling the post-retort fluid stream to a second temperature, the second temperature being lower than the first temperature. The second temperature enables particulate to be separated from the post-retort fluid stream within the separator.

Abstract: A fluoride ion cleaning system is provided. The system includes a retort including an interior sized to receive at least one component therein. The at least one component has a target area defined thereon. The system also includes a gas distribution system. The gas distribution system includes a manifold configured to provide reaction gas within the interior, a flow modulator configured to agitate the reaction gas within the interior, and at least one nozzle in flow communication with the flow modulator. The at least one nozzle is adapted to define an agitated flow of reaction gas at the target area of the at least one component.