Patents by Inventor James C. Hann

James C. Hann has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Low temperature etching in cold-wall CVD systems
    Patent number: 5421957
    Abstract: An improved method of etching or cleaning a cold-wall chemical vapor deposition chamber that is substantially moisture-free at a low chamber temperature and a low chamber pressure while maintaining a satisfactory etch rate by using at least one etchant gas selected from the group consisting of nitrogen trifluoride, chlorine trifluoride, sulfur hexafluoride, carbon tetrafluoride or the like and mixtures thereof.
    Type: Grant
    Filed: July 30, 1993
    Date of Patent: June 6, 1995
    Assignee: Applied Materials, Inc.
    Inventors: David K. Carlson, H. Peter W. Hey, James C. Hann