Abstract: Various methods and systems are provided for facilitating the creation of a new and potentially thinner form of dielectric. Alternatively, for a given capacitance, a thicker layer can be created with lower risk of leakage. The present disclosure will enable the creation of physically smaller electronic components. Isotope-Modified Hafnium Dielectric is used to create a dielectric layer with a greater range of dielectric coefficients, which may enable the creation of smaller and/or more reliable electronic components.

Abstract: Various methods and systems are provided for facilitating the creation of a new and potentially thinner form of dielectric. Alternatively, for a given capacitance, a thicker layer can be created with lower risk of leakage. The present disclosure will enable the creation of physically smaller electronic components. Isotope-Modified Hafnium Dielectric is used to create a dielectric layer with a greater range of dielectric coefficients, which may enable the creation of smaller and/or more reliable electronic components.

Abstract: An optical waveguide having a cladding layer formed of high-purity glass, or a cladding layer formed of high-purity isotope-proportion modified glass, and with a core of high-purity isotope-proportion-modified glass with the index of refraction of the core glass greater than the index of refraction of the cladding glass, said high-purity isotope-proportion-modified core material having a Si-29-isotope proportion at most 4.447% Si-29 (atom/atom) of all silicon atoms in said core, or at least 4.90% of Si-29 (atom/atom) atoms in said core, or having a Ge-73 isotope proportion of at most 7.2% Ge-73 (atom/atom) of all germanium atoms in said core, or at least 8.18% of Ge-73 (atom/atom) of Germanium atoms in said core region.

Abstract: An optical waveguide having a cladding layer formed of high-purity glass, or a cladding layer formed of high-purity isotope-proportion modified glass, and with a core of high-purity isotope-proportion-modified glass with the index of refraction of the core glass greater than the index of refraction of the cladding glass, said high-purity isotope-proportion-modified core material having a Si-29-isotope proportion at most 4.447% Si-29 (atom/atom) of all silicon atoms in said core, or at least 4.90% of Si-29 (atom/atom) atoms in said core, or having a Ge-73 isotope proportion of at most 7.2% Ge-73 (atom/atom) of all germanium atoms in said core, or at least 8.18% of Ge-73 (atom/atom) of Germanium atoms in said core region.

Abstract: An optical waveguide having a cladding layer formed of high-purity glass, or a cladding layer formed of high-purity isotope-proportion modified glass, and with a core of high-purity isotope-proportion-modified glass with the index of refraction of the core glass greater than the index of refraction of the cladding glass, said high-purity isotope-proportion-modified core material having a Si-29-isotope proportion at most 4.447% Si-29 (atom/atom) of all silicon atoms in said core, or at least 4.90% of Si-29 (atom/atom) atoms in said core, or having a Ge-73 isotope proportion of at most 7.2% Ge-73 (atom/atom) of all germanium atoms in said core, or at least 8.18% of Ge-73 (atom/atom) of Germanium atoms in said core region.

Abstract: An optical waveguide having a cladding layer formed of high-purity glass, or a cladding layer formed of high-purity isotope-proportion modified glass, and with a core of high-purity isotope-proportion-modified glass with the index of refraction of the core glass greater than the index of refraction of the cladding glass, said high-purity isotope-proportion-modified core material having a Si-29-isotope proportion at most 4.447% Si-29 (atom/atom) of all silicon atoms in said core, or at least 4.90% of Si-29 (atom/atom) atoms in said core, or having a Ge-73 isotope proportion of at most 7.2% Ge-73 (atom/atom) of all germanium atoms in said core, or at least 8.18% of Ge-73 (atom/atom) of Germanium atoms in said core region.

Abstract: An optical waveguide having a cladding layer formed of high-purity glass, or a cladding layer formed of high-purity isotope-proportion modified glass, and with a core of high-purity isotope-proportion-modified glass with the index of refraction of the core glass greater than the index of refraction of the cladding glass, said high-purity isotope-proportion-modified core material having a Si-29-isotope proportion at most 4.447% Si-29 (atom/atom) of all silicon atoms in said core, or at least 4.90% of Si-29 (atom/atom) atoms in said core, or having a Ge-73 isotope proportion of at most 7.2% Ge-73 (atom/atom) of all germanium atoms in said core, or at least 8.18% of Ge-73 (atom/atom) of Germanium atoms in said core region.