Patents by Inventor James Dean Eoff

James Dean Eoff has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11921054
    Abstract: A semiconductor wafer imaging system for imaging a semiconductor wafer includes shroud panels defining a black box, a camera positioned in the black box for imaging the semiconductor wafer, and an illumination panel for directing diffuse light to the semiconductor wafer. A portion of the diffuse light is reflected off the semiconductor wafer and the camera images the semiconductor wafer by detecting the reflected diffuse light.
    Type: Grant
    Filed: September 13, 2021
    Date of Patent: March 5, 2024
    Assignee: GlobalWafers Co., Ltd.
    Inventors: Benjamin Michael Meyer, Justin Scott Kayser, John F. Valley, James Dean Eoff, Vandan Tanna, William L. Luter
  • Publication number: 20240044041
    Abstract: An ingot puller for producing a doped single crystal silicon ingot includes a housing defining a chamber, a crucible disposed within the chamber, and a dopant injector attached to and extending into the housing. The chamber is maintained at a first pressure. The dopant injector includes a reservoir for containing a liquid dopant, a feed tube positioned within the chamber and connected to the reservoir, and a vaporization cup positioned within the feed tube and the chamber.
    Type: Application
    Filed: September 11, 2023
    Publication date: February 8, 2024
    Inventors: Yu-Chiao Wu, William Lynn Luter, Richard J. Phillips, James Dean Eoff
  • Patent number: 11866844
    Abstract: A method for doping a single crystal silicon ingot pulled includes heating a vaporization cup. The method also includes maintaining a pressure of an interior of the housing at a first pressure. The method further includes injecting liquid dopant into the dopant injection tube and the vaporization cup. A pressure of the liquid dopant is maintained at a second pressure greater than the first pressure prior to injection into the dopant injection tube and the vaporization cup. The method also includes vaporizing the liquid dopant into vaporized dopant within the housing. The liquid dopant is vaporized by flash evaporation by heating the liquid dopant with the vaporization cup and reducing the pressure of the liquid dopant from the second pressure to the first pressure by injecting the liquid dopant into the housing. The method further includes channeling the vaporized dopant into the housing using the dopant injection tube.
    Type: Grant
    Filed: December 31, 2020
    Date of Patent: January 9, 2024
    Assignee: GlobalWafers Co., Ltd.
    Inventors: Yu-Chiao Wu, William Lynn Luter, Richard J. Phillips, James Dean Eoff
  • Patent number: 11795569
    Abstract: An ingot puller apparatus for producing a doped single crystal silicon ingot includes a housing defining a chamber, a crucible disposed within the chamber, and a dopant injector extending into the housing. The dopant injector includes a delivery module attached to and extending through the housing into the chamber. The delivery module includes a dopant injection tube positioned within the chamber and a vaporization cup positioned within the dopant injection tube and the chamber. The second valve selectively channels the liquid dopant into the vaporization cup and the vaporization cup vaporizes the liquid dopant into a vaporized dopant.
    Type: Grant
    Filed: December 31, 2020
    Date of Patent: October 24, 2023
    Assignee: GlobalWafers Co., Ltd.
    Inventors: Yu-Chiao Wu, William Lynn Luter, Richard J. Phillips, James Dean Eoff
  • Publication number: 20220205131
    Abstract: A method for doping a single crystal silicon ingot pulled includes heating a vaporization cup. The method also includes maintaining a pressure of an interior of the housing at a first pressure. The method further includes injecting liquid dopant into the dopant injection tube and the vaporization cup. A pressure of the liquid dopant is maintained at a second pressure greater than the first pressure prior to injection into the dopant injection tube and the vaporization cup. The method also includes vaporizing the liquid dopant into vaporized dopant within the housing. The liquid dopant is vaporized by flash evaporation by heating the liquid dopant with the vaporization cup and reducing the pressure of the liquid dopant from the second pressure to the first pressure by injecting the liquid dopant into the housing. The method further includes channeling the vaporized dopant into the housing using the dopant injection tube.
    Type: Application
    Filed: December 31, 2020
    Publication date: June 30, 2022
    Inventors: Yu-Chiao Wu, William Lynn Luter, Richard J. Phillips, James Dean Eoff
  • Publication number: 20220205132
    Abstract: An ingot puller apparatus for producing a doped single crystal silicon ingot includes a housing defining a chamber, a crucible disposed within the chamber, and a dopant injector extending into the housing. The dopant injector includes a delivery module attached to and extending through the housing into the chamber. The delivery module includes a dopant injection tube positioned within the chamber and a vaporization cup positioned within the dopant injection tube and the chamber. The second valve selectively channels the liquid dopant into the vaporization cup and the vaporization cup vaporizes the liquid dopant into a vaporized dopant.
    Type: Application
    Filed: December 31, 2020
    Publication date: June 30, 2022
    Inventors: Yu-Chiao Wu, William Lynn Luter, Richard J. Phillips, James Dean Eoff
  • Publication number: 20220084892
    Abstract: A method of detecting defects on a semiconductor wafer includes directing diffuse light to the semiconductor wafer and reflecting the diffuse light off of the semiconductor wafer. The method further includes detecting the diffuse light with a camera to generate an image of the semiconductor wafer and analyzing the image to detect defects on the semiconductor wafer.
    Type: Application
    Filed: September 13, 2021
    Publication date: March 17, 2022
    Inventors: Benjamin Michael Meyer, Justin Scott Kayser, John F. Valley, James Dean Eoff, Vandan Tanna, William L. Luter
  • Publication number: 20220082510
    Abstract: A semiconductor wafer imaging system for imaging a semiconductor wafer includes shroud panels defining a black box, a camera positioned in the black box for imaging the semiconductor wafer, and an illumination panel for directing diffuse light to the semiconductor wafer. A portion of the diffuse light is reflected off the semiconductor wafer and the camera images the semiconductor wafer by detecting the reflected diffuse light.
    Type: Application
    Filed: September 13, 2021
    Publication date: March 17, 2022
    Inventors: Benjamin Michael Meyer, Justin Scott Kayser, John F. Valley, James Dean Eoff, Vandan Tanna, William L. Luter
  • Publication number: 20220084857
    Abstract: A semiconductor wafer processing system for processing a semiconductor wafer includes a semiconductor wafer processing station for processing the semiconductor wafer and a semiconductor wafer imaging system that images the semiconductor wafer after the semiconductor wafer processing station processes the semiconductor wafer. The semiconductor wafer imaging system includes shroud panels defining a black box, a camera positioned in the black box for imaging the semiconductor wafer, and an illumination panel for directing diffuse light to the semiconductor wafer. A portion of the diffuse light is reflected off the semiconductor wafer and the camera images the semiconductor wafer by detecting the reflected diffuse light.
    Type: Application
    Filed: September 13, 2021
    Publication date: March 17, 2022
    Inventors: Benjamin Michael Meyer, Justin Scott Kayser, John F. Valley, James Dean Eoff, Vandan Tanna, William L. Luter
  • Patent number: 10910280
    Abstract: Cleave systems for separating bonded wafer structures, mountable cleave monitoring systems and methods for separating bonded wafer structures are disclosed. In some embodiments, the sound emitted from a bonded wafer structure is sensed during cleaving and a metric related to an attribute of the cleave is generated. The generated metric may be used for quality control and/or to adjust a cleave control parameter to improve the quality of the cleave of subsequently cleaved bonded wafer structures.
    Type: Grant
    Filed: March 8, 2019
    Date of Patent: February 2, 2021
    Assignee: GlobalWafers Co., Ltd.
    Inventors: Justin Scott Kayser, John Francis Valley, James Dean Eoff
  • Patent number: 10679908
    Abstract: Cleave systems for separating bonded wafer structures, mountable cleave monitoring systems and methods for separating bonded wafer structures are disclosed. In some embodiments, the sound emitted from a bonded wafer structure is sensed during cleaving and a metric related to an attribute of the cleave is generated. The generated metric may be used for quality control and/or to adjust a cleave control parameter to improve the quality of the cleave of subsequently cleaved bonded wafer structures.
    Type: Grant
    Filed: January 9, 2018
    Date of Patent: June 9, 2020
    Assignee: GLOBALWAFERS CO., LTD.
    Inventors: Justin Scott Kayser, John Francis Valley, James Dean Eoff
  • Publication number: 20190206745
    Abstract: Cleave systems for separating bonded wafer structures, mountable cleave monitoring systems and methods for separating bonded wafer structures are disclosed. In some embodiments, the sound emitted from a bonded wafer structure is sensed during cleaving and a metric related to an attribute of the cleave is generated. The generated metric may be used for quality control and/or to adjust a cleave control parameter to improve the quality of the cleave of subsequently cleaved bonded wafer structures.
    Type: Application
    Filed: March 8, 2019
    Publication date: July 4, 2019
    Inventors: Justin Scott Kayser, John Francis Valley, James Dean Eoff
  • Publication number: 20180211889
    Abstract: Cleave systems for separating bonded wafer structures, mountable cleave monitoring systems and methods for separating bonded wafer structures are disclosed. In some embodiments, the sound emitted from a bonded wafer structure is sensed during cleaving and a metric related to an attribute of the cleave is generated. The generated metric may be used for quality control and/or to adjust a cleave control parameter to improve the quality of the cleave of subsequently cleaved bonded wafer structures.
    Type: Application
    Filed: January 9, 2018
    Publication date: July 26, 2018
    Inventors: Justin Scott Kayser, John Francis Valley, James Dean Eoff
  • Patent number: 6089285
    Abstract: A method of supplying source material in a crystal puller used to grow single crystal semiconductor material. Generally, the method includes receiving a bulk container of the source material at a facility having the crystal puller and configuring the bulk container for gravity feed of the source material from the container. The bulk container is transported to the crystal puller and a predetermined quantity of source material is dispensed directly from the bulk container into the crystal puller. Apparatus and a system for use in supplying source material are also disclosed.
    Type: Grant
    Filed: April 29, 1998
    Date of Patent: July 18, 2000
    Assignee: MEMC Electronics Materials, Inc.
    Inventors: Mark DeStefano, James Dean Eoff, Sr., Thomas H. Schulte, John M. Anderson, Eng Chin Yau, Donald R. Ruggeri, David W. Baldwin, Charles Lawrence Badino