Patents by Inventor James DeLuca

James DeLuca has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20260237589
    Abstract: During a line edge smoothing process, a controlled oscillation is provided between a mask feature orientation and the ion beam. By continuously rotating the wafer within a narrow range of twist angles during the line edge smoothing process, the system compensates for alignment errors and deviations from linearity and parallelism in the mask features. The oscillations improve the uniformity and repeatability of the line edge smoothing process across the wafer and from wafer to wafer. By reducing sensitivity of the process to alignment errors, the invention eliminates the need for extensive setup, calibration, and fine-tuning. The manufacturing process is streamlined, enabling faster production cycles while increasing precision and repeatability, ultimately enhancing device performance and design margins.
    Type: Application
    Filed: February 6, 2026
    Publication date: August 13, 2026
    Inventor: James DeLuca
  • Publication number: 20250246401
    Abstract: In one embodiment, the disclosure relates to using artificial intelligence (AI) to implement automatic beam current density distribution tuning by obtaining measurements from stationary beam current measurement devices synchronously with the motion of a scanned ion beam to predict the beam tuning settings which will produce a desired beam current density profile. An exemplary method according to the disclosed embodiments include the steps of generating an ion beam as a function of an ion source; scanning the spot ion beam; obtaining signals from a plurality of stationary sensors; synchronizing the beam current measurements with the scanning of the beam to produce an input waveform; predicting the beam tuning controls that will produce the desired beam current density profile; and applying the predicted settings to the beam control system and validating that the beam current density profile matches the desired profile within a specified limit.
    Type: Application
    Filed: January 3, 2025
    Publication date: July 31, 2025
    Inventors: Niles Batchelder, Asad Anees, James Deluca
  • Patent number: 11646175
    Abstract: An ion implantation has an ion source and a mass analyzer configured to form and mass analyze an ion beam. A bending element is positioned downstream of the mass analyzer, and respective first and second measurement apparatuses are positioned downstream and upstream of the bending element and configured to determine a respective first and second ion beam current of the ion beam. A workpiece scanning apparatus scans the workpiece through the ion beam. A controller is configured to determine an implant current of the ion beam at the workpiece and to control the workpiece scanning apparatus to control a scan velocity of the workpiece based on the implant current. The determination of the implant current of the ion beam is based, at least in part, on the first ion beam current and second ion beam current.
    Type: Grant
    Filed: February 14, 2020
    Date of Patent: May 9, 2023
    Assignee: Axcelis Technologies, Inc.
    Inventors: James DeLuca, Andy Ray, Neil Demario, Rosario Mollica
  • Publication number: 20200266032
    Abstract: An ion implantation has an ion source and a mass analyzer configured to form and mass analyze an ion beam. A bending element is positioned downstream of the mass analyzer, and respective first and second measurement apparatuses are positioned downstream and upstream of the bending element and configured to determine a respective first and second ion beam current of the ion beam. A workpiece scanning apparatus scans the workpiece through the ion beam. A controller is configured to determine an implant current of the ion beam at the workpiece and to control the workpiece scanning apparatus to control a scan velocity of the workpiece based on the implant current. The determination of the implant current of the ion beam is based, at least in part, on the first ion beam current and second ion beam current.
    Type: Application
    Filed: February 14, 2020
    Publication date: August 20, 2020
    Inventors: James DeLuca, Andy Ray, Neil Demario, Rosario Mollica
  • Publication number: 20070186934
    Abstract: A device for creating a flattened opening in the neck of a victim for temporary stabilization by creating an air passage for breathing. The device includes a planar knife element and a surrounding flattened tube which is inserted simultaneously to form an air passage after removal of the knife element. The tube element includes laterally-extending flange means for limiting the degree of penetration during installation. In a preferred embodiment, the tube element includes laterally-extending structure for engaging the ends of the created air passage to retain the installed device in position.
    Type: Application
    Filed: February 16, 2006
    Publication date: August 16, 2007
    Inventor: James DeLuca
  • Publication number: 20060161170
    Abstract: A vacuum device for removing a lodged mass or bolus from the throat of a choking victim. The device includes a pump for creating a vacuum chamber communicating with a mouthpiece having a frangible membrane. A resilient striker fractures the membrane to generate a substantially instantaneous vacuum to the mouthpiece to dislodge the mass. In one embodiment, the membrane is substituted by a manually displaceable sealing member, which is resealed after use of the device by movement of a vacuum-generating plunger.
    Type: Application
    Filed: October 24, 2005
    Publication date: July 20, 2006
    Inventors: James DeLuca, Paul DeLuca