Patents by Inventor James Douglas Seefeldt

James Douglas Seefeldt has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8355478
    Abstract: Method and system for aligning a clock signal to parallel data are described. According to one embodiment, a clock shifting circuit shifts an incoming clock signal relative to an incoming data signal, and a data clocking circuit uses the shifted clock signal to reclock the incoming data signal. The clock shifting circuit may comprise a phase locked loop (PLL) coupled with multiple D flip flops (DFFs) connected in series. Divisional combinatorial logic may be disposed between DFFs in the series. Data clocking circuits may comprise one DFF to reclock each incoming data bit, a pair of DFFs to reclock each incoming data bit, or other circuits such as true-complement blocks to serve as local oscillators to mixers. Multiple shifted clock signals may be produced, such as those shifted 60, 90, 120, 180, 240, and 270 degrees relative to the incoming clock signal.
    Type: Grant
    Filed: May 29, 2009
    Date of Patent: January 15, 2013
    Assignee: Honeywell International Inc.
    Inventors: James Douglas Seefeldt, Weston Roper, James Hansen
  • Patent number: 7965118
    Abstract: Described herein are methods and apparatuses for achieving a desired duty cycle on an output of a PLL. According to one embodiment, a method is described, including generating a single ended clock signal from a differential common mode clock signal using a limiting differential amplifier, wherein the single ended clock signal has a duty cycle, generating a differential bias current signal in response to the duty cycle of the single ended clock signal, and correcting the duty cycle of the single ended clock signal to a desired duty cycle by applying the differential bias current signal to the limiting differential amplifier.
    Type: Grant
    Filed: July 11, 2008
    Date of Patent: June 21, 2011
    Assignee: Honeywell International Inc.
    Inventor: James Douglas Seefeldt
  • Publication number: 20100007393
    Abstract: Described herein are methods and apparatuses for achieving a desired duty cycle on an output of a PLL. According to one embodiment, a method is described, including generating a single ended clock signal from a differential common mode clock signal using a limiting differential amplifier, wherein the single ended clock signal has a duty cycle, generating a differential bias current signal in response to the duty cycle of the single ended clock signal, and correcting the duty cycle of the single ended clock signal to a desired duty cycle by applying the differential bias current signal to the limiting differential amplifier.
    Type: Application
    Filed: July 11, 2008
    Publication date: January 14, 2010
    Applicant: HONEYWELL INTERNATIONAL INC.
    Inventor: James Douglas Seefeldt
  • Patent number: 6310387
    Abstract: An integrated circuit inductor structure that includes a shielding pattern that induces a plurality of small eddy currents to shield the magnetic energy generated by the inductor from the substrate of the IC. The IC inductor structure is formed on a Silicon on Insulator (SOI) substrate where the substrate of the SOI has high resistivity. The shielding pattern forms a checkerboard pattern that includes a plurality of conducting regions completely isolated from each other by oxide material. The inductor has a high quality factor and a high self-resonance frequency due to the effective shielding of electromagnetic energy from the substrate of the IC while not reducing the effective inductance of the inductor.
    Type: Grant
    Filed: May 3, 1999
    Date of Patent: October 30, 2001
    Assignee: Silicon Wave, Inc.
    Inventors: James Douglas Seefeldt, Christopher D. Hull
  • Patent number: 6172378
    Abstract: Integrated circuit varactor structures that include either an P-gate/N-well or N-gate/P-well layer configuration formed on an SOI substrate. The varactor structure is completely electrically isolated from the substrate of the IC by an oxide layer of the SOI substrate and by oxide-filled trenches formed on both sides of the varactor structures. The isolation trenches preferably extend to the oxide layer of the SOI substrate. The P-gate/N-well varactor structure includes N+ implant regions formed in an N-well implant layer of the varactor. The N+ implant regions comprise the source and the drain of a varactor. A LOCOS layer may be formed over the N-well layer where the P-gate is formed over the LOCOS layer. The P-gate may be formed of polysilicon. The N-gate/P-well varactor structure includes P+ implant regions formed in a P-well implant layer of the varactor. The P+ implant regions comprise the source and the drain of a varactor.
    Type: Grant
    Filed: May 3, 1999
    Date of Patent: January 9, 2001
    Assignee: Silicon Wave, Inc.
    Inventors: Christopher D. Hull, James Douglas Seefeldt, Kishore V. Seendripu