Patents by Inventor James Drage
James Drage has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20080084416Abstract: A rendering engine allows users to define properties used to render, animate or otherwise represent objects (such as graphic objects, sound players, feedback force generators, and the like) so that the properties are used by the rendering engine to render the object. Users can also define a timeline to control the rendering of the object from a starting time to an ending time.Type: ApplicationFiled: October 6, 2006Publication date: April 10, 2008Applicant: Microsoft CorporationInventors: Jon Vincent, Tychaun Jones, James Drage, Andy Dadi, Shashank Gupta, Bill Suckow
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Publication number: 20070190735Abstract: Silica dielectric films, whether nanoporous foamed silica dielectrics or nonporous silica dielectrics are readily damaged by fabrication methods and reagents that reduce or remove hydrophobic properties from the dielectric surface. The invention provides for methods of imparting hydrophobic properties to such damaged silica dielectric films present on a substrate. The invention also provides plasma-based methods for imparting hydrophobicity to both new and damaged silica dielectric films. Semiconductor devices prepared by the inventive processes are also provided.Type: ApplicationFiled: April 5, 2007Publication date: August 16, 2007Inventors: Nigel Hacker, Michael Thomas, James Drage
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Publication number: 20060078827Abstract: Silica dielectric films, whether nanoporous foamed silica dielectrics or nonporous silica dielectrics are readily damaged by fabrication methods and reagents that reduce or remove hydrophobic properties from the dielectric surface. The invention provides for methods of imparting hydrophobic properties to such damaged silica dielectric films present on a substrate. The invention also provides plasma-based methods for imparting hydrophobicity to both new and damaged silica dielectric films. Semiconductor devices prepared by the inventive processes are also provided.Type: ApplicationFiled: November 28, 2005Publication date: April 13, 2006Inventors: Nigel Hacker, Michael Thomas, James Drage
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Patent number: 6610145Abstract: A process for forming a uniform nanoporous dielectric film on a substrate. The process includes horizontally positioning a flat substrate within a cup; depositing a liquid alkoxysilane composition onto the substrate surface; covering the cup such that the substrate is enclosed therein; spinning the covered cup and spreading the alkoxysilane composition evenly on the substrate surface; exposing the alkoxysilane composition to water vapor and base vapor to thereby form a gel; and then curing the gel. The invention also provides an apparatus for spin depositing a liquid coating onto a substrate. The apparatus has a cylindrical cup with an open top section and removable cover which closes the top. A vapor injection port extends through the center of the cover. Suitable means hold a substrate centered within the cup and spin the cup.Type: GrantFiled: September 19, 2001Date of Patent: August 26, 2003Assignee: AlliedSignal Inc.Inventors: Neil Hendricks, Douglas M. Smith, Teresa Ramos, James Drage
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Patent number: 6559071Abstract: A process for forming a nanoporous silica dielectric coating on a substrate. A substrate containing a deposited film is suspended within a sealable hotplate, while remaining free of contact with the hotplate. The hotplate is sealed and an inert gas is flowed across the substrate. The hotplate is heated to a temperature of from about 350° C. or higher, and the substrate is forced to contact the heated hotplate. The substrate is heated for a time that sufficiently removes outgassing remnants from the resultant nanoporous dielectric coating.Type: GrantFiled: October 26, 2001Date of Patent: May 6, 2003Assignee: AlliedSignal Inc.Inventors: Teresa Ramos, Douglas M. Smith, James Drage, Rick Roberts
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Patent number: 6495906Abstract: The present invention relates to low dielectric constant nanoporous silica films and to processes for their manufacture. A substrate, e.g., a wafer suitable for the production of an integrated circuit, having a plurality of raised lines and/or electronic elements present on its surface, is provided with a relatively high porosity, low dielectric constant, silicon-containing polymer film composition.Type: GrantFiled: February 7, 2002Date of Patent: December 17, 2002Assignee: AlliedSignal Inc.Inventors: Douglas M. Smith, Teresa Ramos, Kevin H. Roderick, Stephen Wallace, James Drage, Hui-Jung Wu, Neil Viernes, Lisa B. Brungardt
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Publication number: 20020173168Abstract: A process for forming a nanoporous silica dielectric coating on a substrate. A substrate containing a deposited film is suspended within a sealable hotplate, while remaining free of contact with the hotplate. The hotplate is sealed and an inert gas is flowed across the substrate. The hotplate is heated to a temperature of from about 350° C. or higher, and the substrate is forced to contact the heated hotplate. The substrate is heated for a time that sufficiently removes outgassing remnants from the resultant nanoporous dielectric coating.Type: ApplicationFiled: October 26, 2001Publication date: November 21, 2002Inventors: Teresa Ramos, Douglas M. Smith, James Drage, Rick Roberts
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Publication number: 20020123242Abstract: The present invention relates to low dielectric constant nanoporous silica films and to processes for their manufacture. A substrate, e.g., a wafer suitable for the production of an integrated circuit, having a plurality of raised lines and/or electronic elements present on its surface, is provided with a relatively high porosity, low dielectric constant, silicon-containing polymer film composition.Type: ApplicationFiled: February 7, 2002Publication date: September 5, 2002Inventors: Douglas M. Smith, Teresa Ramos, Kevin H. Roderick, Stephen Wallace, James Drage, Hui-Jung Wu, Neil Viernes, Lisa B. Brungardt
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Publication number: 20020086166Abstract: Improved processes for forming hydrophobic nanoporous dielectric coatings on substrates are provided. The improved processes involve forming a reaction mixture that combines at least one mono-, di- or trifunctional precursor with at least one tetrafunctional precursor, recovering the reaction product, and then depositing the reaction product onto a suitable substrate, followed by gelling of the deposited film. Precursors include alkoxy, acetoxy and halogen leaving groups.Type: ApplicationFiled: August 23, 1999Publication date: July 4, 2002Inventors: NEIL HENDRICKS, DOUGLAS M. SMITH, TERESA RAMOS, STEPHEN WALLACE, JAMES DRAGE
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Patent number: 6410149Abstract: Improved processes for forming hydrophobic nanoporous dielectric coatings on substrates are provided. The improved processes involve forming a reaction mixture that combines at least one mono-, di- or trifunctional precursor with at least one tetrafunctional precursor, recovering the reaction product, and then depositing the reaction product onto a suitable substrate, followed by gelling of the deposited film. Precursors include alkoxy, acetoxy and halogen leaving groups.Type: GrantFiled: August 23, 1999Date of Patent: June 25, 2002Assignee: AlliedSignal Inc.Inventors: Neil Hendricks, Douglas M. Smith, Teresa Ramos, Stephen Wallace, James Drage
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Patent number: 6395651Abstract: The present invention relates to low dielectric constant nanoporous silica films and to processes for their manufacture. A substrate, e.g., a wafer suitable for the production of an integrated circuit, having a plurality of raised lines and/or electronic elements present on its surface, is provided with a relatively high porosity, low dielectric constant, silicon-containing polymer film composition.Type: GrantFiled: July 7, 1998Date of Patent: May 28, 2002Assignee: AlliedSignalInventors: Douglas M. Smith, Teresa Ramos, Kevin H. Roderick, Stephen Wallace, James Drage, Hui-Jung Wu, Neil Viernes, Lisa B. Brungardt
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Patent number: 6372666Abstract: A process for forming a nanoporous silica dielectric coating on a substrate. A substrate containing a deposited film is suspended within a sealable hotplate, while remaining free of contact with the hotplate. The hotplate is sealed and an inert gas is flowed across the substrate. The hotplate is heated to a temperature of from about 350° C. or higher, and the substrate is forced to contact the heated hotplate. The substrate is heated for a time that sufficiently removes outgassing remnants from the resultant nanoporous dielectric coating.Type: GrantFiled: August 24, 1999Date of Patent: April 16, 2002Assignee: AlliedSignal Inc.Inventors: Teresa Ramos, Douglas M. Smith, James Drage, Rick Roberts
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Publication number: 20020019145Abstract: A process for forming a uniform nanoporous dielectric film on a substrate. The process includes horizontally positioning a flat substrate within a cup; depositing a liquid alkoxysilane composition onto the substrate surface; covering the cup such that the substrate is enclosed therein; spinning the covered cup and spreading the alkoxysilane composition evenly on the substrate surface; exposing the alkoxysilane composition to water vapor and base vapor to thereby form a gel; and then curing the gel. The invention also provides an apparatus for spin depositing a liquid coating onto a substrate. The apparatus has a cylindrical cup with an open top section and removable cover which closes the top. A vapor injection port extends through the center of the cover. Suitable means hold a substrate centered within the cup and spin the cup.Type: ApplicationFiled: September 19, 2001Publication date: February 14, 2002Inventors: Neil Hendricks, Douglas M. Smith, Teresa Ramos, James Drage
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Patent number: 6335296Abstract: A process for forming a uniform nanoporous dielectric film on a substrate. The process includes horizontally positioning a flat substrate within a cup; depositing a liquid alkoxysilane composition onto the substrate surface; covering the cup such that the substrate is enclosed therein; spinning the covered cup and spreading the alkoxysilane composition evenly on the substrate surface; exposing the alkoxysilane composition to water vapor and base vapor to thereby form a gel; and then curing the gel. The invention also provides an apparatus for spin depositing a liquid coating onto a substrate. The apparatus has a cylindrical cup with an open top section and removable cover which closes the top. A vapor injection port extends through the center of the cover. Suitable means hold a substrate centered within the cup and spin the cup.Type: GrantFiled: July 23, 1999Date of Patent: January 1, 2002Assignee: AlliedSignal Inc.Inventors: Neil Hendricks, Douglas M. Smith, Teresa Ramos, James Drage
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Patent number: 6319855Abstract: A process for forming a uniform nanoporous dielectric film on a substrate. The process includes horizontally positioning a flat substrate within a cup; depositing a liquid alkoxysilane composition onto the substrate surface; covering the cup such that the substrate is enclosed therein; spinning the covered cup and spreading the alkoxysilane composition evenly on the substrate surface; exposing the alkoxysilane composition to water vapor and base vapor to thereby form a gel; and then curing the gel. The invention also provides an apparatus for spin depositing a liquid coating onto a substrate. The apparatus has a cylindrical cup with an open top section and removable cover which closes the top. A vapor injection port extends through the center of the cover. Suitable means hold a substrate centered within the cup and spin the cup.Type: GrantFiled: November 22, 2000Date of Patent: November 20, 2001Assignee: AlliedSignal, Inc.Inventors: Neil Hendricks, Douglas M. Smith, Teresa Ramos, James Drage
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Patent number: 6126733Abstract: The invention relates to nanoporous dielectric films and to a process for their manufacture. Such films are useful in the production of integrated circuits. Such films are produced from a precursor of an alkoxysilane; a relatively low volatility solvent composition comprising a e C.sub.1 to C.sub.4 alkylether of a C.sub.1 to C.sub.4 alkylene glycol which is miscible in water and alkoxysilanes, having a hydroxyl concentration of 0.0084 mole/cm.sup.3 or less, a boiling point of about 175.degree. C. or more at atmospheric pressure and a weight average molecular weight of about 120 or more; a relatively high volatility solvent composition having a boiling point below that of the relatively low volatility solvent composition; optional water and an optional catalytic amount of an acid.Type: GrantFiled: July 7, 1998Date of Patent: October 3, 2000Assignee: AlliedSignal Inc.Inventors: Stephen Wallace, James Drage, Teresa Ramos, Douglas M. Smith
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Patent number: 6090448Abstract: The invention relates to nanoporous dielectric films and to a process for their manufacture. Such films are useful in the production of integrated circuits. Such films are produced from a precursor of an alkoxysilane; a relatively low volatility solvent composition comprising an ether of a C.sub.1 to C.sub.4 alkylene glycol which is miscible in water and alkoxysilanes, having a hydroxyl concentration of 0.021 mole/cm.sup.3 or less, a boiling point of about 175 .degree. C. or more at atmospheric pressure and a weight average molecular weight of about 100 or more; a relatively high volatility solvent composition having a boiling point below that of the relatively low volatility solvent composition; optional water and an optional catalytic amount of an acid.Type: GrantFiled: July 7, 1998Date of Patent: July 18, 2000Assignee: AlliedSignal Inc.Inventors: Stephen Wallace, James Drage, Teresa Ramos, Douglas M. Smith