Patents by Inventor James E. Polk
James E. Polk has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 12612491Abstract: A process of producing a polyamide polymer using in-line vacuum finishing technology in the absence of steam or other gases. The polyamide polymer, in particular Nylon 66, Nylon 6, and copolyamides, have a high molecular weight, excellent color, and low gel content. The polyamide polymer also has a relative viscosity greater than 50 as measured in a 90% strength formic acid solution; consistent viscosity with a standard deviation of less than 1; a gel content no greater than 50 ppm as measured by insolubles larger than 10 micron; and an optical defect content of less than 2,000 parts per million (ppm) as measured by optical control system (OCS). The polymer can be made into monofilaments or a multifilament yarn.Type: GrantFiled: April 15, 2023Date of Patent: April 28, 2026Assignee: Ascend Performance Materials Operations LLCInventors: James E. Polk, Chris E. Schwier, Ashish Sen, Craig A. Trask, Cihan Uzunpinar, Chie-Hsiung Wang, J. Marty Zabcik
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Publication number: 20250215154Abstract: A process of producing a polyamide polymer using in-line vacuum finishing technology in the absence of steam or other gases. The polyamide polymer, in particular Nylon 66, Nylon 6, and copolyamides, have a high molecular weight, excellent color, and low gel content. The polyamide polymer also has a relative viscosity greater than 50 as measured in a 90% strength formic acid solution; consistent viscosity with a standard deviation of less than 1; a gel content no greater than 50 ppm as measured by insolubles larger than 10 micron; and an optical defect content of less than 2,000 parts per million (ppm) as measured by optical control system (OCS). The polymer can be made into monofilaments or a multifilament yarn.Type: ApplicationFiled: April 15, 2023Publication date: July 3, 2025Inventors: James E. Polk, Chris E. Schwier, Ashish Sen, Craig A. Trask, Cihan Uzunpinar, Chie-Hsiung Wang, J. Marty Zabcik
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Publication number: 20250198396Abstract: A high-power density electric propulsion (EP) system is presented. High-power density functionality of the EP system is provided via thermal management structures that separately manage heat from a discharge chamber with electrically conductive inner/outer walls and an electromagnetic circuit of the EP system. The thermal management structures include separate radiators for rejection of heat from the discharge chamber and the electromagnetic circuit, the heat coupled to the radiators via respective thermal shunts. The thermal shunts include radially inwardly and/or outwardly projecting heat conducting structures that are thermally coupled to the discharge chamber and the electromagnetic circuit. Openings formed in annular structures of the electromagnetic circuit allow radial projection of the thermal shunts.Type: ApplicationFiled: April 5, 2024Publication date: June 19, 2025Inventors: Richard R. HOFER, Jacob B. SIMMONDS, James E. POLK, Dan M. GOEBEL
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Patent number: 12237137Abstract: Aspects include a method for treating a polycrystalline material, the method comprising: exposing a surface of the polycrystalline material to a plasma thereby changing the surface of the polycrystalline material from being characterized by a starting condition to being characterized by a treated condition; wherein: the surface comprises a plurality of crystallites each having the composition MB6, M being a metal element; the plasma comprises ions, the ions being characterized by an average ion flux selected from the range of 1.5 to 100 A/cm2 and an average ion energy that is less than a sputtering threshold energy; the starting condition of the surface is characterized by a first average work function and the treated condition of the surface is characterized by a second average work function; and the second average work function is less than the first average work function.Type: GrantFiled: April 2, 2021Date of Patent: February 25, 2025Assignee: California Institute of TechnologyInventors: Pedro P. Guerrero Vela, James E. Polk
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Publication number: 20230250232Abstract: A customizable polyamide polymer, in particular Nylon 66, Nylon 6, and copolyamides, having a high molecular weight, excellent color, and low gel content is disclosed. In particular, disclosed is a polymer having a relative viscosity greater than 50 as measured in a 90% strength formic acid solution; consistent viscosity with a standard deviation of less than 1; a gel content no greater than 50 ppm as measured by insolubles larger than 10 micron; an optical defect content of less than 2,000 parts per million (ppm) as measured by optical control system (OCS). The polymer can be made into monofilaments or a multifilament yarn.Type: ApplicationFiled: April 15, 2023Publication date: August 10, 2023Inventors: James E. Polk, Chris E. Schwier, Ashish Sen, Craig A. Trask, Cihan Uzunpinar, Chie-Hsiung Wang, J. Marty Zabcik
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Publication number: 20220328274Abstract: Aspects include a method for treating a polycrystalline material, the method comprising: exposing a surface of the polycrystalline material to a plasma thereby changing the surface of the polycrystalline material from being characterized by a starting condition to being characterized by a treated condition; wherein: the surface comprises a plurality of crystallites each having the composition MB6, M being a metal element; the plasma comprises ions, the ions being characterized by an average ion flux selected from the range of 1.5 to 100 A/cm2 and an average ion energy that is less than a sputtering threshold energy; the starting condition of the surface is characterized by a first average work function and the treated condition of the surface is characterized by a second average work function; and the second average work function is less than the first average work function.Type: ApplicationFiled: April 2, 2021Publication date: October 13, 2022Inventors: Pedro P. GUERRERO VELA, James E. POLK
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Patent number: 10384810Abstract: Micro-emitter arrays and methods of microfabricating such emitter arrays are provided. The microfabricated emitter arrays incorporate a plurality of emitters with heights greater than 280 microns with uniformity of +/?10 microns arranged on a supporting silicon substrate, each emitter comprising an elongated body extending from the top surface of the substrate and incorporating at least one emitter tip on the distal end of the elongated body thereof. The emitters may be disposed on the substrate in an ordered array in an X by Y grid pattern, wherein X and Y can be any number greater than zero. The micro-emitter arrays may utilize a LMIS propellant source including, for example, gallium, indium, bismuth, or tin. The substrate may incorporate at least one through-via providing a fluid pathway for the LMIS propellant to flow from a propellant reservoir beneath the substrate to the top substrate surface whereupon the micro-emitter array is disposed.Type: GrantFiled: July 15, 2015Date of Patent: August 20, 2019Assignee: California Institute of TechnologyInventors: Cecile Jung-Kubiak, Colleen M. Marrese-Reading, Victor E. White, Daniel W. Wilson, Matthew R. Dickie, Karl Y. Yee, Richard E. Muller, James E. Polk, John R. Anderson, Nima Rouhi, Frank Greer
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Publication number: 20180340042Abstract: A customizable polyamide polymer, in particular Nylon 66, Nylon 6, and copolyamides, having a high molecular weight, excellent color, and low gel content is disclosed. In particular, disclosed is a polymer having a relative viscosity greater than 50 as measured in a 90% strength formic acid solution; consistent viscosity with a standard deviation of less than 1; a gel content no greater than 50 ppm as measured by insolubles larger than 10 micron; an optical defect content of less than 2,000 parts per million (ppm) as measured by optical control system (OCS). The polymer can be made into monofilaments or a multifilament yarn. Also disclosed is a process of producing the polymer using in-line vacuum finishing technology in the absence of steam or other gases in the second, or post condensation, step of the polymer process.Type: ApplicationFiled: November 29, 2016Publication date: November 29, 2018Inventors: James E. Polk, Chris E. Schwier, Ashish Sen, Craig A. Trask, Cihan Uzunpinar, Chie-Hsiung Wang, J. Marty Zabcik
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Publication number: 20180201395Abstract: Micro-emitter arrays and methods of microfabricating such emitter arrays are provided. The microfabricated emitter arrays incorporate a plurality of emitters with heights greater than 280 microns with uniformity of +/?10 microns arranged on a supporting silicon substrate, each emitter comprising an elongated body extending from the top surface of the substrate and incorporating at least one emitter tip on the distal end of the elongated body thereof. The emitters may be disposed on the substrate in an ordered array in an X by Y grid pattern, wherein X and Y can be any number greater than zero. The micro-emitter arrays may utilize a LMIS propellant source including, for example, gallium, indium, bismuth, or tin. The substrate may incorporate at least one through-via providing a fluid pathway for the LMIS propellant to flow from a propellant reservoir beneath the substrate to the top substrate surface whereupon the micro-emitter array is disposed.Type: ApplicationFiled: July 15, 2015Publication date: July 19, 2018Applicant: California Institute of TechnologyInventors: Cecile Jung-Kubiak, Colleen M. Marrese-Reading, Victor E. White, Daniel W. Wilson, Matthew R. Dickie, Karl Y. Yee, Richard E. Muller, James E. Polk, John R. Anderson, Nima Rouhi, Frank Greer
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Patent number: 6755366Abstract: An insertion mechanism brings an insert yarn into association with a base yarn in an automatic winder. The insertion mechanism comprises an insertion guide for delivering the insert yarn to a predetermined location on the winder, and a tensioning device for maintaining tension on the insert yarn. In another aspect, an automatic winder is configured or modified for direct insertion. In contrast to conventional creel frame insertion, the direct insertion technique of the invention avoids the need for a separate step of back-winding, and allows the automatic doffing feature on the winder to be enabled.Type: GrantFiled: September 30, 2002Date of Patent: June 29, 2004Assignee: Solutia Inc.Inventor: James E. Polk
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Publication number: 20040061020Abstract: An insertion mechanism is provided for bringing an insert yarn into association with a base yarn in an automatic winder. The insertion mechanism comprises an insertion guide for delivering the insert yarn to a predetermined location on the winder, and a tensioning device for maintaining tension on the insert yarn. In another aspect, an automatic winder is configured or modified for direct insertion. In contrast to conventional creel frame insertion, the direct insertion technique of the invention avoids the need for a separate step of back-winding, and allows the automatic doffing feature on the winder to be enabled.Type: ApplicationFiled: September 30, 2002Publication date: April 1, 2004Applicant: Solutia Inc.Inventor: James E. Polk
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Publication number: 20030165656Abstract: A carpet fiber yarn having carpet fiber and binder material, the yarn being subjected to singeing to remove protruding fiber ends, and subjected to heat sufficient to melt the binder fiber, wherein initial appearance and trafficked appearance of a first test carpet having a pile comprised of the yarn is improved over a corresponding second test carpet having a pile comprised of an unsinged yarn with the carpet fiber and the binder fiber, the unsinged yarn also being subjected to heat sufficient to melt the binder fiber.Type: ApplicationFiled: November 13, 2002Publication date: September 4, 2003Applicant: Solutia Inc.Inventors: Richard W. Miller, Harold M. Familant, Tim D. Smith, Kenneth R. Thomas, Bart S. Campbell, Debra N. Hild, James E. Polk, David B. Horn, Raymond S. Knorr, Walter J. Nunning, William K. Fairchild