Abstract: A method for providing an actinic illumination energizes solid-state light sources in an array, wherein each solid-state light source emits actinic light of a predetermined wavelength, directs the emitted actinic light from the solid state light sources through one or more compound parabolic concentrators, and forms a field conjugate to an objective lens by directing the concentrated actinic light from each compound parabolic concentrator through one or more lens elements in a lens array. Emission of one or more of the solid state light sources is adjusted to obtain a predetermined illumination pupil envelope function.

Abstract: A telecentricity corrector is incorporated into a microlithographic projection system to achieve telecentricity targets at the output of the microlithographic projection system. The telecentricity corrector is located between an illuminator and a projection lens of the projection system, preferably just in advance of a reticle for controlling angular distributions of light illuminating the reticle.

Abstract: A method for providing an actinic illumination energizes solid-state light sources in an array, wherein each solid-state light source emits actinic light of a predetermined wavelength, directs the emitted actinic light from the solid state light sources through one or more compound parabolic concentrators, and forms a field conjugate to an objective lens by directing the concentrated actinic light from each compound parabolic concentrator through one or more lens elements in a lens array. Emission of one or more of the solid state light sources is adjusted to obtain a predetermined illumination pupil envelope function.

Abstract: A non-linear modification to telecentric object space together with alteration of working distance provides a distortion adjustment feature. The modification to telecentric object space can be manifest as a spherical aberration in an entrance pupil. The change in working distance can be made by relatively translating the imaged object through the modified telecentric object space. The distortion adjustment can be made to compensate for distortions accompanying changes in ambient or operating conditions. Distortions accompanying magnification corrections can also be corrected.

Abstract: A telecentricity corrector is incorporated into a microlithographic projection system to achieve telecentricity targets at the output of the microlithographic projection system. The telecentricity corrector is located between an illuminator and a projection lens of the projection system, preferably just in advance of a reticle for controlling angular distributions of light illuminating the reticle.

Abstract: A non-linear modification to telecentric object space together with alteration of working distance provides a distortion adjustment feature. The modification to telecentric object space can be manifest as a spherical aberration in an entrance pupil. The change in working distance can be made by relatively translating the imaged object through the modified telecentric object space. The distortion adjustment can be made to compensate for distortions accompanying changes in ambient or operating conditions. Distortions accompanying magnification corrections can also be corrected.

Abstract: A catadioptric imaging system for micro-lithographic projection features a high numerical aperture objective where most of the focusing power is produced by reflection and refraction angles are limited to avoid additional aberration. A field correcting optic is appended to a Mangin mirror in an immersive configuration for raising the numerical aperture. The optical connection between the Mangin mirror and the field correcting optic is arranged to control refraction angles by limiting angles of incidence or refractive index differences. A radially symmetric polarizing effect is achieved in a pupil to improve image contrast.