Abstract: Various implementations include a plant holder that includes at least one wall having an inner surface, a first end, and a second end. The inner surface of the at least one wall defines a channel, along with a first opening to the channel and a second opening to the channel. The first end and the second end of the at least one wall are spaced apart along a central axis that extends through the openings. The plant holder also includes at least two legs extending axially from and being spaced around a perimeter of the second end of the at least one wall. Adjacent edges of adjacent legs define a gap therebetween.

Abstract: Techniques and systems for maintaining a plasma processing kit consisting of protection and shielding elements without causing damage are introduced. The elements may be made of aluminium, polysilicon and quartz and may be coated with silicon. The surfaces of the elemants show a specified roughness. Precision cleaning and recovery of the contamined kit components of a plasma doping (PLAD) system is used, to extend the life and reusability of the components. The methods described cover the stages of inspection, pre-cleaning, mechanical processing and texturing, post-cleaning, clean-room class cleaning and packaging of the components consisting of quartz, aluminium and/or silicon. Techniques described employ the combination of a variety of means (primarily chemical and mechanical) to achieve the desired levels of cleanliness. The result obtained by methods that include Inductively Coupled Plasma-Mass Spectrometry (ICP-MS) and Laser Particle Count affirm the efficacy of these techniques.