Abstract: A secondary battery is provided for cycling between a charged and a discharged state, the secondary battery including a battery enclosure, an electrode assembly, carrier ions, a non-aqueous liquid electrolyte within the battery enclosure, and a set of electrode constraints. The set of electrode constraints includes a primary constraint system having first and second primary growth constraints and at least one primary connecting member, the first and second primary growth constraints separated from each other in the longitudinal direction, wherein the primary constraint array restrains growth of the electrode assembly in the longitudinal direction such that any increase in the Feret diameter of the electrode assembly in the longitudinal direction over 20 consecutive cycles of the secondary battery is less than 20%.

Abstract: A plasma processing chamber for depositing a film on an underside surface of a wafer, includes showerhead pedestal. The showerhead pedestal includes a first zone and a second zone. An upper separator fin is disposed over a top surface of the showerhead pedestal and a lower separator fin is disposed under the top surface of the showerhead pedestal and aligned with the upper separator fin. The first zone is configured for depositing a first film to the underside surface of the wafer and the second zone is configured for depositing a second film to the underside surface of the wafer. In another embodiment, a top surface of the showerhead pedestal may be configured to receive a masking plate instead of the upper separator fin. The masking plate is configured with a first area that has openings and a second area that is masked. The first areas is used to provide the process gas to a portion of the underside surface of the wafer for depositing a film.

Abstract: The present invention relates to compounds that inhibit KRas G12C. In particular, the present invention relates to compounds that irreversibly inhibit the activity of KRas G12C, pharmaceutical compositions comprising the compounds and methods of use therefor.

Abstract: A plasma processing chamber for depositing a film on an underside surface of a wafer, includes showerhead pedestal. The showerhead pedestal includes a first zone and a second zone. An upper separator fin is disposed over a top surface of the showerhead pedestal and a lower separator fin is disposed under the top surface of the showerhead pedestal and aligned with the upper separator fin. The first zone is configured for depositing a first film to the underside surface of the wafer and the second zone is configured for depositing a second film to the underside surface of the wafer. In another embodiment, a top surface of the showerhead pedestal may be configured to receive a masking plate instead of the upper separator fin. The masking plate is configured with a first area that has openings and a second area that is masked. The first areas is used to provide the process gas to a portion of the underside surface of the wafer for depositing a film.

Abstract: A processing chamber includes: a lower portion; an upper portion that covers the lower portion; a pedestal that is located within the lower portion, to vertically support a substrate above a top surface of the pedestal to distribute a precursor between the top surface and a first surface of the substrate, the pedestal configured to be electrically connected to one of a ground potential and a radio frequency potential; a grid that is coupled to the upper portion and that is configured to be electrically connected to the other one of the ground potential and the radio frequency potential; a window that covers an opening in the upper portion; and an infrared light source configured to transmit infrared light through the window and the grid to a second surface of the substrate. The second surface of the substrate is opposite the first surface of the substrate.

Abstract: A deposition tool including a processing chamber, a deposition pedestal for supporting a substrate in the processing chamber and for depositing a layer of material on a first surface of the substrate and a showerhead assembly having a faceplate opposing a second surface of the substrate, the faceplate of the showerhead having a plurality of configurable gas outlets arranged to distribute a purge gas adjacent the second surface of the substrate when the layer of material is being deposited on the first surface of the substrate by the deposition pedestal.

Abstract: A substrate processing chamber includes a lift actuator that moves a pedestal between a substrate loading position and a substrate processing position. An adjustable seal defines an expandable sealed volume between a bottom surface of the pedestal and a bottom surface of the substrate processing chamber and is moveable between the substrate loading position and the substrate processing position. When the pedestal is in the substrate processing position, the pedestal and the adjustable seal define a first inert volume and a first process volume. When the pedestal is in the substrate loading position, the pedestal and the adjustable seal define a second inert volume and a second process volume. The second inert volume is less than the first inert volume and the second process volume is greater than the first process volume.

Abstract: A substrate processing chamber includes a lift actuator that moves a pedestal between a substrate loading position and a substrate processing position. An adjustable seal defines an expandable sealed volume between a bottom surface of the pedestal and a bottom surface of the substrate processing chamber and is moveable between the substrate loading position and the substrate processing position. When the pedestal is in the substrate processing position, the pedestal and the adjustable seal define a first inert volume and a first process volume. When the pedestal is in the substrate loading position, the pedestal and the adjustable seal define a second inert volume and a second process volume. The second inert volume is less than the first inert volume and the second process volume is greater than the first process volume.

Abstract: A multi-tray fireplace tray system has a first tray and second tray. The first tray includes a hook. In use, the first tray and the second tray positioned proximate each other. The hook extends from the first tray into the second tray. Each tray includes a bottom surface and side walls extending from the bottom surface to form a walled surface for the for the collection of ash The hook starts from an upper edge of a side wall of the first tray and extends in a substantially C-shape over an upper edge of a side wall in the second tray. The hook terminates at a free end below the upper edge of the second tray side wall. When the first tray is moved, the hook moves the second tray in concert.

Abstract: The fireplace grate comprises a frame defining a compartment to hold a firelog or starter material and to prevent direct contact between the firelog or starter material and wood or ceramic logs placed on top of the frame. In one embodiment, the fireplace grate includes a hingeable door or member for the insertion of the firelog. In an alternative embodiment, the fireplace grate includes pivot arms for pivoting a ceramic log over the firelog in the compartment.

Abstract: A fireplace grate has a first platform and a second platform. Each of the first and second platforms are formed by a plurality of grate members and a plurality of cross members. The platforms are raised off the ground and connected via side members, being separated by a predetermined distance. The grate members and cross members include a substantially flat first surface to fully support firelogs placed on each either and/or both of the platforms. The fireplace grate segregates logs placed on each platform by prevents direct contact therebetween. Thus, the fireplace grate provides for enhanced safety and efficiency when creating fire with wood logs on the first platform and firelogs on the second platform while at the same time provide a grate for efficiently burning of firelogs only.

Abstract: A multi-tray fireplace tray system has a first tray and second tray. The first tray includes a hook. In use, the first tray and the second tray positioned proximate each other. The hook extends from the first tray into the second tray. Each tray includes a bottom surface and side walls extending from the bottom surface to form a walled surface for the for the collection of ash The hook starts from an upper edge of a side wall of the first tray and extends in a substantially C-shape over an upper edge of a side wall in the second tray. The hook terminates at a free end below the upper edge of the second tray side wall. When the first tray is moved, the hook moves the second tray in concert.

Abstract: A carrier with adjustable pressure zones and adjustable barriers between zones for distributing the pressure on the backside of a wafer. The pressure zones may be created using an elastic web diaphragm. One or more grooves are formed in the surface of the diaphragm to relieve vacuum formed between the diaphragm and wafer.

Abstract: A carrier with adjustable pressure zones and adjustable barriers between zones for distributing the pressure on the backside of a wafer. The pressure zones may be created using an elastic web diaphragm. One or more grooves are formed in the surface of the diaphragm to relieve vacuum formed between the diaphragm and wafer.

Abstract: The fireplace grate comprises a frame defining a compartment to hold a firelog or starter material and to prevent direct contact between the firelog or starter material and wood or ceramic logs placed on top of the frame. In one embodiment, the fireplace grate includes a hingeable door or member for the insertion of the firelog. In an alternative embodiment, the fireplace grate includes pivot arms for pivoting a ceramic log over the firelog in the compartment.

Abstract: The present invention delineates a carrier for an apparatus (10) which polishes a surface of a semiconductor wafer (56, 124). In a preferred embodiment, the carrier includes a rigid plate (34) connected to one or more diaphragms (40, 42) of soft, flexible material that provide pressurizable cavities (50, 52) having respective surfaces for contacting the back surface of the wafer. A plurality of conduits (28a, 28c) are used to selectively pressurize the diaphragm cavities. The carrier head may also include an inter-diaphragm cavity (54) formed between a portion of one diaphragm, a portion of another diaphragm, and the semiconductor wafer. The inter-diaphragm cavity is provided with its own conduit (28b) by which a source of pressurized fluid and a source of vacuum are selectively connected to the inter-diaphragm cavity. During operation, pressure and/or vacuum may be applied through one or more cavities to chuck (90) a wafer, and to pressurize (96) the cavities during polishing.

Abstract: A system for servicing an overhead door having a spring counter balance mechanism, an operator and a directional control system. The servicing system includes a counter, information cards, and contact cards. The counter includes a counting device and a numeric display. The counting device records the number of full cycles of the springs used in the counter balance mechanism measured from the fully closed position of the door. The numeric display shows this number of full cycles. An inspector of the door compares this number to the cycle failure specification for the springs used in the counter balance mechanism listed on the information cards. If replacement or attention is required, the inspector uses the contact cards to inform the appropriate parties that the door is not functioning properly or that the springs require attention.

Abstract: A large vehicle entry door safety system which uses at least one fixed mark at a measured height and a position indicator attached to the door. By safely and clearly indicating the height of the large vehicle entry door by visual alignment of the position indicator with the fixed mark or marks, vehicle operators or door operators or both can be helped to avoid collisions with the door.

Abstract: The present invention relates to a portable barbecue having an open-center frame provided with hingedly folding leg members and grill rack members. The leg members unfold to support the barbecue in an upright position and the grill rack members unfold to supportingly receive a cooking grill. Locking means is provided to secure the leg and grill rack members in their supporting positions. The open-center frame also supportingly engages a disposable heat reflecting drip pan and a removeable fire basket.

Abstract: The present invention relates to a portable barbecue comprising:a frame with an open center having front, rear and side walls and an inwardly extending annular bottom flange;first and second leg members hingedly engaging said frame to assume a first, folded position juxtaposed to the bottom of said frame and a second, supporting position extending away from the bottom of said frame;first and second grill rack members hingedly engaging said frame to assume a first, closed position juxtaposed to the top of said frame and a second, upright position extending upwardly from the top of said frame;a disposable heat reflecting drip pan having an outwardly extending annular lip adapted to engage said annular bottom flange on said frame such that said drip pan assumes a working position occupying the open center of said frame when said leg members are in said second, supporting position;a removable fire basket engaging said frame and overlying said disposable drip pan in said working position; anda removable cooking gr