Abstract: The present invention provides a system and method of side-stepping the need to retrain neural network model after initially trained using a simulator by comparing real-world data to data predicted by the simulator for the same inputs, and developing a mapping correlation that adjusts real world data toward the simulation data. Thus, the decision logic developed in the simulation-trained model is preserved and continues to operate in an altered reality. A threshold metric of similarity can be initially provided into the mapping algorithm, which automatically adjusts real world data to adjusted data corresponding to the simulation data for operating the neural network model when the metric of similarity between the real world data and the simulation data exceeds the threshold metric. Updated learning can continue as desired, working in the background as conditions are monitored.

Abstract: The present invention provides a system and method of side-stepping the need to retrain neural network model after initially trained using a simulator by comparing real-world data to data predicted by the simulator for the same inputs, and developing a mapping correlation that adjusts real world data toward the simulation data. Thus, the decision logic developed in the simulation-trained model is preserved and continues to operate in an altered reality. A threshold metric of similarity can be initially provided into the mapping algorithm, which automatically adjusts real world data to adjusted data corresponding to the simulation data for operating the neural network model when the metric of similarity between the real world data and the simulation data exceeds the threshold metric. Updated learning can continue as desired, working in the background as conditions are monitored.

Abstract: The present disclosure provides in at least one embodiment a rotatable keel skirt assembly on a rectangular-shaped keel pontoon. The rectangular-shaped keel pontoon reduces the maximum hull width by a significant percentage compared to a circular-shaped keel pontoon while maintaining the same hull motion performance. The rotatable keel skirt assembly allows the size of the pontoon to define the width of the hull during some fabrication phases of the platform, rather than the additional width of the keel skirt assembly. Thus, the outreach of the crane and other equipment can be effectively used as if the keel skirt assembly was not present. After fabrication, the hull can be moved away from the quayside and the keel skirt assembly can be rotated into position for service. Various systems and methods are disclosed for articulating the keel skirt assembly about the hull.

Abstract: The present disclosure provides a system and method of monitoring a mooring system for a floating vessel using the time of the natural period independent of environmental conditions. The natural period can be calculated and/or established experientially over time by measuring movement of the vessel to establish the natural period at given geographical positions of a secure and intact mooring system. The natural period can be monitored based on the time to complete a natural period. A change in a mooring line stiffness, whether by a failure, stretching, a degradation of the mooring line integrity, or a significant displacement of the anchoring point, will be translated into a different natural period with a different time.

Abstract: The present disclosure provides a system and method of monitoring a mooring system for a floating vessel using the time of the natural period independent of environmental conditions. The natural period can be calculated and/or established experientially over time by measuring movement of the vessel to establish the natural period at given geographical positions of a secure and intact mooring system. The natural period can be monitored based on the time to complete a natural period. A change in a mooring line stiffness, whether by a failure, stretching, a degradation of the mooring line integrity, or a significant displacement of the anchoring point, will be translated into a different natural period with a different time.

Abstract: The present disclosure provides in at least one embodiment a rotatable keel skirt assembly on a rectangular-shaped keel pontoon. The rectangular-shaped keel pontoon reduces the maximum hull width by a significant percentage compared to a circular-shaped keel pontoon while maintaining the same hull motion performance. The rotatable keel skirt assembly allows the size of the pontoon to define the width of the hull during some fabrication phases of the platform, rather than the additional width of the keel skirt assembly. Thus, the outreach of the crane and other equipment can be effectively used as if the keel skirt assembly was not present. After fabrication, the hull can be moved away from the quayside and the keel skirt assembly can be rotated into position for service. Various systems and methods are disclosed for articulating the keel skirt assembly about the hull.

Abstract: A method of forming a patterned layer on a substrate including depositing a notched or undercut resist pattern to define at least one recess in the photoresist, with the notch or undercut circumjacent the base of the recess, sputtering a material into the recess and removing the resist and the material deposited on the resist characterised in that the aspect ratio of the recess and height of the mouth of the notch or undercut are such that the notch or undercut lies substantially in the shadow beneath the resist, the layer deposited upon it and the layer at the base of the recess in respect of any sputtered particle travelling in a straight line through the mouth of the recess such that material deposited on the walls of the recesses is not continuous with material deposited on the base of the recess.

Abstract: A method of forming a patterned layer on a substrate including depositing a notched or undercut resist pattern to define at least one recess in the photoresist, with the notch or undercut circumjacent the base of the recess, sputtering a material into the recess and removing the resist and the material deposited on the resist characterised in that the aspect ratio of the recess and height of the mouth of the notch or undercut are such that the notch or undercut lies substantially in the shadow beneath the resist, the layer deposited upon it and the layer at the base of the recess in respect of any sputtered particle travelling in a straight line through the mouth of the recess such that material deposited on the walls of the recesses is not continuous with material deposited on the base of the recess.