Patents by Inventor James Gernert

James Gernert has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Plasma reaction chamber and captive silicon electrode plate for processing semiconductor wafers
    Publication number: 20060108069
    Abstract: A plasma processing system for etching a semiconductor wafer comprises: 1) a plasma chamber in which the semiconductor wafer may be mounted; 2) an upper ring capable of being mounted on an upper opening of the plasma chamber, wherein a central portion of the upper ring forms a hole; and 3) an electrode plate having a plurality of vias therethrough. The electrode plate is disposed in the hole in the upper ring, wherein the central portion of the upper ring further forms a shelf for supporting the electrode plate in the hole.
    Type: Application
    Filed: November 19, 2004
    Publication date: May 25, 2006
    Applicants: SAMSUNG ELECTRONICS Co., LTD., SAMSUNG AUSTIN SEMICONDUCTOR, L.P.
    Inventor: James Gernert