Patents by Inventor James Grootegoed
James Grootegoed has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11383211Abstract: A method and a system are described for mixing liquid chemicals at dynamically changing or static ratios during a given dispense, with extremely high uniformity and repeatability. A mixer includes multiple fluid supply lines including elongate bladders defining a linear flow path and being configured to laterally expand to collect a process fluid and laterally contract to deliver a selected volume of the process fluid to the mixer.Type: GrantFiled: September 4, 2019Date of Patent: July 12, 2022Assignee: Tokyo Electron LimitedInventors: Ronald W. Nasman, Lior Huli, Anton deVilliers, Rodney Robison, Norman Jacobson, James Grootegoed
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Publication number: 20200338510Abstract: A method and a system are described for mixing liquid chemicals at dynamically changing or static ratios during a given dispense, with extremely high uniformity and repeatability. A mixer includes multiple fluid supply lines including elongate bladders defining a linear flow path and being configured to laterally expand to collect a process fluid and laterally contract to deliver a selected volume of the process fluid to the mixer.Type: ApplicationFiled: September 4, 2019Publication date: October 29, 2020Applicant: Tokyo Electron LimitedInventors: Ronald W. NASMAN, Lior Huli, Anton DeVilliers, Rodney Robison, Norman Jacobson, James Grootegoed
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Patent number: 10712663Abstract: Techniques herein include a bladder-based dispense system using an elongate bladder configured to selectively expand and contract to assist with dispense actions. This dispense system compensates for filter-lag, which often accompanies fluid filtering for microfabrication. This dispense system also provides a high-purity and high precision dispense unit. A modular hydraulic unit houses the elongate bladder and hydraulic fluid in contact with an exterior surface of the bladder. When pressurized process fluid is in the elongate bladder, hydraulic controls can selectively reduce pressure on the bladder to cause expansion, and then selectively increase hydraulic pressure to assist with a dispense action.Type: GrantFiled: August 11, 2017Date of Patent: July 14, 2020Assignee: Tokyo Electron LimitedInventors: Anton J. deVilliers, Ronald Nasman, David Travis, James Grootegoed, Norman A. Jacobson, Jr.
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Patent number: 10403501Abstract: Techniques herein include a bladder-based dispense system using an elongate bladder configured to selectively expand and contract to assist with dispense actions. This dispense system compensates for filter-lag, which often accompanies fluid filtering for microfabrication. This dispense system also provides a high-purity and high precision dispense unit. A process fluid filter is located downstream from a process fluid source as well as a system valve. Downstream from the process fluid filter there are no valves. Dispense actions can be initiated and stop while the system valve is open by using the elongate bladder. The elongate bladder can be expanded to stop or pause a dispense action, and then be contracted to assist with a dispense action.Type: GrantFiled: August 11, 2017Date of Patent: September 3, 2019Assignee: Tokyo Electron LimitedInventors: Anton J. deVilliers, Rodney L. Robison, Ronald Nasman, David Travis, James Grootegoed, Norman A. Jacobson, Jr., Lior Huli, Joshua S. Hooge
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Patent number: 10354872Abstract: Techniques herein include a bladder-based dispense system using an elongate bladder configured to selectively expand and contract to assist with dispense actions. This dispense system compensates for filter-lag, which often accompanies fluid filtering for microfabrication. This dispense system also provides a high-purity and high precision dispense unit. A meniscus sensor monitors a position of a meniscus of process fluid at a nozzle. The elongate bladder unit is used to maintain a position of the meniscus at a particular location by selectively expanding or contracting the bladder, thereby moving or holding a meniscus position. Expansion of the elongate bladder is also used for a suck-back action after completing a dispense action.Type: GrantFiled: August 11, 2017Date of Patent: July 16, 2019Assignee: Tokyo Electron LimitedInventors: Anton J. deVilliers, Rodney L. Robison, Ronald Nasman, David Travis, James Grootegoed, Norman A. Jacobson, Jr., David Hetzer, Lior Huli, Joshua S. Hooge
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Patent number: 9987655Abstract: A fluid dispensing apparatus and method is disclosed. Systems include an in-line or linear bladder apparatus array configured to expand to collect a charge of fluid, and contract to assist with fluid delivery and dispensing. The bladder array is disposed within a chamber of pressure control fluid common to exterior surfaces of each bladder in the bladder array. Simultaneously, some bladders within the array of linear bladders can be dispensing fluid or maintaining fluid while some bladders are collecting fluid. A given filtration rate can be less than a dispense rate and thus the system herein compensates for filter-lag that often accompanies fluid filtering for microfabrication, while providing a generally linear configuration that reduces chances for defect creation. With multiple bladders, multiple different types of fluid can be readied for selective dispense.Type: GrantFiled: June 21, 2016Date of Patent: June 5, 2018Assignee: Tokyo Electron LimitedInventors: Anton J. deVilliers, Ronald Nasman, James Grootegoed, Norman A. Jacobson, Jr.
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Publication number: 20180047562Abstract: Techniques herein include a bladder-based dispense system using an elongate bladder configured to selectively expand and contract to assist with dispense actions. This dispense system compensates for filter-lag, which often accompanies fluid filtering for microfabrication. This dispense system also provides a high-purity and high precision dispense unit. A process fluid filter is located downstream from a process fluid source as well as a system valve. Downstream from the process fluid filter there are no valves. Dispense actions can be initiated and stop while the system valve is open by using the elongate bladder. The elongate bladder can be expanded to stop or pause a dispense action, and then be contracted to assist with a dispense action.Type: ApplicationFiled: August 11, 2017Publication date: February 15, 2018Inventors: Anton J. deVilliers, Rodney L. Robison, Ronald Nasman, David Travis, James Grootegoed, Norman A. Jacobson, JR., Lior Huli, Joshua S. Hooge
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Publication number: 20180046082Abstract: Techniques herein include a bladder-based dispense system using an elongate bladder configured to selectively expand and contract to assist with dispense actions. This dispense system compensates for filter-lag, which often accompanies fluid filtering for microfabrication. This dispense system also provides a high-purity and high precision dispense unit. A modular hydraulic unit houses the elongate bladder and hydraulic fluid in contact with an exterior surface of the bladder. When pressurized process fluid is in the elongate bladder, hydraulic controls can selectively reduce pressure on the bladder to cause expansion, and then selectively increase hydraulic pressure to assist with a dispense action.Type: ApplicationFiled: August 11, 2017Publication date: February 15, 2018Inventors: Anton J. deVilliers, Ronald Nasman, David Travis, James Grootegoed, Norman A. Jacobson, JR.
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Publication number: 20180047563Abstract: Techniques herein include a bladder-based dispense system using an elongate bladder configured to selectively expand and contract to assist with dispense actions. This dispense system compensates for filter-lag, which often accompanies fluid filtering for microfabrication. This dispense system also provides a high-purity and high precision dispense unit. A meniscus sensor monitors a position of a meniscus of process fluid at a nozzle. The elongate bladder unit is used to maintain a position of the meniscus at a particular location by selectively expanding or contracting the bladder, thereby moving or holding a meniscus position. Expansion of the elongate bladder is also used for a suck-back action after completing a dispense action.Type: ApplicationFiled: August 11, 2017Publication date: February 15, 2018Inventors: Anton J. deVilliers, Rodney L. Robison, Ronald Nasman, David Travis, James Grootegoed, Norman A. Jacobson, JR., David Hetzer, Lior Huli, Joshua S. Hooge
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Patent number: 9718082Abstract: A fluid dispensing apparatus is disclosed. Systems include an in-line or linear bladder apparatus configured to expand to collect a charge of fluid, and contract to assist with fluid delivery and dispensing. During a dispense-off period process fluid can collect in this bladder after the process fluid is pushed through a fine filter (micro filter). A given filtration rate can be less than a dispense rate and thus the system herein compensates for filter-lag that often accompanies fluid filtering for microfabrication, while providing a generally linear configuration that reduces chances for defect creation.Type: GrantFiled: January 20, 2015Date of Patent: August 1, 2017Assignee: TOKYO ELECTRON LIMITEDInventors: Anton deVilliers, Ronald Nasman, James Grootegoed, Norman A. Jacobson, Jr.
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Publication number: 20160375459Abstract: A fluid dispensing apparatus and method is disclosed. Systems include an in-line or linear bladder apparatus array configured to expand to collect a charge of fluid, and contract to assist with fluid delivery and dispensing. The bladder array is disposed within a chamber of pressure control fluid common to exterior surfaces of each bladder in the bladder array. Simultaneously, some bladders within the array of linear bladders can be dispensing fluid or maintaining fluid while some bladders are collecting fluid. A given filtration rate can be less than a dispense rate and thus the system herein compensates for filter-lag that often accompanies fluid filtering for microfabrication, while providing a generally linear configuration that reduces chances for defect creation. With multiple bladders, multiple different types of fluid can be readied for selective dispense.Type: ApplicationFiled: June 21, 2016Publication date: December 29, 2016Inventors: Anton J. deVilliers, Ronald Nasman, James Grootegoed, Norman A. Jacobson, Jr.
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Publication number: 20150209818Abstract: A fluid dispensing apparatus is disclosed. Systems include an in-line or linear bladder apparatus configured to expand to collect a charge of fluid, and contract to assist with fluid delivery and dispensing. During a dispense-off period process fluid can collect in this bladder after the process fluid is pushed through a fine filter (micro filter). A given filtration rate can be less than a dispense rate and thus the system herein compensates for filter-lag that often accompanies fluid filtering for microfabrication, while providing a generally linear configuration that reduces chances for defect creation.Type: ApplicationFiled: January 20, 2015Publication date: July 30, 2015Inventors: Anton deVilliers, Ronald Nasman, James Grootegoed, Norman A. Jacobson, JR.
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Patent number: 8048226Abstract: A processing system for treating a substrate includes a process chamber, a substrate holder, a gas distribution system, and a flow modulation element. The process chamber has a pumping system to evacuate the process chamber. The substrate holder is coupled to the process chamber and supports the substrate. The gas distribution system is coupled to the process chamber. The gas distribution system introduces a process gas to a process space above an upper surface of the substrate. The flow modulation element is coupled to the substrate holder beyond a peripheral edge of the substrate. The flow modulation element includes one or more gas distribution openings that introduce an additive process gas beyond the peripheral edge of the substrate in a direction substantially away from the substrate. The additive process gas has a directional component substantially parallel to the upper surface of the substrate.Type: GrantFiled: March 30, 2007Date of Patent: November 1, 2011Assignee: Tokyo Electron LimitedInventors: Mirko Vukovic, James Grootegoed
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Publication number: 20090242383Abstract: An IPVD source assembly and method is provided for supplying and ionizing material for coating a semiconductor wafer. The assembly includes a process space containing a plasma and an electrostatic chuck moveable in to and out of the process space. The chuck is configured to support the semiconductor wafer. The assembly further includes a first shield in electrical communication with a table and a second shield. The first shield is configured to shield at least a portion of the electrostatic chuck when the chuck is in the process space and the second shield is configured to shield at least a portion of a space below the electrostatic chuck and the process space. A conducting element electrically connects the second shield to the table to substantially prevent a formation of a second plasma in the space below the electrostatic chuck and the process space.Type: ApplicationFiled: March 31, 2008Publication date: October 1, 2009Applicant: TOKYO ELECTRON LIMITEDInventors: Mirko Vukovic, James Grootegoed, Rodney L. Robison, Toshiaki Fujisato
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Publication number: 20080236497Abstract: A processing system for treating a substrate includes a process chamber, a substrate holder, a gas distribution system, and a flow modulation element. The process chamber has a pumping system to evacuate the process chamber. The substrate holder is coupled to the process chamber and supports the substrate. The gas distribution system is coupled to the process chamber. The gas distribution system introduces a process gas to a process space above an upper surface of the substrate. The flow modulation element is coupled to the substrate holder beyond a peripheral edge of the substrate. The flow modulation element includes one or more gas distribution openings that introduce an additive process gas beyond the peripheral edge of the substrate in a direction substantially away from the substrate.Type: ApplicationFiled: March 30, 2007Publication date: October 2, 2008Applicant: TOKYO ELECTON LIMITEDInventors: Mirko Vukovic, James Grootegoed
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Patent number: 6592434Abstract: A wafer carrier (300) for a CMP tool is adjustable to provide center fast to edge fast material removal from a semiconductor wafer. The wafer carrier (300) holds the semiconductor wafer without vacuum. The semiconductor wafer is held by a carrier ring (308). An elastically flexed wafer support structure (318) is a support surface for the semiconductor wafer. Elastically flexed wafer support structure (318) can be bowed outward or bowed inward in an infinite number of different contours. The semiconductor wafer conforms to the contour of the elastically flexed wafer support structure (318) when a down force is applied to the wafer carrier (300) during a polishing process. Changing the contour is used to produce different material removal rates across the radius of the semiconductor wafer to increase wafer planarity in a polishing process.Type: GrantFiled: November 16, 2000Date of Patent: July 15, 2003Assignee: Motorola, Inc.Inventors: James F. Vanell, James A. Grootegoed, Laura John
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Patent number: 6406555Abstract: A dilution tool (100) and a method to prepare a solution by mixing of two fluids in a filter (130) to form a desired solution. Sealless pumps (141, 142) are driven by a common motor (143) to pump the fluids at a constant ratio of their respective flow rates while the flow rate of the solution varies. The conductivity or resistivity of the solution is measured with a measurement device (166) to determine the concentration.Type: GrantFiled: February 1, 2000Date of Patent: June 18, 2002Assignee: Motorola Inc.Inventors: James A. Grootegoed, James F. Vanell
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Patent number: 6070600Abstract: A dilution tool (100) and a method prepare a solution of two fluids for removing residue from a semiconductor wafer. The fluids are combined in a filter (130) to form the desired solution. Sealless pumps (141, 142) are driven by a common motor (143) to pump the fluids at a constant ratio of their respective flow rates while the flow rate of the solution varies. The conductivity of the solution is measured with a conductivity meter (166) to determine the concentration.Type: GrantFiled: July 1, 1997Date of Patent: June 6, 2000Assignee: Motorola, Inc.Inventors: James A. Grootegoed, James F. Vanell