Abstract: A hybrid outsole construction comprises high-density carbon rubber molded to low-density blown rubber, providing increased flexibility, cushion, and comfort while maintaining durability, traction, and shock absorbency of the footwear. In accordance with another aspect of the present invention, the hybrid outsole construction is stitched to the upper layers of the footwear, for example using a welt.

Abstract: A semiconductor substrate is provided, and a gate oxide layer is formed on said semiconductor substrate. Next, a poly film is deposited on said gate oxide layer, and a photo-resist is formed on the poly film for defining a length of poly gate. Then, proceeding with an ion implant of the lightly doped drain (LDD) through the poly film into the structure by the photo-resist as a mask, so as to form a lightly doped drain region in the semiconductor substrate. Next, the width of the photo-resist layer is added to be as an ion-implanted mask. The poly film is etched to form a poly gate. Then, a source/drain region is formed in the semiconductor by a ion implanting, wherein the photo-resist can be treated by thermal method or resolution enhancement lithography assisted by chemical shrink (RELACS) process to control the profile width of the photo-resist.

Abstract: A method of manufacturing a mask ROM. A sacrificial silicon oxide layer is formed on the active region upon the substrate. Patterning the sacrificial silicon oxide layer in order to form a plurality of parallel openings, thereby exposing a portion of the active region. A polysilicon layer is formed on the openings and openings are formed thereon. An ion implantation process is performed on the polysilicon layer. Using a thermal flow process, the ions within the polysilicon layer are driven through the openings into the lower portion of the substrate, thereby forming an ion doping region. The polysilicon layer is etchbacked until the sacrificial silicon oxide layer is exposed. The sacrificial silicon oxide layer is removed.

Abstract: The present invention is directed to a footwear construction having an insert of unitary structure and made of a single flexible material for providing increased structural support and strength of the footwear while maintaining flexibility of the footwear. Unlike the prior art insert, the present invention makes use of only a single material is used to manufacture the insert. A preferred material should be pliant or flexible and yet can provide the strength and structural support to the footwear in which the insert is used. Instead of using materials of different softness for the various sections in the insert to facilitate bending of the footwear, openings are added to various locations in the insert to facilitate planar bending movement. Such openings are commonly located in the forefoot section. To increase structural support and strength to the footwear, the insert is fixedly secured to the footwear.

Abstract: An electrode plate assembly for installation to an etching console includes a cooling electrode plate, an aligning peg, a covering plate and a plurality of screws for coupling the electrode cooling plate and cover plate. The cooling electrode plate is formed of a metallic, disk-shaped electrode plate including an aligning peg securing hole, a plurality of first screw holes and a plurality of first vent holes. The aligning peg is located within the aligning peg securing hole and protrudes from the cooling electrode plate. The covering plate is a thin disk-shaped plate including an aligning peg receiving hole, a plurality of second screw holes and a plurality of second vent holes. Upon installation, the covering plate and the cooling electrode plate are coupled by a plurality of screws through the first and second screw holes, with the aligning peg received in the aligning peg receiving hole of the covering plate to assure proper alignment of the plates.

Abstract: A process for fabricating a mixed signal integrated circuit on a substrate, wherein the substrate is partially covered with a field oxide layer. An oxide layer is formed over a portion of the substrate, wherein the portion of the substrate is not covered with the field oxide layer. First impurities are implanted into the substrate, wherein the first impurities damage the oxide layer. A buffer layer is formed over the oxide layer. A polysilicon layer is formed over the buffer layer. Second impurities are implanted into the polysilicon layer, wherein the buffer layer prevents the oxide layer form being damaged by the second impurities. The polysilicon layer is etched to remove the polysilicon layer, wherein the buffer layer prevents the oxide layer and the substrate from being etched. The portion of buffer layer and the damaged oxide layer over the substrate are removed. The gate oxide layer is formed over the substrate.

Abstract: An improved fuel line insert includes a cylindrical housing extending between oppositely disposed input and output ports, and constructed to include inner and outer chamber surfaces, such that an internal volume is realized in a form of an internal chamber extending between the input and output ports. At least two permanent magnets oppositely disposed from each other and mounted at each magnet's south pole into the inner chamber surface such that each magnets north poles face each other in the chamber in such an arrangement that fuel may flow between the two. The improvement lies in strength of the material comprising the casing and the magnets which is a result of construction of same with a nickel/low carbon steel alloy.