Patents by Inventor James J. Ferrell

James J. Ferrell has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8982922
    Abstract: An aspect of the disclosed subject matter includes a method of reducing the laser absorption of a beam reverser prism consisting of at least one of the following: increasing a first distance between a first incident point and a chamfered corner, wherein the first incident point is on a first reflective surface of the prism and the chamfered corner is formed between the first reflective surface and a second reflective surface of the prism, wherein the chamfered corner has a chamfered surface; increasing a second distance between a second incident point and the chamfered corner, wherein the second incident point is on the second reflective surface of the prism; and increasing a reflectivity of the chamfered surface of the chamfered corner of the prism. A method of determining a prime cut for an optical component is also disclosed. A laser including at least one prime cut optical component is also disclosed.
    Type: Grant
    Filed: August 17, 2012
    Date of Patent: March 17, 2015
    Assignee: Cymer, LLC
    Inventors: Hong Ye, Alex Ershov, Rajasekhar Rao, Daniel Brown, Slava Rokitski, Rong (Lauren) Liu, Ray Cybulski, James J. Ferrell, Robert Bergstedt, John Viatella, Thomas Duffey
  • Publication number: 20120307858
    Abstract: An aspect of the disclosed subject matter includes a method of reducing the laser absorption of a beam reverser prism consisting of at least one of the following: increasing a first distance between a first incident point and a chamfered corner, wherein the first incident point is on a first reflective surface of the prism and the chamfered corner is formed between the first reflective surface and a second reflective surface of the prism, wherein the chamfered corner has a chamfered surface; increasing a second distance between a second incident point and the chamfered corner, wherein the second incident point is on the second reflective surface of the prism; and increasing a reflectivity of the chamfered surface of the chamfered corner of the prism. A method of determining a prime cut for an optical component is also disclosed. A laser including at least one prime cut optical component is also disclosed.
    Type: Application
    Filed: August 17, 2012
    Publication date: December 6, 2012
    Inventors: Hong Ye, Alex Ershov, Rajasekhar Rao, Daniel Brown, Slava Rokitski, Rong (Lauren) Liu, Ray Cybulski, James J. Ferrell, Robert Bergstedt, John Viatella, Thomas Duffey
  • Patent number: 8284815
    Abstract: An aspect of the disclosed subject matter includes a method of reducing the laser absorption of a beam reverser prism consisting of at least one of the following: increasing a first distance between a first incident point and a chamfered corner, wherein the first incident point is on a first reflective surface of the prism and the chamfered corner is formed between the first reflective surface and a second reflective surface of the prism, wherein the chamfered corner has a chamfered surface; increasing a second distance between a second incident point and the chamfered corner, wherein the second incident point is on the second reflective surface of the prism; and increasing a reflectivity of the chamfered surface of the chamfered corner of the prism. A method of determining a prime cut for an optical component is also disclosed. A laser including at least one prime cut optical component is also disclosed.
    Type: Grant
    Filed: October 9, 2009
    Date of Patent: October 9, 2012
    Assignee: Cymer, Inc.
    Inventors: Hong Ye, Alex Ershov, Rajasekhar Rao, Daniel Brown, Slava Rokitski, Rong (Lauren) Liu, Ray Cybulski, James J. Ferrell, Robert Bergstedt, John Viatella, Thomas Duffey
  • Patent number: 7995637
    Abstract: One aspect of the disclosed subject matter describes a gas discharge laser chamber. The gas discharge laser chamber includes a discharge region formed between a first electrode and a second electrode, a tangential fan for circulating gas through the discharge region, wherein the fan is proximate to an input side of the discharge region, an input side acoustic baffle proximate to the input side of the discharge region. The input side acoustic baffle includes a vanishing point leading edge, a vanishing point trailing edge, a gas flow smoothing offset surface aligning a gas flow from a surface of the input side acoustic baffle to an input side of a cathode support in the discharge region, a plurality of ridges separated by a plurality of trenches, wherein the plurality of ridges and the plurality of trenches are aligned with a direction of gas flow through the discharge region and wherein the plurality of ridges have a random pitch between about 0.3 and about 0.7 inch.
    Type: Grant
    Filed: October 21, 2009
    Date of Patent: August 9, 2011
    Assignee: Cymer, Inc.
    Inventors: Richard L. Sandstrom, William N. Partlo, Daniel J. W. Brown, Bryan G. Moosman, Tae H. Chung, Thomas P. Duffey, James J. Ferrell, Terance Hilsabeck
  • Publication number: 20100142582
    Abstract: One aspect of the disclosed subject matter describes a gas discharge laser chamber. The gas discharge laser chamber includes a discharge region formed between a first electrode and a second electrode, a tangential fan for circulating gas through the discharge region, wherein the fan is proximate to an input side of the discharge region, an input side acoustic baffle proximate to the input side of the discharge region. The input side acoustic baffle includes a vanishing point leading edge, a vanishing point trailing edge, a gas flow smoothing offset surface aligning a gas flow from a surface of the input side acoustic baffle to an input side of a cathode support in the discharge region, a plurality of ridges separated by a plurality of trenches, wherein the plurality of ridges and the plurality of trenches are aligned with a direction of gas flow through the discharge region and wherein the plurality of ridges have a random pitch between about 0.3 and about 0.7 inch.
    Type: Application
    Filed: October 21, 2009
    Publication date: June 10, 2010
    Inventors: Richard L. Sandstrom, William N. Partlo, Daniel J. W. Brown, Bryan G. Moosman, Tae H. Chung, Thomas P. Duffey, James J. Ferrell, Terance Hilsabeck
  • Publication number: 20100098120
    Abstract: An aspect of the disclosed subject matter includes a method of reducing the laser absorption of a beam reverser prism consisting of at least one of the following: increasing a first distance between a first incident point and a chamfered corner, wherein the first incident point is on a first reflective surface of the prism and the chamfered corner is formed between the first reflective surface and a second reflective surface of the prism, wherein the chamfered corner has a chamfered surface; increasing a second distance between a second incident point and the chamfered corner, wherein the second incident point is on the second reflective surface of the prism; and increasing a reflectivity of the chamfered surface of the chamfered corner of the prism. A method of determining a prime cut for an optical component is also disclosed. A laser including at least one prime cut optical component is also disclosed.
    Type: Application
    Filed: October 9, 2009
    Publication date: April 22, 2010
    Inventors: Hong Ye, Alex Ershov, Rajasekhar Rao, Daniel Brown, Slava Rokitski, Rong (Lauren) Liu, Ray Cybulski, James J. Ferrell, Robert Bergstedt, John Viatella, Thomas Duffey
  • Patent number: 7564888
    Abstract: An apparatus and method is disclosed which may comprise a high power excimer or molecular fluorine gas discharge laser DUV light source system which may comprise: a pulse stretcher which may comprise: an optical delay path mirror, an optical delay path mirror gas purging assembly which may comprise: a purging gas supply system directing purging gas across a face of the optical delay line mirror. The optical delay path mirror may comprise a plurality of optical delay path mirrors; the purging gas supply system may direct purging gas across a face of each of the plurality of optical delay line mirrors. The purging gas supply system may comprise: a purging gas supply line; a purging gas distributing and directing mechanism which may direct purging gas across the face of the respective optical delay path mirror.
    Type: Grant
    Filed: May 23, 2007
    Date of Patent: July 21, 2009
    Assignee: Cymer, Inc.
    Inventors: Alexander I. Ershov, James J. Ferrell, Thomas Hofmann, Daniel J. Reiley, Christopher R. Remen, Richard L. Sandstrom