Patents by Inventor James J. Hofmann

James J. Hofmann has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5486126
    Abstract: A process is provided for forming spacers useful in large area displays. The process comprises steps of: forming bundles comprising fiber strands which are held together with a binder; slicing the bundles into slices; adhering the slices on an electrode plate of the display; and removing the binder.
    Type: Grant
    Filed: November 18, 1994
    Date of Patent: January 23, 1996
    Assignee: Micron Display Technology, Inc.
    Inventors: David A. Cathey, James J. Hofmann, Danny Dynka, Darryl M. Stansbury
  • Patent number: 5047131
    Abstract: A method of depositing thin films of silicon based compounds, particularly silicon dioxide, by cathode reactive sputtering utilizes a rotating cylindrical magnetron driven by a d.c. potential. The result is a technique of forming a uniform film on large substrates with high deposition rates. Arcing normally associated with sputtering troublesome dielectric coatings such as silicon oxides is substantially eliminated.
    Type: Grant
    Filed: November 8, 1989
    Date of Patent: September 10, 1991
    Assignee: The BOC Group, Inc.
    Inventors: Jesse D. Wolfe, Carolynn Boehmler, James J. Hofmann
  • Patent number: 4847469
    Abstract: A vaporizing apparatus delivers precisely controlled, substantially continuous and monitored vapor flows for uses such as in plasma enhanced vapor deposition. The vaporizing apparatus includes a fluid passageway along which are a pumping device, a vaporizing device, and a flowing device, all in fluid communication with the passageway. The vaporizing device vaporizes liquid pumped from the pumping device and includes a heat sink layer, a heated layer, and a portion of the passageway sandwiched therebetween. The vaporizing apparatus can sustain a flow of organosilicon vapor at a flow rate of about 1 to about 100 SCCM for as long as desired.
    Type: Grant
    Filed: July 15, 1987
    Date of Patent: July 11, 1989
    Assignee: The BOC Group, Inc.
    Inventors: James J. Hofmann, Robert R. Hoffman, John T. Felts
  • Patent number: 4769291
    Abstract: A method for depositing a protective coating by cathode sputtering of an alloy of aluminum and silicon in a reactive gas is disclosed. The sputtering target contains sufficient silicon to produce an amorphous coating; 6 to 18 percent silicon is preferred. Targets of approximately 88% aluminum and 12% silicon are especially preferred. Oxygen, nitrogen, compounds of oxygen and compounds of nitrogen are preferred reactive gases. A range of combinations of oxygen and nitrogen are particularly preferred. The method provides durable transparent coatings which may be used as an overcoating for a metal or dielectric coating to provide increased resistance to abrasion and corrosion. In particular, the protected coating may be a metal, dielectric or dielectric-metal-dielectric coating as used in double-glazed window units for buildings or vehicles.
    Type: Grant
    Filed: February 2, 1987
    Date of Patent: September 6, 1988
    Assignee: The BOC Group, Inc.
    Inventors: Abraham I. Belkind, Erik Bjornard, James J. Hofmann, Donald V. Jacobson, Steven J. Nadel