Abstract: We disclose several instrument architectures for the measurement of arbitrary phase retardation on advanced lithography photomasks. These architectures combine traditional interferometric techniques with high-magnification UV microscopy. Features are interrogated using a multitude of phase probes, formed by a imaging a number of variable apertures back-illuminated by phase-coherent beams, onto the surface of the photomask with a given demagnification. The size, spacing, and orientation of the phase probes may be adjusted to suit photomask feature geometries. Means are provided to vary the relative optical phase between the phase probes. These phase probes both reflect from and transmit through the photomask; the stationary, non-localized interference fringes, formed in the regions of phase probe electric field overlap, contain information on the optical path difference between the two probes.

Abstract: This invention greatly improves the quality of images obtained using optical systems illuminated by coherent light. It does so by removing the undesirable psuedo-random variations in the final image due to interference speckle and inhomogeneities in the spatial intensity distribution of the light source. A bundle of light-guiding fibers is interposed between the illumination source and the imaging system. Non-uniform propagation within the fiber bundle creates a psuedo-random phase variation across the illumination beam, which gives rise to a dynamic interference speckle pattern superimposed upon the desired image acquired by the optical system. Rotating the fiber bundle around the axis of propagation, whilst simultaneously integrating the output of the photosensitive detector over a period of time, substantially removes variations due to source inhomogeneities and coherent interference.