Patents by Inventor James M. Cahill
James M. Cahill has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 12085333Abstract: A semi-passive cooling system for a component exposed to a fluid flow utilizes a hierarchical vasculature and a sacrificial transpirant to cool the component. The component includes a body that defines a transpirant reservoir and the hierarchical vasculature. The transpirant is configured to transition between a solid phase and a vapor phase over an operating temperature range of the component.Type: GrantFiled: September 8, 2020Date of Patent: September 10, 2024Assignee: Lawrence Livermore National Security, LLCInventors: James T. Cahill, Swetha Chandrasekaran, Wyatt L. Du Frane, Joshua D. Kuntz, Richard L. Landingham, Ryan Lu, Christopher M. Spadaccini, Amy Wat, Seth E. Watts, Marcus A Worsley
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Patent number: 7177019Abstract: This invention is an apparatus for imaging metrology, which in particular embodiments may be integrated with a processor station such that a metrology station is apart from but coupled to a process station. The metrology station is provided with a first imaging camera with a first field of view containing the measurement region. Alternate embodiments include a second imaging camera with a second field of view. Preferred embodiments comprise a broadband ultraviolet light source, although other embodiments may have a visible or near infrared light source of broad or narrow optical bandwidth. Embodiments including a broad bandwidth source typically include a spectrograph, or an imaging spectrograph. Particular embodiments may include curved, reflective optics or a measurement region wetted by a liquid. In a typical embodiment, the metrology station and the measurement region are configured to have 4 degrees of freedom of movement relative to each other.Type: GrantFiled: February 1, 2005Date of Patent: February 13, 2007Assignee: Tokyo Electron LimitedInventors: Fred E. Stanke, Douglas E. Ruth, James M. Cahill, Michael Weber, Clinton B. Carlisle, Hung Pham, Edric Tong, Elliot Burke
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Patent number: 7042580Abstract: This invention is an apparatus for imaging metrology, which in particular embodiments may be integrated with a processor station such that a metrology station is apart from but coupled to a process station. The metrology station is provided with a first imaging camera with a first field of view containing the measurement region. Alternate embodiments include a second imaging camera with a second field of view. Preferred embodiments comprise a broadband ultraviolet light source, although other embodiments may have a visible or near infrared light source of broad or narrow optical bandwidth. Embodiments including a broad bandwidth source typically include a spectrograph, or an imaging spectrograph. Particular embodiments may include curved, reflective optics or a measurement region wetted by a liquid. In a typical embodiment, the metrology station and the measurement region are configured to have 4 degrees of freedom of movement relative to each other.Type: GrantFiled: March 22, 2000Date of Patent: May 9, 2006Assignee: Tokyo Electron LimitedInventors: Fred E. Stanke, Clinton B. Carlisle, Hung Pham, Edric Tong, Douglas E. Ruth, James M. Cahill, Michael Weber, Elliot Burke
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Patent number: 6919958Abstract: This invention is an apparatus for imaging metrology, which in particular embodiments may be integrated with a processor station such that a metrology station is apart from but coupled to a process station. The metrology station is provided with a first imaging camera with a first field of view containing the measurement region. Alternate embodiments include a second imaging camera with a second field of view. Preferred embodiments comprise a broadband ultraviolet light source, although other embodiments may have a visible or near infrared light source of broad or narrow optical bandwidth. Embodiments including a broad bandwidth source typically include a spectrograph, or an imaging spectrograph. Particular embodiments may include curved, reflective optics or a measurement region wetted by a liquid. In a typical embodiment, the metrology station and the measurement region are configured to have 4 degrees of freedom of movement relative to each other.Type: GrantFiled: March 26, 2003Date of Patent: July 19, 2005Assignee: Therma-Wave, Inc.Inventors: Fred E. Stanke, Clinton B. Carlisle, Hung Van Pham, Edric Tong, Douglas E. Ruth, James M. Cahill, Jr., Michael Weber-Grabau, Elliot Burke, Adam E. Norton
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Publication number: 20030184742Abstract: This invention is an apparatus for imaging metrology, which in particular embodiments may be integrated with a processor station such that a metrology station is apart from but coupled to a process station. The metrology station is provided with a first imaging camera with a first field of view containing the measurement region. Alternate embodiments include a second imaging camera with a second field of view. Preferred embodiments comprise a broadband ultraviolet light source, although other embodiments may have a visible or near infrared light source of broad or narrow optical bandwidth. Embodiments including a broad bandwidth source typically include a spectrograph, or an imaging spectrograph. Particular embodiments may include curved, reflective optics or a measurement region wetted by a liquid. In a typical embodiment, the metrology station and the measurement region are configured to have 4 degrees of freedom of movement relative to each other.Type: ApplicationFiled: March 26, 2003Publication date: October 2, 2003Inventors: Fred E. Stanke, Clinton B. Carlisle, Hung Pham, Edric Tong, Douglas E. Ruth, James M. Cahill, Michael Weber-Graban, Elliot Burke
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Patent number: 6563586Abstract: This invention is an apparatus for imaging metrology, which in particular embodiments may be integrated with a processor station such that a metrology station is apart from but coupled to a process station. The metrology station is provided with a first imaging camera with a first field of view containing the measurement region. Alternate embodiments include a second imaging camera with a second field of view. Preferred embodiments comprise a broadband ultraviolet light source, although other embodiments may have a visible or near infrared light source of broad or narrow optical bandwidth. Embodiments including a broad bandwidth source typically include a spectrograph, or an imaging spectrograph. Particular embodiments may include curved, reflective optics or a measurement region wetted by a liquid. In a typical embodiment, the metrology station and the measurement region are configured to have 4 degrees of freedom of movement relative to each other.Type: GrantFiled: July 10, 2000Date of Patent: May 13, 2003Assignee: Therma-Wave, Inc.Inventors: Fred E. Stanke, Clinton B. Carlisle, Hung Pham, Edric Tong, Douglas E. Ruth, James M. Cahill, Michael Weber, Elliot Burke
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Publication number: 20020018217Abstract: A wafer measurement station integrated within a process tool has a scatterometry instrument for measuring patterned features on wafers. A wafer handler feeds wafers between a cassette and one or more process stations of the process tool. Wafers presented to the measurement station are held on a wafer support, which may be moveable, and a scatterometry instrument has an optical measurement system that is moveable by a stage over the wafer support. A window isolates the moveable optics from the wafer. The optical measurement system are microscope-based optics forming a low NA system. The illumination spot size at the wafer is larger than a periodicity of the patterned features, and data processing uses a scattering model to analyze the optical signature of the collected light.Type: ApplicationFiled: August 10, 2001Publication date: February 14, 2002Inventors: Michael Weber-Grabau, Edric H. Tong, Adam E. Norton, Fred E. Stanke, James M. Cahill, Douglas E. Ruth
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Patent number: 6212741Abstract: A tether based connector for locating, identifying, inventorying, controlling and helping to ensure the retrieval of one or more items packaged within a container loaded with potentially obscuring packaging materials. The connector terminates at a fastener at one end for releasably fastening to an item, and at an easily located terminus at the other end. The terminus may be formed as an anchorment for anchoring to the container. A single anchorment may be adapted to serve a plurality of tethers for fastening to a plurality of items. A badge carrying item identifying information can be associated with a connector. A dispenser or applicator dispenses multiple connectors. An oblong foam slab is separable into anchorment and fastener portions connected by the tether extendible from at least one of the portions. Also disclosed is an inventive method for packaging items with tethers.Type: GrantFiled: March 20, 1998Date of Patent: April 10, 2001Inventor: James M. Cahill
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Patent number: 5488808Abstract: An interlock system for locking wall panel frames. Vertical frame members are provided with keyhole-shaped openings for receipt therethrough of the head of a carriage bolt in one portion and having and a second elongate slotted portion capable of a non-rotationable engagement with the carriage bolt. A threaded shaft of the carriage bolt being threadably engageable by a dowel freely rotationally held by a lever bracket whereby the dowel can be threaded along the threaded shaft to bring the lever bracket against one of the vertical frame members. The latch bracket having camming edges and being pivotal around said dowel in a past-center relation whereby to cam said camming edges against the second frame member and lock the two vertical frame members together without the use of hand tools. Access from only one side of a panel frame joint is necessary to engage or disengage the interlock system.Type: GrantFiled: June 1, 1994Date of Patent: February 6, 1996Assignee: Allsteel Inc.Inventors: James M. Cahill, Dale E. White