Patents by Inventor James M. Oberschmidt

James M. Oberschmidt has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20160246167
    Abstract: Methods, program products, and systems for improving optical proximity correction (OPC) calibration, and automatically determining a minimal number of clips, are disclosed. The method can include using a computing device to perform actions including: calculating a total relevancy score for a projected sample plan including a candidate clip, and wherein the relevancy score is derived from at least one relevancy criterion and a relevancy weight; calculating a relevancy score for the candidate clip, the relevancy score for the candidate clip being a contribution from the candidate clip to the total relevancy score; and adding the candidate clip to a sample plan for the IC layout and removing the candidate clip from the plurality of clips in response a difference in relevancy score between the projected sample plan and one or more previous sample plans substantially fitting a non-linear relevancy score function.
    Type: Application
    Filed: February 23, 2015
    Publication date: August 25, 2016
    Inventors: Amr Y. Abdo, Nathalie Casati, Maria Gabrani, James M. Oberschmidt, Ramya Viswanathan, Josef S. Watts
  • Patent number: 9405186
    Abstract: Methods, program products, and systems for improving optical proximity correction (OPC) calibration, and automatically determining a minimal number of clips, are disclosed. The method can include using a computing device to perform actions including: calculating a total relevancy score for a projected sample plan including a candidate clip, and wherein the relevancy score is derived from at least one relevancy criterion and a relevancy weight; calculating a relevancy score for the candidate clip, the relevancy score for the candidate clip being a contribution from the candidate clip to the total relevancy score; and adding the candidate clip to a sample plan for the IC layout and removing the candidate clip from the plurality of clips in response a difference in relevancy score between the projected sample plan and one or more previous sample plans substantially fitting a non-linear relevancy score function.
    Type: Grant
    Filed: February 23, 2015
    Date of Patent: August 2, 2016
    Assignee: GlobalFoundries, Inc.
    Inventors: Amr Y. Abdo, Nathalie Casati, Maria Gabrani, James M. Oberschmidt, Ramya Viswanathan, Josef S. Watts
  • Patent number: 6030541
    Abstract: A pattern in a surface is defined by providing on the surface a hard mask material; depositing an anti-reflective coating on the hard mask material; applying a photoresist layer on the anti-reflective coating; patterning the photoresist layer, anti-reflective layer and hard mask material; and removing the remaining portions of the photoresist layer and anti-reflective layer; and then patterning the substrate using the hard mask as the mask. Also provided is a structure for defining a pattern in a surface which comprises a surface having a hard mask material thereon; an anti-reflective coating located on the hard mask material; and a photoresist located on the anti-reflective coating. Also provided is an etchant composition for removing the hard mask material which comprises an aqueous composition of HF and chlorine.
    Type: Grant
    Filed: June 19, 1998
    Date of Patent: February 29, 2000
    Assignee: International Business Machines Corporation
    Inventors: James W. Adkisson, Michael Caterer, James T. Marsh, Hung Ng, James M. Oberschmidt, Jed H. Rankin
  • Patent number: 4862318
    Abstract: An improved method for forming shorting bars on ceramic capacitors of the tab type includes the step of effecting a final polishing of the tab exposed surface utilizing grit or abrasives of a critical size, namely of average particle size in the range of about 2 to about 10 microns. The method further employs thin film metallurgy namely the vacuum deposition or sputtering of one or more layers within specified thickness ranges. There is further disclosed an improved capacitor fabricated in accordance with the method described.
    Type: Grant
    Filed: April 4, 1989
    Date of Patent: August 29, 1989
    Assignees: AVX Corporation, IBM Corporation
    Inventors: John Galvagni, James M. Oberschmidt, James N. Humenik
  • Patent number: 4831494
    Abstract: Disclosed is a multilayer capacitor consisting of a plurality of laminae with each of the laminae including a conductive plate portion and a non-conductive sheet portion. The conductive plate portion has at least one tab projecting to at least one edge of the conductive plate portion with the maximum number of tabs per conductive plate portion being limited to avoid excessive lateral congestion. The laminae are divided into different groups with the laminae from each group having the same number and location of tabs and with the laminae from different groups differing by at least the location of the tabs.
    Type: Grant
    Filed: June 27, 1988
    Date of Patent: May 16, 1989
    Assignee: International Business Machines Corporation
    Inventors: Allen J. Arnold, Michael E. Bariether, Shin-Wu Chiang, Hormazdyar M. Dalal, Robert A. Miller, Frank A. Montegari, James M. Oberschmidt, David T. Shen
  • Patent number: 4814940
    Abstract: A capacitor with a low parasitic inductance, which is particularly suited for use as a decoupling capacitor, that has a prismatic or polyhedral shape and includes a plurality of internal capacitor plates positioned and separated by dielectric material. The improvement is that each plate is provided with a tab that projects diagonally to a corner of the body with the edge of the tab exposed. A metal layer on the outside of the body electrically connects the plates in the desired sequence.
    Type: Grant
    Filed: May 28, 1987
    Date of Patent: March 21, 1989
    Assignee: International Business Machines Corporation
    Inventors: Richard E. Horstmann, James M. Oberschmidt
  • Patent number: 4622205
    Abstract: Electromigration activity is decreased and lifetime is extended in solder stripes employed as conductors and terminals on microelectronic devices by forming an alloy of a solute element, such as copper, with tin in a lead/tin solder and providing a substantially uniform distribution of particles of the intermetallic compound in the solder. The concentration of the solute element is maintained at less than about three times the tin concentration and less than about 10% of the amount of the solder.
    Type: Grant
    Filed: April 12, 1985
    Date of Patent: November 11, 1986
    Assignee: IBM Corporation
    Inventors: David P. Fouts, Devandra Gupta, Paul S. Ho, Jasvir S. Jaspal, James R. Lloyd, Jr., James M. Oberschmidt, Kris V. Srikrishnan, Michael J. Sullivan