Abstract: A product workpiece can be processed to form product dice. A test mask can allow intentional changes to be made to a feature on the product workpiece to examine how the altered feature performs. Use of the test mask may be used or not used based on the needs or desires of skilled artisans. By using the test mask, a separate dedicated test structure is not required to be formed in a scribe lane or within an area that could otherwise be used for a product die. Thus, the sampling level by using the test mask can be varied. Also, separate test workpieces, which may not be processed using a significantly different process flow or at significantly different times as compared to product workpieces, are not required. The product workpiece with the altered feature can be electrically tested without the need to form test or bond pads.

Abstract: A method for detecting sequential processing effects on integrated circuits to be manufactured in a manufacturing process, includes: determining a first random sequence for a plurality of wafers; performing a first process step on the plurality of wafers by a first process tool in accordance with the first random sequence; determining a second random sequence for the plurality of wafers; and performing a second process step on the plurality of wafers by a second process tool in accordance with the second random sequence. The method performs randomization of wafer processing sequences at the process tool itself. By performing randomization of wafer processing sequences at the process tool, the need for separate wafer handlers is eliminated, resulting in significant cost reduction, clean-room space savings, improved yield, improved manufacturing cycle time, and improved signal-detection capabilities.