Patents by Inventor James MacAllen Chalmers

James MacAllen Chalmers has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20140366952
    Abstract: A method and apparatus for self-calibrating control of gas flow. The gas flow rate is initially set by controlling, to a high degree of precision, the amount of opening of a flow restriction, where the design of the apparatus containing the flow restriction lends itself to achieving high precision. The gas flow rate is then measured by a pressure rate-of-drop upstream of the flow restriction, and the amount of flow restriction opening is adjusted, if need be, to obtain exactly the desired flow.
    Type: Application
    Filed: September 2, 2014
    Publication date: December 18, 2014
    Inventors: Adam J. Monkowski, James MacAllen Chalmers, Jialing Chen, Tao Ding, Joseph R. Monkowski
  • Publication number: 20140367596
    Abstract: A method and apparatus for self-calibrating control of gas flow. The gas flow rate is initially set by controlling, to a high degree of precision, the amount of opening of a flow restriction, where the design of the apparatus containing the flow restriction lends itself to achieving high precision. The gas flow rate is then measured by a pressure rate-of-drop upstream of the flow restriction, and the amount of flow restriction opening is adjusted, if need be, to obtain exactly the desired flow.
    Type: Application
    Filed: September 2, 2014
    Publication date: December 18, 2014
    Inventors: Adam J. Monkowski, James MacAllen Chalmers, Jialing Chen, Tao Ding, Joseph R. Monkowski
  • Patent number: 8857456
    Abstract: Methods and apparatus utilize a rate of drop in pressure upstream of a gas flow controller (GFC) to accurately measure a rate of flow through the GFC. Measurement of the gas flow through the many gas flow controllers in production use today is enabled, without requiring any special or sophisticated pressure regulators or other special components. Various provisions ensure that none of the changes in pressure that occur during or after the measurement perturb the constant flow of gas through the GFC under test. A pressure regulator is coupled to a gas source. The GFC is positioned downstream of the pressure regulator. A pressure transducer is measuring pressure in a volume between the pressure regulator and the GFC. Techniques are provided for increasing the pressure in the volume.
    Type: Grant
    Filed: August 13, 2012
    Date of Patent: October 14, 2014
    Assignee: Pivotal Systems Corporation
    Inventors: Joseph R. Monkowski, Jialing Chen, Tao Ding, James MacAllen Chalmers
  • Patent number: 8667830
    Abstract: Methods and apparatus utilize a rate of drop in pressure upstream of a gas flow controller (GFC) to accurately measure a rate of flow through the GFC. Measurement of the gas flow through the many gas flow controllers in production use today is enabled, without requiring any special or sophisticated pressure regulators or other special components. Various provisions ensure that none of the changes in pressure that occur during or after the measurement perturb the constant flow of gas through the GFC under test.
    Type: Grant
    Filed: September 27, 2010
    Date of Patent: March 11, 2014
    Assignee: Pivotal Systems Corporation
    Inventors: Joseph R. Monkowski, Jialing Chen, Tao Ding, James MacAllen Chalmers
  • Publication number: 20120304781
    Abstract: Methods and apparatus utilize a rate of drop in pressure upstream of a gas flow controller (GFC) to accurately measure a rate of flow through the GFC. Measurement of the gas flow through the many gas flow controllers in production use today is enabled, without requiring any special or sophisticated pressure regulators or other special components. Various provisions ensure that none of the changes in pressure that occur during or after the measurement perturb the constant flow of gas through the GFC under test. A pressure regulator is coupled to a gas source. The GFC is positioned downstream of the pressure regulator. A pressure transducer is measuring pressure in a volume between the pressure regulator and the GFC, wherein means are provided for increasing the pressure in the volume.
    Type: Application
    Filed: August 13, 2012
    Publication date: December 6, 2012
    Applicant: Pivotal Systems Corporation
    Inventors: Joseph R. MONKOWSKI, Jialing Chen, Tao Ding, James MacAllen Chalmers
  • Patent number: 8271210
    Abstract: An in-situ gas flow measurement controller measures the temperature and rate of pressure drop upstream from a flow control device (FCD). The controller samples the pressure and temperature data and applies the equivalent of a decimating filter to the data to produce filtered data at a slower sampling rate. The controller derives timestamps by counting ticks from the sampling clock of the A/D converter that is sampling the pressure at regular intervals to ensure the timestamps associated with the pressure samples are accurate and do not contain jitter that is associated with software clocks. The controller additionally normalizes the temperature reading to account for power supply fluctuations, filters out noise from the pressure and temperature readings, and excludes data during periods of instability. It calculates the gas flow rate accounting for possible non-linearities in the pressure measurements, and provides the computed gas flow measurement via one of many possible interfaces.
    Type: Grant
    Filed: December 9, 2009
    Date of Patent: September 18, 2012
    Assignee: Pivotal Systems Corporation
    Inventors: Sherk Chung, James MacAllen Chalmers, Jialing Chen, Yi Wang, Paul Tran, Sophia Leonidovna Shtilman, Joseph R. Monkowski
  • Patent number: 8271211
    Abstract: An in-situ gas flow measurement controller measures the temperature and rate of pressure drop upstream from a flow control device (FCD). The controller samples the pressure and temperature data and applies the equivalent of a decimating filter to the data to produce filtered data at a slower sampling rate. The controller derives timestamps by counting ticks from the sampling clock of the A/D converter that is sampling the pressure at regular intervals to ensure the timestamps associated with the pressure samples are accurate and do not contain jitter that is associated with software clocks. The controller additionally normalizes the temperature reading to account for power supply fluctuations, filters out noise from the pressure and temperature readings, and excludes data during periods of instability. It calculates the gas flow rate accounting for possible non-linearities in the pressure measurements, and provides the computed gas flow measurement via one of many possible interfaces.
    Type: Grant
    Filed: December 9, 2009
    Date of Patent: September 18, 2012
    Assignee: Pivotal Systems Corporation
    Inventors: Sherk Chung, James MacAllen Chalmers, Jialing Chen, Yi Wang, Paul Tran, Sophia Leonidovna Shtilman, Joseph R. Monkowski
  • Patent number: 8265888
    Abstract: An in-situ gas flow measurement controller measures the temperature and rate of pressure drop upstream from a flow control device (FCD). The controller samples the pressure and temperature data and applies the equivalent of a decimating filter to the data to produce filtered data at a slower sampling rate. The controller derives timestamps by counting ticks from the sampling clock of the A/D converter that is sampling the pressure at regular intervals to ensure the timestamps associated with the pressure samples are accurate and do not contain jitter that is associated with software clocks. The controller additionally normalizes the temperature reading to account for power supply fluctuations, filters out noise from the pressure and temperature readings, and excludes data during periods of instability. It calculates the gas flow rate accounting for possible non-linearities in the pressure measurements, and provides the computed gas flow measurement via one of many possible interfaces.
    Type: Grant
    Filed: December 9, 2009
    Date of Patent: September 11, 2012
    Assignee: Pivotal Systems Corporation
    Inventors: Sherk Chung, James MacAllen Chalmers, Jialing Chen, Yi Wang, Paul Tran, Sophia Leonidovna Shtilman, Joseph R. Monkowski
  • Patent number: 8240324
    Abstract: Methods and apparatus utilize a rate of drop in pressure upstream of a gas flow controller (GFC) to accurately measure a rate of flow through the GFC. Measurement of the gas flow through the many gas flow controllers in production use today is enabled, without requiring any special or sophisticated pressure regulators or other special components. Various provisions ensure that none of the changes in pressure that occur during or after the measurement perturb the constant flow of gas through the GFC under test. A pressure regulator is coupled to a gas source. The GFC is positioned downstream of the pressure regulator. A pressure transducer is measuring pressure in a volume between the pressure regulator and the GFC, wherein means are provided for increasing the pressure in the volume.
    Type: Grant
    Filed: January 16, 2009
    Date of Patent: August 14, 2012
    Assignee: Pivotal Systems Corporation
    Inventors: Joseph R. Monkowski, Jialing Chen, Tao Ding, James MacAllen Chalmers
  • Publication number: 20110137581
    Abstract: An in-situ gas flow measurement controller measures the temperature and rate of pressure drop upstream from a flow control device (FCD). The controller samples the pressure and temperature data and applies the equivalent of a decimating filter to the data to produce filtered data at a slower sampling rate. The controller derives timestamps by counting ticks from the sampling clock of the A/D converter that is sampling the pressure at regular intervals to ensure the timestamps associated with the pressure samples are accurate and do not contain jitter that is associated with software clocks. The controller additionally normalizes the temperature reading to account for power supply fluctuations, filters out noise from the pressure and temperature readings, and excludes data during periods of instability. It calculates the gas flow rate accounting for possible non-linearities in the pressure measurements, and provides the computed gas flow measurement via one of many possible interfaces.
    Type: Application
    Filed: December 9, 2009
    Publication date: June 9, 2011
    Applicant: Pivotal Systems Corporation
    Inventors: Sherk CHUNG, James MacAllen Chalmers, Jialing Chen, Yi Wang, Paul Tran, Sophia Leonidovna Shtilman, Joseph R. Monkowski
  • Publication number: 20110137583
    Abstract: An in-situ gas flow measurement controller measures the temperature and rate of pressure drop upstream from a flow control device (FCD). The controller samples the pressure and temperature data and applies the equivalent of a decimating filter to the data to produce filtered data at a slower sampling rate. The controller derives timestamps by counting ticks from the sampling clock of the A/D converter that is sampling the pressure at regular intervals to ensure the timestamps associated with the pressure samples are accurate and do not contain jitter that is associated with software clocks. The controller additionally normalizes the temperature reading to account for power supply fluctuations, filters out noise from the pressure and temperature readings, and excludes data during periods of instability. It calculates the gas flow rate accounting for possible non-linearities in the pressure measurements, and provides the computed gas flow measurement via one of many possible interfaces.
    Type: Application
    Filed: December 9, 2009
    Publication date: June 9, 2011
    Applicant: Pivotal Systems Corporation
    Inventors: Sherk CHUNG, James MacAllen CHALMERS, Jialing CHEN, Yi WANG, Paul TRAN, Sophia Leonidovna SHTILMAN, Joseph R. MONKOWSKI
  • Publication number: 20110137582
    Abstract: An in-situ gas flow measurement controller measures the temperature and rate of pressure drop upstream from a flow control device (FCD). The controller samples the pressure and temperature data and applies the equivalent of a decimating filter to the data to produce filtered data at a slower sampling rate. The controller derives timestamps by counting ticks from the sampling clock of the A/D converter that is sampling the pressure at regular intervals to ensure the timestamps associated with the pressure samples are accurate and do not contain jitter that is associated with software clocks. The controller additionally normalizes the temperature reading to account for power supply fluctuations, filters out noise from the pressure and temperature readings, and excludes data during periods of instability. It calculates the gas flow rate accounting for possible non-linearities in the pressure measurements, and provides the computed gas flow measurement via one of many possible interfaces.
    Type: Application
    Filed: December 9, 2009
    Publication date: June 9, 2011
    Applicant: Pivotal Systems Corporation
    Inventors: Sherk Chung, James MacAllen Chalmers, Jialing Chen, Yi Wang, Paul Tran, Sophia Leonidovna Shtilman, Joseph R. Monkowski
  • Publication number: 20110108126
    Abstract: A method and apparatus for self-calibrating control of gas flow. The gas flow rate is initially set by controlling, to a high degree of precision, the amount of opening of a flow restriction, where the design of the apparatus containing the flow restriction lends itself to achieving high precision. The gas flow rate is then measured by a pressure rate-of-drop upstream of the flow restriction, and the amount of flow restriction opening is adjusted, if need be, to obtain exactly the desired flow.
    Type: Application
    Filed: October 15, 2010
    Publication date: May 12, 2011
    Applicant: Pivotal Systems Corporation
    Inventors: Adam J. MONKOWSKI, James MacAllen Chalmers, Jialing Chen, Tao Ding, Joseph R. Monkowski
  • Publication number: 20110011183
    Abstract: Methods and apparatus utilize a rate of drop in pressure upstream of a gas flow controller (GFC) to accurately measure a rate of flow through the GFC. Measurement of the gas flow through the many gas flow controllers in production use today is enabled, without requiring any special or sophisticated pressure regulators or other special components. Various provisions ensure that none of the changes in pressure that occur during or after the measurement perturb the constant flow of gas through the GFC under test.
    Type: Application
    Filed: September 27, 2010
    Publication date: January 20, 2011
    Applicant: Pivotal Systems Corporation
    Inventors: Joseph R. MONKOWSKI, Jialing Chen, Tao Ding, James MacAllen Chalmers
  • Patent number: 7823436
    Abstract: Methods and apparatus utilize a rate of drop in pressure upstream of a gas flow controller (GFC) to accurately measure a rate of flow through the GFC. Measurement of the gas flow through the many gas flow controllers in production use today is enabled, without requiring any special or sophisticated pressure regulators or other special components. Various provisions ensure that none of the changes in pressure that occur during or after the measurement perturb the constant flow of gas through the GFC under test.
    Type: Grant
    Filed: January 15, 2009
    Date of Patent: November 2, 2010
    Assignee: Pivotal Systems Corporation
    Inventors: Joseph R. Monkowski, Jialing Chen, Tao Ding, James MacAllen Chalmers
  • Publication number: 20090183549
    Abstract: Methods and apparatus utilize a rate of drop in pressure upstream of a gas flow controller (GFC) to accurately measure a rate of flow through the GFC. Measurement of the gas flow through the many gas flow controllers in production use today is enabled, without requiring any special or sophisticated pressure regulators or other special components. Various provisions ensure that none of the changes in pressure that occur during or after the measurement perturb the constant flow of gas through the GFC under test.
    Type: Application
    Filed: January 16, 2009
    Publication date: July 23, 2009
    Applicant: PIVOTAL SYSTEMS CORPORATION
    Inventors: Joseph R. Monkowski, Jialing Chen, Tao Ding, James MacAllen Chalmers
  • Publication number: 20090183548
    Abstract: Methods and apparatus utilize a rate of drop in pressure upstream of a gas flow controller (GFC) to accurately measure a rate of flow through the GFC. Measurement of the gas flow through the many gas flow controllers in production use today is enabled, without requiring any special or sophisticated pressure regulators or other special components. Various provisions ensure that none of the changes in pressure that occur during or after the measurement perturb the constant flow of gas through the GFC under test.
    Type: Application
    Filed: January 15, 2009
    Publication date: July 23, 2009
    Applicant: PIVOTAL SYSTEMS CORPORATION
    Inventors: Joseph R. Monkowski, Jialing Chen, Tao Ding, James MacAllen Chalmers