Patents by Inventor James Michael Mori

James Michael Mori has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Photoresist compositions and methods and articles of manufacture comprising same
    Patent number: 7704668
    Abstract: The invention provides positive-acting chemically-amplified photoresist compositions that can provide excellent lithographic performance as well as significantly enhanced storage stability. In one aspect, photoresist compositions are provided that comprise a solvent that is free of hydroxy groups (i.e. non-hydroxylic solvent), a resin binder and a photoactive compound that exhibits enhanced and long-term solubility in the solvent. In a further aspect, resists are provided that are formulated in a hydroxyl-containing solvent such as ethyl lactate and that contains a sulfonium salt photoactive compound that includes a sulfonate counter anion that can provide enhanced storage stability for the resist.
    Type: Grant
    Filed: August 4, 1998
    Date of Patent: April 27, 2010
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: James F. Cameron, James Michael Mori, George W. Orsula, Guangyu Xu, Yoshihiro Yamamoto
  • Dyed photoresists and methods and articles of manufacture comprising same
    Patent number: 7632630
    Abstract: The present invention provides new photoresist compositions that comprise a resin binder, a photoactive component, particularly an acid generator, and a dye material that contains one or more chromophores that can reduce undesired reflections of exposure radiation. Preferred dye compounds are polymeric materials that include one or more chromophores such as anthracene and other polycyclic moieties that effectively absorb deep UV exposure radiation.
    Type: Grant
    Filed: May 3, 2006
    Date of Patent: December 15, 2009
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: James Michael Mori, James W. Thackeray, Roger F. Sinta, Rosemary Bell, Robin L. Miller-Fahey, Timothy G. Adams, Thomas M. Zydowsky, Edward K. Pavelchek, Manual doCanto
  • Dyed photoresists and methods and articles of manufacture comprising same
    Publication number: 20090220888
    Abstract: The present invention provides new photoresist compositions that comprise a resin binder, a photoactive component, particularly an acid generator, and a dye material that contains one or more chromophores that can reduce undesired reflections of exposure radiation. Preferred dye compounds are polymeric materials that include one or more chromophores such as anthracene and other polycyclic moieties that effectively absorb deep UV exposure radiation.
    Type: Application
    Filed: December 12, 2008
    Publication date: September 3, 2009
    Applicant: Shipley Company, L.L.C.
    Inventors: James Michael Mori, James W. Thackeray, Roger F. Sinta, Rosemary Bell, Robin L. Miller-Fahey, Timothy G. Adams, Thomas M. Zydowsky, Edward K. Pavelchek, Manual doCanto
  • Dyed photoresists and methods and articles of manufacture comprising same
    Patent number: 7147983
    Abstract: The present invention provides new photoresist compositions that comprise a resin binder, a photoactive component, particularly an acid generator, and a dye material that contains one or more chromophores that can reduce undesired reflections of exposure radiation. Preferred dye compounds are polymeric materials that include one or more chromophores such as anthracene and other polycyclic moieties that effectively absorb deep UV exposure radiation.
    Type: Grant
    Filed: October 7, 1996
    Date of Patent: December 12, 2006
    Assignee: Shipley Company, L.L.C.
    Inventors: James Michael Mori, James W. Thackeray, Roger F. Sinta, Rosemary Bell, Robin L. Miller-Fahey, Timothy G. Adams, Thomas M. Zydowsky, Edward K. Pavelchek, Manuel doCanto
  • Photoresist compositions comprising blends of photoacid generators
    Patent number: 6803169
    Abstract: The invention provides new photoresist compositions that contain a resin binder and a blend of photoacid generators. Photoacid generator blends of the invention produce photoacids that differ in acid strength and/or size.
    Type: Grant
    Filed: February 17, 2001
    Date of Patent: October 12, 2004
    Assignee: Shipley Company, L.L.C.
    Inventors: James F. Cameron, James Michael Mori, George W. Orsula, James W. Thackeray
  • Thick film photoresists and methods for use thereof
    Patent number: 6800422
    Abstract: New methods and compositions are provided that enable application and processing of photoresist as thick coating layers, e.g. at dried layer (post soft-bake) thicknesses of in excess of 2 microns. Resists can be imaged at short wavelengths in accordance with the invention, including 248 nm.
    Type: Grant
    Filed: May 10, 2002
    Date of Patent: October 5, 2004
    Assignee: Shipley Company, L.L.C.
    Inventors: James W. Thackeray, James Michael Mori, Gary Ganghui Teng
  • Thick film photoresists and methods for use thereof
    Publication number: 20030027086
    Abstract: New methods and compositions are provided that enable application and processing of photoresist as thick coating layers, e.g. at dried layer (post soft-bake) thicknesses of in excess of 2 microns. Resists can be imaged at short wavelengths in accordance with the invention, including 248 nm.
    Type: Application
    Filed: May 10, 2002
    Publication date: February 6, 2003
    Inventors: James W. Thackeray, James Michael Mori, Gary Ganghui Teng
  • Photoresist compositions comprising blends of photoacid generators
    Publication number: 20010038970
    Abstract: The invention provides new photoresist compositions that contain a resin binder and a blend of photoacid generators. Photoacid generator blends of the invention produce photoacids that differ in acid strength and/or size.
    Type: Application
    Filed: February 17, 2001
    Publication date: November 8, 2001
    Applicant: Shipley Company, L.L.C.
    Inventors: James F. Cameron, James Michael Mori, George W. Orsula, James W. Thackeray
  • Photoresist comprising blends of photoacid generators
    Patent number: 6203965
    Abstract: The invention provides new photoresist compositions that contain a resin binder and a blend of photoacid generators. Photoacid generator blends of the invention produce photoacids that differ in acid strength and/or size. A specific composition comprises a terpolymer having units of hydroxystyrene, styrene and t-butyl acrylate with the photoacid generators di-(4-tbutylphenyl)iodonium camphorsulfonate and di-(4-t-butylphenyl)iodonium o-trifluoromethylbenzene sulfonate.
    Type: Grant
    Filed: April 19, 2000
    Date of Patent: March 20, 2001
    Assignees: Shipley Company, L.L.C., IBM Corporation
    Inventors: James F. Cameron, James Michael Mori, George W. Orsula, James W. Thackeray, Wu-Song Huang, Ronald A. DellaGuardia, Kuang-Jung Chen, Hiroshi Ito, Wayne M. Moreau
  • Photoresist compositions comprising blends of photoacid generators
    Patent number: 6200728
    Abstract: The invention provides new photoresist compositions that contain a resin binder and a blend of photoacid generators. Photoacid generator blends of the invention produce photoacids that differ in acid strength and/or size.
    Type: Grant
    Filed: February 20, 1999
    Date of Patent: March 13, 2001
    Assignee: Shipley Company, L.L.C.
    Inventors: James F. Cameron, James Michael Mori, George W. Orsula, James W. Thackeray
  • Antireflective coating compositions
    Patent number: 6033830
    Abstract: The invention provides new light absorbing crosslinking compositions suitable for use as an antireflective composition (ARC), particularly for deep UV applications. The ARCs of the invention in general comprise a crosslinker and novel ARC resin binders that effectively absorb reflected deep UV exposure radiation.
    Type: Grant
    Filed: November 7, 1997
    Date of Patent: March 7, 2000
    Assignee: Shipley Company, L.L.C.
    Inventors: Roger F. Sinta, Timothy G. Adams, James Michael Mori
  • Antireflective coating compositions
    Patent number: 5886102
    Abstract: The invention provides new light absorbing crosslinking compositions suitable for use as an antireflective composition (ARC), particularly for deep UV applications. The ARCs of the invention in general comprise a crosslinker and novel ARC resin binders that effectively absorb reflected deep UV exposure radiation.
    Type: Grant
    Filed: June 11, 1996
    Date of Patent: March 23, 1999
    Assignee: Shipley Company, L.L.C.
    Inventors: Roger F. Sinta, Timothy G. Adams, James Michael Mori