Abstract: An optical metrology device characterizes a test object using a phase shift interferometer with synchronous time varying optical frequency shifts. A light source generates a beam having a time varying frequency, which is divided into two collinear, orthogonally polarized beams that differ by a first frequency shift. One or more optical cavities receive the beams and produce a pair of reference beams that differ from each other in frequency by the first frequency shift and a pair of test beams with a second frequency shift induced by the one or more optical cavities. The test beams differ from each other by the first frequency shift and differ from the reference beams by the second frequency shift. The first frequency shift has a pre-defined relationship with respect to the second frequency shift to generate interference between a reference beam and test beam that have frequency shift magnitudes with the pre-defined relationship.

Abstract: A pixelated color mask is combined with a pixelated polarization mask in dynamic interferometry. The color mask includes a wavelength-selective bandpass filter placed in front of each camera pixel such that each set of contiguous four camera pixels is covered by two green bandpass filters, a red bandpass filter, and a blue bandpass filter. The pixelated phase mask is coupled to the color filters such that one polarization filter covers one set of color filters. At least three polarization filters are used to calculate phase. In addition, the color signals can be used, for example, to encode the motion of the interferometer, to provide very high speed autofocus or tip/tilt feedback, to create a color image of the object being measured, to automatically focus the system at different positions for different measurements conducted with different color sources, and to perform heterodyne interferometry with a single, vibration-immune measurement.

Abstract: An optical device for characterizing a workpiece combines an interferometer with a polarization rotation pellicle, installed in a stand-alone fashion in a spatial gap between the mirrors of the interferometer, and a polarization based phase-shift sensor.

Abstract: A cycloidal diffraction waveplate is combined with a pixelated phase mask (PPM) sensor in a dynamic fringe-projection interferometer to obtain phase-shifted interferograms in a single snap-shot camera operation that provides the phase information required to measure test surfaces with micrometer precision. Such mode of operation enables a portable embodiment for use in environments subject to vibration. A shifting mechanism coupled to the cycloidal waveplate allows temporal out-of-phase measurements used to remove noise due to test-surface characteristics. Two or more pixels of each unit cell of the PPM are combined to create super-pixels where the sum of the phases of the pixels is a multiple of 180 degrees, so that fringes are eliminated to facilitate operator focusing. By assigning colors or cross-hatch patterns to different ranges of modulation measured at the detector, the areas of best focus within the field of view are identified quantitatively to ensure measurements under best-focus conditions.

Abstract: An interferometer includes a short-coherence source and an internal path-matching assembly contained within its housing. Because path matching occurs within the housing of the interferometer, it is removed from external environmental factors that affect measurements. Therefore, a single cateye measurement of an exemplary surface can be performed in advance and stored as a calibration for subsequent radius-of-curvature measurements. In one embodiment, a path-matching stage is incorporated into a dynamic interferometer where orthogonally polarized test and reference beams are fed to a dynamic imaging system. In another embodiment, orthogonal linearly polarized test and reference beams are injected into a remote dynamic interferometer by means of one single-mode polarization-maintaining optical fiber.

Abstract: A phase-difference sensor measures the spatially resolved difference in phase between orthogonally polarized reference and test wavefronts. The sensor is constructed as a linear-carrier phase-mask aligned to and imaged on a linear-carrier detector array. Each adjacent element of the phase-mask measures a predetermined relative phase shift between the orthogonally polarized reference and test beams. Thus, multiple phase-shifted interferograms can be synthesized at the same time by combining pixels with identical phase-shifts. The multiple phase-shifted interferograms can be combined to calculate standard parameters such as modulation index or average phase step. Any configuration of interferometer that produces orthogonally polarized reference and object beams may be combined with the phase-difference sensor of the invention to provide single-shot, simultaneous phase-shifting measurements.

Abstract: The tilted relationship between the reference and test mirrors (24,26) of a Fizeau interferometer is used to spatially separate the reflections (R,T) from the two surfaces. The separate beams (R,T) are filtered through a spatial polarization element (32) that provides different states of polarization to the beams. The beams (R,T) are subsequently recombined to form a substantially collinear beam that is processed using a spatial-phase-shift interferometer (44) that permits quantitative phase measurement in a single video frame. Alternatively, two beams (104,106) with orthogonal polarization are injected into the Fizeau cavity (20) at different angles, such that after reflection from the reference and test optics (24,26) they are substantially collinear. Unwanted reflections are blocked at the focal plane through the use of a circular aperture (112).

Abstract: Apparatus for splitting, imaging, and measuring wavefronts with a reference wavefront and an object wavefront. A wavefront-combining element receives and combines into a combined wavefront an object wavefront from an object and a reference wavefront. A wavefront-splitting element splits the combined wavefront into a plurality of sub-wavefronts in such a way that each of the sub-wavefronts is substantially contiguous with at least one other sub-wavefront. The wavefront-splitting element may shift the relative phase between the reference wavefront and the object wavefront of the sub-wavefronts to yield a respective plurality of phase-shifted sub-wavefronts. The wavefront-splitting element may then interfering the reference and object wavefronts of the phase-shifted sub-wavefronts to yield a respective plurality of phase-shifted interferograms. An imaging element receives and images the phase-shifted interferograms.

Abstract: A multi-channel imaging system is calibrated by measuring the geometric distortion in each sub-image, generating corresponding correction factors, and applying such factors to correct subsequent image data. In addition, intensity transfer-function arrays are measured at each pixel, and further used to correct for system and detector nonlinearities and nonuniformity between images. The procedure is repeated over a range of wavelengths to produce a complete set of correction coefficients and transfer functions. When the system is used for interferometric phase measurements, multiple measurements are preferably taken and a random phase offset in the reference path length is introduced at each measurement. The multiple phase data so derived are then averaged to reduce phase-dependent systematic measurement errors.

Abstract: A phase-difference sensor measures the spatially resolved difference in phase between orthogonally polarized reference and test wavefronts. The sensor is constructed as a pixelated phase-mask aligned to and imaged on a pixelated detector array. Each adjacent pixel of the phase-mask measures a predetermined relative phase shift between the orthogonally polarized reference and test beams. Thus, multiple phase-shifted interferograms can be synthesized at the same time by combining pixels with identical phase-shifts. The multiple phase-shifted interferograms can be combined to calculate standard parameters such as modulation index or average phase step. Any configuration of interferometer that produces orthogonally polarized reference and object beams may be combined with the phase-difference sensor of the invention to provide, single-shot, simultaneous phase-shifting measurements.

Abstract: The tilted relationship between the reference and test mirrors of a Fizeau interferometer is used to spatially separate the reflections from the two surfaces. The separate beams are filtered through a spatial polarization element that provides different states of polarization to the beams. The beams are subsequently recombined to form a substantially collinear beam that is processed using a spatial-phase-shift interferometer that permits quantitative phase measurement in a single video frame. Alternatively, two beams with orthogonal polarization are injected into the Fizeau cavity at different angles, such that after reflection from the reference and test optics they are substantially collinear. Unwanted reflections are blocked at the focal plane through the use of a circular aperture. Short coherence length light and a delay line may be used to mitigate stray reflections, reduce measurement integration times, and implement temporal phase averaging.

Abstract: A polarizing point-diffraction plate is used to produce common-path test and reference wavefronts with mutually orthogonal polarizations from an input wavefront. The common-path test and reference wavefronts are collimated, phase shifted and interfered, and the resulting interferograms are imaged on a detector. The interference patterns are then processed using conventional algorithms to characterize the input light wavefront.