Patents by Inventor James N. Eilbeck

James N. Eilbeck has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method of forming a resist pattern by radiation exposure of positive-working resist coating comprising a dye and a trihydroxybenzophenone compound and subsequent aqueous alkaline development
    Patent number: 4650745
    Abstract: Disclosed is a positive-working resist composition which demonstrates improved photospeed and rate of development. The resist composition contains a solvent and select proportions of a novolak resin, a naphthoquinone diazide sensitizer, a dye which absorbs light at a maximum wavelength of from about 330 to about 460 nm and an effective proportion of a trihydroxybenzophenone compound. Also disclosed is a method of forming a resist pattern on a substrate by employing the positive-working resist composition.
    Type: Grant
    Filed: June 26, 1986
    Date of Patent: March 17, 1987
    Assignee: Philip A. Hunt Chemical Corporation
    Inventor: James N. Eilbeck
  • Positive-working o-quinone diazide photoresist composition containing a dye and a trihydroxybenzophenone compound
    Patent number: 4626492
    Abstract: Disclosed is a positive-working resist composition which demonstrates improved photospeed and rate of development. The resist composition contains a solvent and select proportions of a novolak resin, a naphthoquinone diazide sensitizer, a dye which absorbs light at a maximum wavelength of from about 330 to about 460 nm and an effective proportion of a trihydroxybenzophenone compound. Also disclosed is a method of forming a resist pattern on a substrate by employing the positive-working resist composition.
    Type: Grant
    Filed: June 4, 1985
    Date of Patent: December 2, 1986
    Assignee: Olin Hunt Specialty Products, Inc.
    Inventor: James N. Eilbeck