Patents by Inventor James N. Wiley
James N. Wiley has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 7853920Abstract: One embodiment of a method for detecting, sampling, analyzing, and correcting hot spots in an integrated circuit design allows the identification of the weakest patterns within each design layer, the accurate determination of the impact of process drifts upon the patterning performance of the real mask in a real scanner, and the optimum process correction, process monitoring, and RET improvements to optimize integrated circuit device performance and yield. The combination of high speed simulation coupled with massive data collection capability on actual aerial images and/or resist images at the specific patterns of interest provides a complete methodology for optimum RET implementation and process monitoring.Type: GrantFiled: May 19, 2006Date of Patent: December 14, 2010Assignee: ASML Netherlands B.V.Inventors: Moshe E. Preil, Jun Ye, James N. Wiley, Shauh-Teh Juang, Michael J. Gassner
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Publication number: 20090324054Abstract: A method and software program for determining printability of a defect on a reticle or photomask onto a substrate during processing. That is performed by creating a pixel grid image having a plurality of individual pixel images showing the defect. A gray scale value is assigned to each pixel image of the pixel grid image and a probable center pixel of the defect is selected. Then the polarity of the defect is determined, with a coarse center pixel of the defect optionally selected using the probable center defect and polarity of the defect. If a coarse center pixel is selected, then a fine center of the defect can optionally be selected from the coarse center pixel and polarity of the defect. From the center pixel the physical extent of the defect can be determined followed by the determination the transmissivity energy level of the physical extent of the defect.Type: ApplicationFiled: June 22, 2009Publication date: December 31, 2009Inventors: Anthony Vacca, Thomas Vavul, Donald J. Parker, Zain Saidin, Sterling G. Watson, James N. Wiley
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Publication number: 20080133160Abstract: A method and software program for determining printability of a defect on a reticle or photomask onto a substrate during processing. That is performed by creating a pixel grid image having a plurality of individual pixel images showing the defect. A gray scale value is assigned to each pixel image of the pixel grid image and a probable center pixel of the defect is selected. Then the polarity of the defect is determined, with a coarse center pixel of the defect optionally selected using the probable center defect and polarity of the defect. If a coarse center pixel is selected, then a fine center of the defect can optionally be selected from the coarse center pixel and polarity of the defect. From the center pixel the physical extent of the defect can be determined followed by the determination the transmissivity energy level of the physical extent of the defect.Type: ApplicationFiled: October 31, 2007Publication date: June 5, 2008Inventors: Anthony Vacca, Thomas Vavul, Donald J. Parker, Zain Saidin, Sterling G. Watson, James N. Wiley
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Patent number: 6748103Abstract: A reusable circuit design for use with electronic design automation EDA tools in designing integrated circuits is disclosed, as well as reticle inspection and fabrication methods that are based on such reusable circuit design. The reusable circuit design is stored on a computer readable medium and contains an electronic representation of a layout pattern for at least one layer of the circuit design on an integrated circuit. The layout pattern includes a flagged critical region which corresponds to a critical region on a reticle or integrated circuit that is susceptible to special inspection or fabrication procedures. In one aspect of the reusable circuit design, the special analysis is performed during one from a group consisting of reticle inspection, reticle production, integrated circuit fabrication, and fabricated integrated circuit inspection.Type: GrantFiled: February 4, 2003Date of Patent: June 8, 2004Assignee: KLA-TencorInventors: Lance A. Glasser, Jun Ye, Shauh-Teh Juang, David S. Alles, James N. Wiley
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Publication number: 20040096094Abstract: A method and software program for determining printability of a defect on a reticle or photomask onto a substrate during processing. That is performed by creating a pixel grid image having a plurality of individual pixel images showing the defect. A gray scale value is assigned to each pixel image of the pixel grid image and a probable center pixel of the defect is selected. Then the polarity of the defect is determined, with a coarse center pixel of the defect optionally selected using the probable center defect and polarity of the defect. If a coarse center pixel is selected, then a fine center of the defect can optionally be selected from the coarse center pixel and polarity of the defect. From the center pixel the physical extent of the defect can be determined followed by the determination the transmissivity energy level of the physical extent of the defect.Type: ApplicationFiled: November 13, 2003Publication date: May 20, 2004Applicant: KLA-TENCOR CORPORATIONInventors: Anthony Vacca, Thomas Vavul, Donald J. Parker, Zain Saidin, Sterling G. Watson, James N. Wiley
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Patent number: 6731787Abstract: A method and software program for determining printability of a defect on a reticle or photomask onto a substrate during processing. That is performed by creating a pixel grid image having a plurality of individual pixel images showing the defect. A gray scale value is assigned to each pixel image of the pixel grid image and a probable center pixel of the defect is selected. Then the polarity of the defect is determined, with a coarse center pixel of the defect optionally selected using the probable center defect and polarity of the defect. If a coarse center pixel is selected, then a fine center of the defect can optionally be selected from the coarse center pixel and polarity of the defect. From the center pixel the physical extent of the defect can be determined followed by the determination the transmissivity energy level of the physical extent of the defect.Type: GrantFiled: April 30, 2002Date of Patent: May 4, 2004Assignee: KLA-Tencor CorporationInventors: Anthony Vacca, Thomas Vavul, Donald J. Parker, Zain Saidin, Sterling G. Watson, James N. Wiley
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Patent number: 6654489Abstract: Disclosed is a method of inspecting a reticle defining a circuit layer pattern that is used within a corresponding semiconductor process to generate corresponding patterns on a semiconductor wafer. A test image of the reticle is provided, and the test image has a plurality of test characteristic values. A baseline image containing an expected pattern of the test image is also provided. The baseline image has a plurality of baseline characteristic values that correspond to the test characteristic values. The test characteristic values are compared to the baseline characteristic values such that a plurality of difference values are calculated for each pair of test and baseline characteristic values. Statistical information is also collected.Type: GrantFiled: December 4, 2002Date of Patent: November 25, 2003Assignee: KLA-Tencor Technologies CorporationInventors: James N. Wiley, Jun Ye, Shauh-Teh Juang, David S. Alles, Yen-Wen Lu, Yu Cao
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Publication number: 20030142860Abstract: A reusable circuit design for use with electronic design automation EDA tools in designing integrated circuits is disclosed, as well as reticle inspection and fabrication methods that are based on such reusable circuit design. The reusable circuit design is stored on a computer readable medium and contains an electronic representation of a layout pattern for at least one layer of the circuit design on an integrated circuit. The layout pattern includes a flagged critical region which corresponds to a critical region on a reticle or integrated circuit that is susceptible to special inspection or fabrication procedures. In one aspect of the reusable circuit design, the special analysis is performed during one from a group consisting of reticle inspection, reticle production, integrated circuit fabrication, and fabricated integrated circuit inspection.Type: ApplicationFiled: February 4, 2003Publication date: July 31, 2003Applicant: KLA-Tencor Technologies CorporationInventors: Lance A. Glasser, Jun Ye, Shauh-Teh Juang, David S. Alles, James N. Wiley
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Publication number: 20030138138Abstract: A method and software program for determining printability of a defect on a reticle or photomask onto a substrate during processing. That is performed by creating a pixel grid image having a plurality of individual pixel images showing the defect. A gray scale value is assigned to each pixel image of the pixel grid image and a probable center pixel of the defect is selected. Then the polarity of the defect is determined, with a coarse center pixel of the defect optionally selected using the probable center defect and polarity of the defect. If a coarse center pixel is selected, then a fine center of the defect can optionally be selected from the coarse center pixel and polarity of the defect. From the center pixel the physical extent of the defect can be determined followed by the determination the transmissivity energy level of the physical extent of the defect.Type: ApplicationFiled: January 13, 2003Publication date: July 24, 2003Applicant: KLA-TENCOR CORPORATIONInventors: Anthony Vacca, Thomas Vavul, Donald J. Parker, Zain Saidin, Sterling G. Watson, James N. Wiley
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Publication number: 20030091224Abstract: Disclosed is a method of inspecting a reticle defining a circuit layer pattern that is used within a corresponding semiconductor process to generate corresponding patterns on a semiconductor wafer. A test image of the reticle is provided, and the test image has a plurality of test characteristic values. A baseline image containing an expected pattern of the test image is also provided. The baseline image has a plurality of baseline characteristic values that correspond to the test characteristic values. The test characteristic values are compared to the baseline characteristic values such that a plurality of difference values are calculated for each pair of test and baseline characteristic values. Statistical information is also collected.Type: ApplicationFiled: December 4, 2002Publication date: May 15, 2003Applicant: KLA-Tencor Technologies CorporationInventors: James N. Wiley, Jun Ye, Shauh-Teh Juang, David S. Alles, Yen-Wen Lu, Yu Cao
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Patent number: 6529621Abstract: A reusable circuit design for use with electronic design automation EDA tools in designing integrated circuits is disclosed, as well as reticle inspection and fabrication methods that are based on such reusable circuit design. The reusable circuit design is stored on a computer readable medium and contains an electronic representation of a layout pattern for at least one layer of the circuit design on an integrated circuit. The layout pattern includes a flagged critical region which corresponds to a critical region on a reticle or integrated circuit that is susceptible to special inspection or fabrication procedures. In one aspect of the reusable circuit design, the special analysis is performed during one from a group consisting of reticle inspection, reticle production, integrated circuit fabrication, and fabricated integrated circuit inspection.Type: GrantFiled: December 17, 1998Date of Patent: March 4, 2003Assignee: KLA-TencorInventors: Lance A. Glasser, Jun Ye, Shauh-Teh Juang, David S. Alles, James N. Wiley
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Patent number: 6516085Abstract: Disclosed is a method of inspecting a reticle defining a circuit layer pattern that is used within a corresponding semiconductor process to generate corresponding patterns on a semiconductor wafer. A test image of the reticle is provided, and the test image has a plurality of test characteristic values. A baseline image containing an expected pattern of the test image is also provided. The baseline image has a plurality of baseline characteristic values that correspond to the test characteristic values. The test characteristic values are compared to the baseline characteristic values such that a plurality of difference values are calculated for each pair of test and baseline characteristic values. Statistical information is also collected.Type: GrantFiled: May 3, 1999Date of Patent: February 4, 2003Assignee: KLA-TencorInventors: James N. Wiley, Jun Ye, Shauh-Teh Juang, David S. Alles, Yen-Wen Lu, Yu Cao
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Publication number: 20020126888Abstract: A method and software program for determining printability of a defect on a reticle or photomask onto a substrate during processing. That is performed by creating a pixel grid image having a plurality of individual pixel images showing the defect. A gray scale value is assigned to each pixel image of the pixel grid image and a probable center pixel of the defect is selected. Then the polarity of the defect is determined, with a coarse center pixel of the defect optionally selected using the probable center defect and polarity of the defect. If a coarse center pixel is selected, then a fine center of the defect can optionally be selected from the coarse center pixel and polarity of the defect. From the center pixel the physical extent of the defect can be determined followed by the determination the transmissivity energy level of the physical extent of the defect.Type: ApplicationFiled: February 11, 2002Publication date: September 12, 2002Applicant: KLA-TENCOR CORPORATIONInventors: Anthony Vacca, Thomas Vavul, Donald J. Parker, Zain Saidin, Sterling G. Watson, James N. Wiley
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Patent number: 6381358Abstract: A method and software program for determining printability of a defect on a reticle or photomask onto a substrate during processing. That is performed by creating a pixel grid image having a plurality of individual pixel images showing the defect. A gray scale value is assigned to each pixel image of the pixel grid image and a probable center pixel of the defect is selected. Then the polarity of the defect is determined, with a coarse center pixel of the defect optionally selected using the probable center defect and polarity of the defect. If a coarse center pixel is selected, then a fine center of the defect can optionally be selected from the coarse center pixel and polarity of the defect. From the center pixel the physical extent of the defect can be determined followed by the determination the transmissivity energy level of the physical extent of the defect.Type: GrantFiled: April 27, 2000Date of Patent: April 30, 2002Assignee: KLA-Tencor CorporationInventors: Anthony Vacca, Thomas Vavul, Donald J. Parker, Zain Saidin, Sterling G. Watson, James N. Wiley
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Patent number: 6076465Abstract: A method and software program for determining printability of a defect on a reticle or photomask onto a substrate during processing. That is performed by creating a pixel grid image having a plurality of individual pixel images showing the defect. A gray scale value is assigned to each pixel image of the pixel grid image and a probable center pixel of the defect is selected. Then the polarity of the defect is determined, with a coarse center pixel of the defect optionally selected using the probable center defect and polarity of the defect. If a coarse center pixel is selected, then a fine center of the defect can optionally be selected from the coarse center pixel and polarity of the defect. From the center pixel the physical extent of the defect can be determined followed by the determination the transmissivity energy level of the physical extent of the defect.Type: GrantFiled: September 19, 1997Date of Patent: June 20, 2000Assignee: KLA-Tencor CorporationInventors: Anthony Vacca, Thomas Vavul, Donald J. Parker, Zain Saidin, Sterling G. Watson, James N. Wiley