Patents by Inventor James Oikari

James Oikari has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Wafer processing using gaseous antistatic agent during drying phase to control charge build-up
    Publication number: 20050000549
    Abstract: Described are methods of processing one or more semiconductor wafers wherein the one or more wafers are processed in the presence of a gaseous antistatic agent. The method generally comprises performing one or more chemical treatment, rinsing, and/or drying steps in the presence of a gaseous antistatic agent. Preferably, a gaseous antistatic agent is present during at least a portion of a drying step and more preferably, during at least a portion of both a rinsing step and a drying step. In one preferred embodiment, the gaseous antistatic agent comprises carbon dioxide.
    Type: Application
    Filed: July 3, 2003
    Publication date: January 6, 2005
    Inventors: James Oikari, Tracy Gast, Luke Chang