Abstract: A process for preparing proponates which comprises the steps of (i) supplying a solution of methanol containing 4-hydroxyphenylmethylcarbinol, (ii) subjecting said solution to an acid catalyzed displacement reaction for a sufficient period of time and under suitable conditions of temperature and pressure to convert substantially all of said carbinol to 4-hydroxyphenylmethylcarbinol methyl ether in solution, (iii) replacing the methanol in said ether containing solution with a second solvent and (iv) reacting the ether containing ethyl lactate solution with a suitable acid catalyst for a sufficient period of time and under suitable conditions of temperature and pressure to form said propanoates. New compositions of matter which comprise the propanoates, prepared in the above manner, have application in the electronic chemicals market such as in a photoresist composition.

Abstract: The present invention relates to novel photoresist compositions and processes for preparing the same utilizing polymers having a low polydispersity via the use of certain chain transfer agents (CTA) with certain monomers to provide said polymers. The polymers incorporating the chain transfer agents can be homopolymers, or made with additional monomers to provide copolymers. These polymers/copolymers are then converted into photoresist compositions for use as such.

Abstract: A process for preparing proponates which comprises the steps of (i) supplying a solution of methanol containing 4-hydroxyphenylmethylcarbinol, (ii) subjecting said solution to an acid catalyzed displacement reaction for a sufficient period of time and under suitable conditions of temperature and pressure to convert substantially all of said carbinol to 4-hydroxyphenylmethylcarbinol methyl ether in solution, (iii) replacing the methanol in said ether containing solution with a second solvent and (iv) reacting the ether containing ethyl lactate solution with a suitable acid catalyst for a sufficient period of time and under suitable conditions of temperature and pressure to form said propanoates. New compositions of matter which comprise the propanoates, prepared in the above manner, have application in the electronic chemicals market such as in a photoresist composition.

Abstract: An anhydrous, liquid phase process for preparing hydroxyl containing polymers of enhanced purity comprising the steps of polymerization, purification, transesterification, purification, catalyst removal, and solvent exchange. The resultant polymer in solution can be used directly, without further processing steps, to prepare a photoresist composition.

Abstract: Polymers derived from various monomers are purified by fractionalization of the crude polymers in a solvent/non solvent system via reverse precipitation.

Abstract: An anhydrous, liquid phase process for preparing hydroxyl containing polymers of enhanced purity comprising the steps of polymerization, purification, transesterification, purification, catalyst removal, and solvent exchange. The resultant polymer in solution can be used directly, without further processing steps, to prepare a photoresist composition.

Abstract: The present invention provides novel photoresist compositions and processes for preparing the same utilizing low polydispersity (co)polymers prepared via the polymerization of selected monomers in the presence of RAFT chain transfer agents. The polymers can be homopolymers of substituted styrenes, or can be copolymers comprising additional monomers. These (co)polymers can be converted into photoresist compositions for use as such.

Abstract: An anhydrous, liquid phase process for preparing polymers of enhanced purity and low polydispersity comprising the steps of polymerization, purification, transesterification, purification, catalyst removal, and solvent exchange. The resultant polymer in solution can be used directly, without further processing steps, to prepare a photoresist composition.

Abstract: A novel one-pot cost efficient process for the preparation of homo-, co- and terpolymers of p-hydroxystyrene or substituted p-hydroxystyrene and alkyl acrylates. The process involves polymerization of esters of p-hydroxystyrene (or its substituted analogs), alkyl acrylate monomers and/or one or more of ethylenically unsaturated monomers in an alcohol solvent in the presence of a free radical initiator. The reaction mixture containing the so formed polymer is subjected to transesterification conditions using a catalytic amount of catalyst to result in co- and/or terpolymers of p-hydroxystyrene without cleavage of the alkyl ester in the acrylate repeat unit, and then removing the catalyst from the system. Preferred embodiments include homopolymers of p-hydroxystyrene, copolymer of p-hydroxystyrene and tert-butyl acrylate and terpolymer of p-hydroxystyrene, tert-butyl acrylate and styrene. These polymers have a wide variety of applications including as photoresists in microelectronics industry.

Abstract: An anhydrous, liquid phase process for preparing hydroxyl containing polymers of enhanced purity comprising the steps of polymerization, purification, transesterification, purification, catalyst removal, and solvent exchange. The resultant polymer in solution can be used directly, without further processing steps, to prepare a photoresist composition.

Abstract: A novel one-pot cost efficient process for the preparation of homo-, co- and terpolymers of p-hydroxystyrene or substituted p-hydroxystyrene and alkyl acrylates. The process involves polymerization of esters of p-hydroxystyrene (or its substituted analogs), alkyl acrylate monomers and/or one or more of ethylenically unsaturated monomers in an alcohol solvent in the presence of a free radical initiator. The reaction mixture containing the so formed polymer is subjected to transesterification conditions using a catalytic amount of catalyst to result in co- and/or terpolymers of p-hydroxystyrene without cleavage of the alkyl ester in the acrylate repeat unit, and then removing the catalyst from the system. Preferred embodiments include homopolymers of p-hydroxystyrene, copolymer of p-hydroxystyrene and tert-butyl acrylate and terpolymer of p-hydroxystyrene, tert-butyl acrylate and styrene. These polymers have a wide variety of applications including as photoresists in microelectronics industry.

Abstract: The invention provides a novel process for improving the glass transition temperatures of polymers by partitioning the polymer between immiscible solvents to remove the low molecular weight polymer from the desired product.

Abstract: A process for preparing a poly(hydroxystyrene) which comprises the steps of (a) heating a carbinol under decomposition conditions in the presence of a solvent for a sufficient period of time to form hydroxystyrene, said solvent having a boiling point in substantially the same range as said hydroxystyrene; and (b) polymerizing said hydroxystyrene under suitable polymerization conditions of pressure and temperature and for a sufficient period of time to form poly(hydroxystyrene).

Abstract: A process for preparing a polyhydroxystyrene having a novolak type structure which comprises the step of polymerizing a mixture of carboxylic acid and at least one substituted phenyl carbinol whose formula is: ##STR1## wherein (a) R.sub.1 is selected from the group consisting of H, alkyl C.sub.1 -C.sub.20, substituted and unsubstituted phenyl, and C(O)R.sub.8 (where R.sub.8 is alkyl C.sub.1 -C.sub.20); (b) R.sub.2 is selected from the group consisting of H and alkyl C.sub.1 -C.sub.20 ; and (c) R.sub.3 -R.sub.7 are each independently selected from the group consisting of H, alkyl C.sub.1 -C.sub.20, OR.sub.9 (where R.sub.9 is H, alkyl C.sub.1 -C.sub.20, esters thereof, or substituted and unsubstituted phenyl), halogen, BZT, nitro, or amino, with the proviso that at least one of R.sub.3 -R.sub.7 is OR.sub.9, in the presence of a suitable catalyst for a sufficient period of time and under suitable conditions of temperature and pressure to form said novolak type polymer.

Abstract: The present invention provides a unique and novel way of producing carbinols such as 4-hydroxyphenylmethylcarbinol (HPMC). In this new process, a ketone such as 4-hydroxyacetophenone (4-HAP) is heated under suitable hydrogenation conditions of temperature and pressure in the presence of a suitable catalyst and a basic material, and for a sufficient period of time to form HPMC.

Abstract: The present invention provides a unique and novel way of producing an acetoxystyrene. In this new process which comprises a single step, a mixture of (a) a carbinol, (b) an acetylating agent, and (c) an acid catalyst is dehydrated under suitable dehydration conditions of temperature and pressure to form said acetoxystyrene.

Abstract: A new polyhydroxystyrene having a novolak type structure which is prepared by the process which comprises the step of polymerizing a mixture of carboxylic acid and at least one substituted phenyl carbinol whose formula is: ##STR1## wherein (a) R.sub.1 is selected from the group consisting of H, alkyl C.sub.1 -C.sub.20, substituted and unsubstituted phenyl, and C(O)R.sub.8 (where R.sub.8 is alkyl C.sub.1 -C.sub.20); (b) R.sub.2 is selected from the group consisting of H and alkyl C.sub.1 -C.sub.20 ; and (c) R.sub.3 -R.sub.7 are each independently selected from the group consisting of H, alkyl C.sub.1 -C.sub.20, OR.sub.9 (where R.sub.9 is H, alkyl C.sub.1 -C.sub.20, esters thereof, or substituted and unsubstituted phenyl), halogen, BZT, nitro, or amino, with the proviso that at least one of R.sub.3 -R.sub.7 is OR.sub.9, in the presence of a suitable catalyst for a sufficient period of time and under suitable conditions of temperature and pressure to form said polyhydroxystyrene.

Abstract: The present invention provides a unique and novel way of producing polyhydroxystyrene which comprises the steps of (a) heating 4-hydroxyacetophenone under suitable hydrogenation conditions of temperature and pressure in the presence of a suitable palladium catalyst and a basic material and for a sufficient period of time to form 4-hydroxyphenylmethylcarbinol; (b) heating 4-hydroxyphenylmethylcarbinol under suitable conditions of temperature and pressure and for a sufficient period of time to form said polyhydroxystyrene.

Abstract: The present invention provides a unique and novel way of producing carbinols such as 4-hydroxyphenylmethylcarbinol (HPMC). In this new process, a ketone such as 4-hydroxyacetophenone (4-HAP) is heated under suitable hydrogenation conditions of temperature and pressure in the presence of a suitable catalyst and for a sufficient period of time to form HPMC.

Abstract: The present invention provides a unique and novel way of producing vinyl phenols such as p-vinyl phenol (4-hydroxystyrene--HSM). In this new process, p-.alpha.-aminoethylphenol (AEP) is heated under suitable deamination conditions of temperature and pressure and for a sufficient period of time to form the 4-hydroxystyrene (HSM).