Patents by Inventor James Rash

James Rash has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240141541
    Abstract: An apparatus for electroplating a metal on a semiconductor substrate with high control over plated thickness on a die-level includes an ionically resistive ionically permeable element (e.g., a plate with channels), where the element allows for flow of ionic current through the element towards the substrate during electroplating, where the element includes a plurality of regions, each region having a pattern of varied local resistance, and where the pattern of varied local resistance repeats in at least two regions. An electroplating method includes providing a semiconductor substrate to an electroplating apparatus having an ionically resistive ionically permeable element or a grid-like shield having a pattern correlating with a pattern of features on the substrate, and plating metal, while the pattern on the substrate remains spatially aligned with the pattern of the element or the grid-like shield for at least a portion of the total electroplating time.
    Type: Application
    Filed: March 15, 2022
    Publication date: May 2, 2024
    Inventors: Lee Peng Chua, Gabriel Hay Graham, Bryan L. Buckalew, Stephen J. Banik, II, Santosh Kumar, James Isaac Fortner, Robert Rash, Steven T. Mayer
  • Publication number: 20070074180
    Abstract: Systems, methods and apparatus are provided through which, in some embodiments, a script is derived from scenarios, the script is analyzed, and flaws in the script are corrected. The systems, methods and apparatus may include inferring an equivalent formal model from procedures described in natural language (such as English), as scenarios, use cases, or a representation in one of a plethora of graphical notations Such a model can be analyzed for contradictions, conflicts, use of resources before the resources are available, competition for resources, and so forth. From such a formal model, code can be automatically generated in a variety of notations. This may include high level programming languages, machine languages, and scripting languages. The approach improves the resulting code, which may be provably equivalent to the procedures described at the outset.
    Type: Application
    Filed: August 1, 2006
    Publication date: March 29, 2007
    Applicant: NASA HQ'S
    Inventors: Michael Hinchey, James Rash, Christopher Rouff, Denis Gracanin
  • Publication number: 20070067755
    Abstract: Systems, methods and apparatus are provided through which, in some embodiments, a formal specification is pattern-matched from scenarios, the formal specification is analyzed, and flaws in the formal specification are corrected. The systems, methods and apparatus may include pattern-matching an equivalent formal model from an informal specification. Such a model can be analyzed for contradictions, conflicts, use of resources before the resources are available, competition for resources, and so forth. From such a formal model, an implementation can be automatically generated in a variety of notations. The approach can improve the resulting implementation, which, in some embodiments, is provably equivalent to the procedures described at the outset, which in turn can improve confidence that the system reflects the requirements, and in turn reduces system development time and reduces the amount of testing required of a new system.
    Type: Application
    Filed: September 21, 2006
    Publication date: March 22, 2007
    Applicant: U.S.A. as represented by the Administrator of the National Aeronautics and Space Adm
    Inventors: Michael HINCHEY, James RASH, Christopher ROUFF
  • Publication number: 20050138602
    Abstract: A system and method for deriving a process-based specification for a system is disclosed. The process-based specification is mathematically inferred from a trace-based specification. The trace-based specification is derived from a non-empty set of traces or natural language scenarios. The process-based specification is mathematically equivalent to the trace-based specification. Code is generated, if applicable, from the process-based specification. A process, or phases of a process, using the features disclosed can be reversed and repeated to allow for an interactive development and modification of legacy systems. The process is applicable to any class of system, including, but not limited to, biological and physical systems, electrical and electro-mechanical systems in addition to software, hardware and hybrid hardware-software systems.
    Type: Application
    Filed: February 25, 2004
    Publication date: June 23, 2005
    Inventors: Michael Hinchey, James Rash, Christopher Rouff