Abstract: A method and apparatus for elimination of speckle pattern in optical system by reducing coherence. The invention is based on the use of a rotating microlens array having a rotational speed chosen with reference to laser parameter. For a continuous laser this relationship consists in that the exposure time is sufficient for overlapping at least 10.sup.4 spot sizes of the speckle. For a pulse laser, the laser pulse time should be sufficient for shifting the speckle spot at least by the magnitude of its diameter. Several embodiments with modified coherence reduction units are available. One modified embodiment describes a rotating inclined plate which enhances coherence reduction by scanning the over the surface of the diffuser. Another embodiment describes the use of an optical conical rod with total internal reflection for creation of a plurality of non-coherent light sources.

Abstract: A cold-cathode ion source with a closed-loop ion-emitting slit which is provided with means for generating a cyclically-variable, e.g., alternating or pulsating electric or magnetic field in an anode-cathode space. These means may be made in the form of an alternating-voltage generator which generates alternating voltage on one of the cathode parts that form the ion-emitting slit, whereas the other slit-forming part is grounded. The alternating voltage deviates the ion beam in the slit with the same frequency of the alternating voltage. In accordance with another embodiment, the aforementioned means may be an electromagnetic coil which generates a magnetic field which passes through the ion-emitting slit, thus acting on the condition of the spatial-charge formation and, hence, on concentration of ions in the ion beam. The cold-cathode ion source may be of any type, i.e.

Abstract: A universal cold-cathode type ion source with a closed-loop electron drifting source and with an ion-beam propagation direction perpendicular to the plane of electron drifting is intended for uniformly treating stationary or moveable objects with such processes as cleaning, activation, polishing, thin-film coating, or etching. The ion source of the invention allows adjustment of beam parameters and configurations and has an ion emitting slit of an adjustable geometry. In one embodiment, the adjustment is carried out by changing the width of the slit by shifting moveable parts of the cathode in the direction perpendicular to the direction of the ion beam. In another embodiment the slit configuration is adjusted by shifting a moveable part of the cathode in the direction of the beam propagation. The invention also provides a method for adjusting the shape and configuration of the ion beam with respect to the object to be treated.