Patents by Inventor James S. Buff
James S. Buff has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 9972475Abstract: An apparatus to control a ribbon ion beam. The apparatus may include a coil assembly comprising a plurality of electromagnetic coils configured to generate a magnetic field proximate the ribbon beam, the magnetic field extending in a first direction that forms a non-zero angle with respect to a direction of propagation of the ribbon ion beam; a current source assembly configured to supply current to the coil assembly; and a controller configured to control the current source assembly to send at least one dithering current signal to the coil assembly responsive to a beam current measurement of the ribbon ion beam, wherein the at least one dithering current signal generates a fluctuation in magnetic field strength of the magnetic field.Type: GrantFiled: December 16, 2014Date of Patent: May 15, 2018Assignee: Varian Semiconductor Equipment Associates, Inc.Inventors: James S. Buff, Edward W. Bell, W. Davis Lee
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Patent number: 9852882Abstract: A magnet having an annular coolant fluid passage is generally described. Various examples provide a magnet including a first magnet and a second magnet disposed around an ion beam coupler with an aperture there through. The first and second magnets each including a metal core having a cavity therein, one or more conductive wire wraps disposed around the metal core, and an annular core element configured to be inserted into the cavity, wherein an annular coolant fluid passage is formed between the cavity and the annular core element. Furthermore, the annular core element may have a first diameter and a middle section having a second diameter, the second diameter being less than the first diameter. Other embodiments are disclosed and claimed.Type: GrantFiled: October 2, 2015Date of Patent: December 26, 2017Assignee: Varian Semiconductor Equipment Associates, Inc.Inventors: Scott Barraclough, James S. Buff
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Patent number: 9793087Abstract: A method may include: generating an ion beam from an ion source, the ion beam having an initial direction of propagation; deflecting the ion beam at an initial angle of inclination with respect to the initial direction of propagation; passing the ion beam through an aperture in a magnetic assembly; and generating in the aperture, a quadrupole field extending along a first direction perpendicular to the initial direction of propagation of the ion beam, and a dipole field extending along a second direction perpendicular to the first direction and the initial direction of propagation.Type: GrantFiled: September 10, 2015Date of Patent: October 17, 2017Assignee: Varian Semiconductor Equipment Associates, Inc.Inventors: James S. Buff, Victor Benveniste, Frank Sinclair
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Publication number: 20170076908Abstract: A method may include: generating an ion beam from an ion source, the ion beam having an initial direction of propagation; deflecting the ion beam at an initial angle of inclination with respect to the initial direction of propagation; passing the ion beam through an aperture in a magnetic assembly; and generating in the aperture, a quadrupole field extending along a first direction perpendicular to the initial direction of propagation of the ion beam, and a dipole field extending along a second direction perpendicular to the first direction and the initial direction of propagation.Type: ApplicationFiled: September 10, 2015Publication date: March 16, 2017Inventors: James S. Buff, Victor Benveniste, Frank Sinclair
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Publication number: 20160172159Abstract: An apparatus to control a ribbon ion beam. The apparatus may include a coil assembly comprising a plurality of electromagnetic coils configured to generate a magnetic field proximate the ribbon beam, the magnetic field extending in a first direction that forms a non-zero angle with respect to a direction of propagation of the ribbon ion beam; a current source assembly configured to supply current to the coil assembly; and a controller configured to control the current source assembly to send at least one dithering current signal to the coil assembly responsive to a beam current measurement of the ribbon ion beam, wherein the at least one dithering current signal generates a fluctuation in magnetic field strength of the magnetic field.Type: ApplicationFiled: December 16, 2014Publication date: June 16, 2016Inventors: James S. Buff, Edward W. Bell, W. Davis Lee
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Publication number: 20160027610Abstract: A magnet having an annular coolant fluid passage is generally described. Various examples provide a magnet including a first magnet and a second magnet disposed around an ion beam coupler with an aperture there through. The first and second magnets each including a metal core having a cavity therein, one or more conductive wire wraps disposed around the metal core, and an annular core element configured to be inserted into the cavity, wherein an annular coolant fluid passage is formed between the cavity and the annular core element. Furthermore, the annular core element may have a first diameter and a middle section having a second diameter, the second diameter being less than the first diameter. Other embodiments are disclosed and claimed.Type: ApplicationFiled: October 2, 2015Publication date: January 28, 2016Inventors: Scott Barraclough, James S. Buff
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Patent number: 9177708Abstract: A magnet having an annular coolant fluid passage is generally described. Various examples provide a magnet including a first magnet and a second magnet disposed around an ion beam coupler with an aperture there through. Each of the first and second magnets including a metal core having a cavity therein, one or more conductive wire wraps disposed around the metal core, and an annular core element configured to be inserted into the cavity, wherein an annular coolant fluid passage is formed between the cavity and the annular core element. Furthermore, each annular core element may have a first diameter and a middle section having a second diameter, the second diameter being less than the first diameter. Other embodiments are disclosed and claimed.Type: GrantFiled: August 14, 2013Date of Patent: November 3, 2015Assignee: Varian Semiconductor Equipment Associates, Inc.Inventors: Scott Barraclough, James S. Buff
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Patent number: 9057146Abstract: A sheet of a material is disposed in a melt of the material. The sheet is formed using a cooling plate in one instance. An exciting coil and sensing coil are positioned downstream of the cooling plate. The exciting coil and sensing coil use eddy currents to determine a thickness of the solid sheet on top of the melt.Type: GrantFiled: August 24, 2010Date of Patent: June 16, 2015Assignee: Varian Semiconductor Equipment Associates, Inc.Inventors: Gary J. Rosen, Frank Sinclair, Alexander Soskov, James S. Buff
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Publication number: 20140367583Abstract: A magnet having an annular coolant fluid passage is generally described. Various examples provide a magnet including a first magnet and a second magnet disposed around an ion beam coupler with an aperture there through. Each of the first and second magnets including a metal core having a cavity therein, one or more conductive wire wraps disposed around the metal core, and an annular core element configured to be inserted into the cavity, wherein an annular coolant fluid passage is formed between the cavity and the annular core element. Furthermore, each annular core element may have a first diameter and a middle section having a second diameter, the second diameter being less than the first diameter. Other embodiments are disclosed and claimed.Type: ApplicationFiled: August 14, 2013Publication date: December 18, 2014Applicant: Varian Semiconductor Equipment Associates, Inc.Inventors: Scott Barraclough, James S. Buff
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Patent number: 8604443Abstract: A system for manipulating an ion beam having a principal axis includes an upper member having a first and a second coil generally disposed in different regions of the upper member and configured to conduct, independently of each other, a first and a second current, respectively. A lower member includes a third and a fourth coil that are generally disposed opposite to respective first and second coils and are configured to conduct, independently of each other, a third and a fourth current, respectively. A lens gap is defined between the upper and lower members, and configured to transmit the ion beam, wherein the first through fourth currents produce a 45 degree quadrupole field that exerts a rotational force on the ion beam about its principal axis.Type: GrantFiled: November 11, 2010Date of Patent: December 10, 2013Assignee: Varian Semiconductor Equipment Associates, Inc.Inventors: Frank Sinclair, Victor M. Benveniste, Svetlana Radovanov, James S. Buff
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Patent number: 8466431Abstract: Techniques for improving extracted ion beam quality using high-transparency electrodes are disclosed. In one particular exemplary embodiment, the techniques may be realized as an apparatus for ion implantation. The apparatus may comprise an ion source for generating an ion beam, wherein the ion source comprises a faceplate with an aperture for the ion beam to travel therethrough. The apparatus may also comprise a set of extraction electrodes comprising at least a suppression electrode and a high-transparency ground electrode, wherein the set of extraction electrodes may extract the ion beam from the ion source via the faceplate, and wherein the high-transparency ground electrode may be configured to optimize gas conductance between the suppression electrode and the high-transparency ground electrode for improved extracted ion beam quality.Type: GrantFiled: February 12, 2009Date of Patent: June 18, 2013Assignee: Varian Semiconductor Equipment Associates, Inc.Inventors: James S. Buff, Svetlana Radovanov, Bon-Woong Koo, Wilhelm Platow, Frank Sinclair, D. Jeffrey Lischer, Craig R. Chaney, Steven Borichevsky, Eric R. Cobb, Mayur Jagtap, Kenneth H. Purser, Victor Benveniste, Shardul S. Patel
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Patent number: 8263941Abstract: A ribbon beam mass analyzer having a first and second solenoid coils and steel yoke arrangement. Each of the solenoid coils have a substantially “racetrack” configuration defining a space through which an ion ribbon beam travels. The solenoid coils are spaced apart along the direction of travel of the ribbon beam. Each of the solenoid coils generates a uniform magnetic field to accommodate mass resolution of wide ribbon beams to produce a desired image of ions generated from an ion source.Type: GrantFiled: November 11, 2009Date of Patent: September 11, 2012Assignee: Varian Semiconductor Equipment Associates, Inc.Inventors: Victor Benveniste, James S. Buff, Frank Sinclair, Joseph C. Olson
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Publication number: 20120048496Abstract: A sheet of a material is disposed in a melt of the material. The sheet is formed using a cooling plate in one instance. An exciting coil and sensing coil are positioned downstream of the cooling plate. The exciting coil and sensing coil use eddy currents to determine a thickness of the solid sheet on top of the melt.Type: ApplicationFiled: August 24, 2010Publication date: March 1, 2012Applicant: VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES, INC.Inventors: Gary J. ROSEN, Frank SINCLAIR, Alexander SOSKOV, James S. BUFF
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Publication number: 20110114849Abstract: A system for manipulating an ion beam having a principal axis includes an upper member having a first and a second coil generally disposed in different regions of the upper member and configured to conduct, independently of each other, a first and a second current, respectively. A lower member includes a third and a fourth coil that are generally disposed opposite to respective first and second coils and are configured to conduct, independently of each other, a third and a fourth current, respectively. A lens gap is defined between the upper and lower members, and configured to transmit the ion beam, wherein the first through fourth currents produce a 45 degree quadrupole field that exerts a rotational force on the ion beam about its principal axis.Type: ApplicationFiled: November 11, 2010Publication date: May 19, 2011Applicant: VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES , INC.Inventors: Frank Sinclair, Victor M. Benveniste, Svetlana Radovanov, James S. Buff
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Patent number: 7807983Abstract: A technique for reducing magnetic fields at an implant location is disclosed. In one particular exemplary embodiment, the technique may be realized as an apparatus and method for reducing magnetic fields at an implant location. The apparatus and method may comprise a corrector-bar assembly comprising a set of magnetic core members, a plurality of coils distributed along the set of magnetic core members, and connecting elements to connect ends of the set of magnetic core members with each other to form a rectangular corrector-bar configuration. The corrector-bar assembly may be positioned at an exit region of a magnetic deflector to improve uniformity of a ribbon beam having a plurality of beamlets exiting from the magnetic deflector and the rectangular corrector-bar configuration may provide a desired magnetic field clamping action.Type: GrantFiled: January 12, 2007Date of Patent: October 5, 2010Assignee: Varian Semiconductor Equipment Associates, Inc.Inventors: Kenneth H. Purser, James S. Buff, Victor Benveniste
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Publication number: 20100116983Abstract: A ribbon beam mass analyzer having a first and second solenoid coils and steel yoke arrangement. Each of the solenoid coils have a substantially “racetrack” configuration defining a space through which an ion ribbon beam travels. The solenoid coils are spaced apart along the direction of travel of the ribbon beam. Each of the solenoid coils generates a uniform magnetic field to accommodate mass resolution of wide ribbon beams to produce a desired image of ions generated from an ion source.Type: ApplicationFiled: November 11, 2009Publication date: May 13, 2010Applicant: Varian Semiconductor Equipment Associates, Inc.Inventors: Victor Benveniste, James S. Buff, Frank Sinclair, Joseph C. Olson
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Patent number: 7675047Abstract: A technique for shaping a ribbon-shaped ion beam is disclosed. In one particular exemplary embodiment, the technique may be realized as an apparatus for shaping a ribbon-shaped ion beam. The apparatus may comprise an electrostatic lens having a substantially rectangular aperture for a ribbon-shaped ion beam to pass through, wherein a plurality of focusing elements are positioned along short edges of the aperture, and wherein each focusing element is separately biased and oriented to shape the ribbon-shaped ion beam.Type: GrantFiled: September 29, 2006Date of Patent: March 9, 2010Assignee: Varian Semiconductor Equipment Associates, Inc.Inventors: Svetlana B. Radovanov, Peter L. Kellerman, Victor M. Benveniste, Robert C. Lindberg, Kenneth H. Purser, Tyler B. Rockwell, James S. Buff, Anthony Renau
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Patent number: 7579605Abstract: Multi-purpose electrostatic lens for an ion implanter. The electrostatic lens allows an ion implanter to scan, accelerate, decelerate, expand, compress, focus and parallelize an ion beam. This capability enables the ion implanter to function as either a high precision medium-current ion implanter or as a high-current ion implanter.Type: GrantFiled: September 29, 2006Date of Patent: August 25, 2009Assignee: Varian Semiconductor Equipment Associates, Inc.Inventors: Anthony Renau, James S. Buff, Svetlana B. Radovanov
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Publication number: 20080169426Abstract: A technique for reducing magnetic fields at an implant location is disclosed. In one particular exemplary embodiment, the technique may be realized as an apparatus and method for reducing magnetic fields at an implant location. The apparatus and method may comprise a corrector-bar assembly comprising a set of magnetic core members, a plurality of coils distributed along the set of magnetic core members, and connecting elements to connect ends of the set of magnetic core members with each other to form a rectangular corrector-bar configuration. The corrector-bar assembly may be positioned at an exit region of a magnetic deflector to improve uniformity of a ribbon beam having a plurality of beamlets exiting from the magnetic deflector and the rectangular corrector-bar configuration may provide a desired magnetic field clamping action.Type: ApplicationFiled: January 12, 2007Publication date: July 17, 2008Applicant: Varian Semiconductor Equipment Associates, Inc.Inventors: Kenneth H. Purser, James S. Buff, Victor Benveniste
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Publication number: 20080078951Abstract: Multi-purpose electrostatic lens for an ion implanter. The electrostatic lens allows an ion implanter to scan, accelerate, decelerate, expand, compress, focus and parallelize an ion beam. This capability enables the ion implanter to function as either a high precision medium-current ion implanter or as a high-current ion implanter.Type: ApplicationFiled: September 29, 2006Publication date: April 3, 2008Inventors: Anthony Renau, James S. Buff, Svetlana B. Radovanov