Abstract: A device generates a capability map. The device receives one or more design spaces from a materials supplier, the one or more design spaces including candidate components and capabilities of tools available to the materials supplier. The device inputs a design space of the one or more design spaces into a machine learning model, the training data including a plurality of components including input materials and/or chemicals, and, for respective combinations of the plurality of components, a plurality of respective performance properties. The device receives as output from the model a capability map of the materials supplier storing possible combinations of performance properties and a respective difficulty of developing a composition with that combination of performance properties. The device outputs a user interface for display to a user indicating data of the capability map.

Abstract: A device generates a capability map. The device receives one or more design spaces from a materials supplier, the one or more design spaces including candidate components and capabilities of tools available to the materials supplier. The device inputs a design space of the one or more design spaces into a machine learning model, the training data including a plurality of components including input materials and/or chemicals, and, for respective combinations of the plurality of components, a plurality of respective performance properties. The device receives as output from the model a capability map of the materials supplier storing possible combinations of performance properties and a respective difficulty of developing a composition with that combination of performance properties. The device outputs a user interface for display to a user indicating data of the capability map.

Abstract: Methods for improving the adhesion of vacuum deposited coatings to a wide variety of substrates are described herein. The methods include utilizing a thermal source to generate free radical species which are then contacted to the substrate to be coated. Chemical vapor deposition, particularly initiated chemical vapor deposition (iCVD) can be used to form polymer thin films in situ without the need to remove the substrate from the chamber or even return to atmospheric pressure. Significant improvements in substrate adhesion of the subsequently deposited films have been observed over a range of substrate and coating materials.