Patents by Inventor James Santosa

James Santosa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Multi-port pumping system for substrate processing chambers
    Patent number: 7964040
    Abstract: An exhaust foreline for purging fluids from a semiconductor fabrication chamber is described. The foreline may include a first, second and third ports independently coupled to the chamber. A semiconductor fabrication system is also described that includes a substrate chamber that has a first, second and third interface port. The system may also include a multi-port foreline that has a first, second and third port, where the first foreline port is coupled to the first interface port, the second foreline port is coupled to the second interface port, and the third foreline port is coupled to the third interface port. The system may further include an exhaust vacuum coupled to the multi-port foreline.
    Type: Grant
    Filed: November 5, 2008
    Date of Patent: June 21, 2011
    Assignee: Applied Materials, Inc.
    Inventors: Muhammad M. Rasheed, Dmitry Lubomirsky, James Santosa
  • PLASMA SOURCE FOR CHAMBER CLEANING AND PROCESS
    Publication number: 20100098882
    Abstract: Apparatus and methods for processing a substrate and processing a process chamber are provided. In one embodiment, an apparatus is provided for processing a substrate including a power source, a switch box coupled to the power source and the switch box having a switch interchangeable between a first position and a second position, a first match box coupled to the switch box, a plasma generator coupled to the first match box, a second match box coupled to the switch box, and a remote plasma source coupled to the second match box.
    Type: Application
    Filed: October 19, 2009
    Publication date: April 22, 2010
    Applicant: APPLIED MATERIALS, INC.
    Inventors: Dmitry Lubomirsky, Jang Gyoo Yang, Qiwei Liang, Matthew L. Miller, James Santosa, Xinglong Chen, Paul F. Smith
  • MULTI-PORT PUMPING SYSTEM FOR SUBSTRATE PROCESSING CHAMBERS
    Publication number: 20090120464
    Abstract: An exhaust foreline for purging fluids from a semiconductor fabrication chamber is described. The foreline may include a first, second and third ports independently coupled to the chamber. A semiconductor fabrication system is also described that includes a substrate chamber that has a first, second and third interface port. The system may also include a multi-port foreline that has a first, second and third port, where the first foreline port is coupled to the first interface port, the second foreline port is coupled to the second interface port, and the third foreline port is coupled to the third interface port. The system may further include an exhaust vacuum coupled to the multi-port foreline.
    Type: Application
    Filed: November 5, 2008
    Publication date: May 14, 2009
    Applicant: Applied Materials, Inc.
    Inventors: Muhammad M. Rasheed, Dmitry Lubomirsky, James Santosa