Patents by Inventor James T. Y. Lin

James T. Y. Lin has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method for removal of impurities in cyclic siloxanes useful as precursors for low dielectric constant thin films
    Patent number: 7108771
    Abstract: A process for reducing the level(s) of water and/or other impurities from cyclosiloxanes by either azeotropic distillation, or by contacting the cyclosiloxane compositions with an adsorbent bed material. The purified cyclosiloxane material is useful for forming low-dielectric constant thin films having dielectric constants of less than 3.0, more preferably 2.8 to 2.0.
    Type: Grant
    Filed: December 13, 2001
    Date of Patent: September 19, 2006
    Assignee: Advanced Technology Materials, Inc.
    Inventors: Chongying Xu, Thomas H. Baum, Alexander S. Borovik, Ziyun Wang, James T. Y. Lin, Scott Battle, Ravi K. Laxman
  • Method for removal of impurities in cyclic siloxanes useful as precursors for low dielectric constant thin films
    Publication number: 20030116421
    Abstract: A process for reducing the level(s) of water and/or other impurities from cyclosiloxanes by either azeotropic distillation, or by contacting the cyclosiloxane compositions with an adsorbent bed material. The purified cyclosiloxane material is useful for forming low-dielectric constant thin films having dielectric constants of less than 3.0, more preferably 2.8 to 2.0.
    Type: Application
    Filed: December 13, 2001
    Publication date: June 26, 2003
    Inventors: Chongying Xu, Thomas H. Baum, Alexander S. Borovik, Ziyun Wang, James T.Y. Lin, Scott Battle, Ravi K. Laxman