Abstract: The invention provides a system and method for controlling use of handset communication device for communication by driver. A system in accordance with an embodiment includes: an obtaining component for obtaining driving state information of the vehicle; a directional antenna for capturing a wireless communication signal of the handset communication device around the driver; a judging component for judging whether a driving state of the vehicle is in an unstable state based on predefined criteria and the driving state information of the vehicle; and a control component for transmitting a remote control signal, based on a judging result of the judging component, to intervene in a communication of the handset communication device during a call.

Abstract: The invention provides a system and method for controlling use of handset communication device for communication by driver. A system in accordance with an embodiment includes: an obtaining component for obtaining driving state information of the vehicle; a directional antenna for capturing a wireless communication signal of the handset communication device around the driver; a judging component for judging whether a driving state of the vehicle is in an unstable state based on predefined criteria and the driving state information of the vehicle; and a control component for transmitting a remote control signal, based on a judging result of the judging component, to intervene in a communication of the handset communication device during a call.

Abstract: A new method for the removal of environmental compounds from gaseous streams, in particular, flue gas streams. The new method involves first oxidizing some or all of the acid anhydrides contained in the gas stream such as sulfur dioxide (SO2) and nitric oxide (NO) and nitrous oxide (N2O) to sulfur trioxide (SO3) and nitrogen dioxide (NO2). The gas stream is subsequently treated with aqua ammonia or ammonium hydroxide which captures the compounds via chemical absorption through acid-base or neutralization reactions. The products of the reactions can be collected as slurries, dewatered, and dried for use as fertilizers, or once the slurries have been dewatered, used directly as fertilizers. The ammonium hydroxide can be regenerated and recycled for use via thermal decomposition of ammonium bicarbonate, one of the products formed. There are alternative embodiments which entail stoichiometric scrubbing of nitrogen oxides and sulfur oxides with subsequent separate scrubbing of carbon dioxide.

Abstract: An apparatus and a method for imaging the mouth area laterally to produce reliable measurements of mouth and lip shapes for use in assisting the speech recognition task. A video camera is arranged with a headset and a microphone to capture a lateral profile image of a speaker. The lateral profile image is then used to compute features such as lip separation, lip shape and intrusion depth parameters. The parameters are used in real time, during speech recognition process to characterize and discriminate spoken phonemes to produce a high degree of accuracy in automatic speech recognition processing, especially in a noisy environment.

Abstract: During wafer fabrication, a transportable enclosure, such as a Standard Manufacturing InterFace (SMIF) pod encloses a nascent product, such as a semiconductor wafer, to protect the wafer against contamination during manufacture, storage or transportation. However chemical vapors emitted inside the pod can accumulate in the air and degrade wafers during subsequent fabrication. In order to absorb the vapors inside a closed pod, a vapor removal element typically including an activated carbon absorber, covered by a particulate-filtering vapor-permeable barrier, and covered by a guard plate with holes is disposed within the enclosure. A vapor removal element is disposed closely adjacent to each respective wafer. Alternatively, a single vapor removal element is located inside the enclosure. In certain instances, a fan or thermo-buoyant circulation causes any vapors located inside the enclosure to a vapor removal element for removal.

Abstract: The present invention is a mask and methods for making masks for use with a laser projection etching system. The unique mask is able to withstand the fluences of the high energy and high power lasers used without degrading. Specifically, the new projection etching masks are fabricated of patterned multiple dielectric layers having alternating high and low indices of refraction on a UV grade synthetic fused silica substrate in order to achieve maximum reflectivity of the laser energy in the opague areas and maximum transmissivity of the laser energy in the transparent areas of the mask.

Abstract: An improved method for removing nitrogen oxides from concentrated waste gas streams, in which nitrogen oxides are ignited with a carbonaceous material in the presence of substoichiometric quantities of a primary oxidant, such as air. Additionally, reductants may be ignited along with the nitrogen oxides, carbonaceous material and primary oxidant to achieve greater reduction of nitrogen oxides. A scrubber and regeneration system may also be included to generate a concentrated stream of nitrogen oxides from flue gases for reduction using this method.

Abstract: A differential material removal process wherein a selected material can be rapidly removed without adverse impact to surrounding layers of different materials. Ultraviolet radiation is used to selectively remove metal without adversely harming adjacent polymer layers, in a metal-polymer multilayer structure. The wavelength (100-400 nm) of the ultraviolet radiation and the energy fluence per pulse are selected so that the removal rate of metal due to thermal processes is significantly greater than the removal rate of the polymer by ablative photodecomposition. This can occur at an energy fluence per pulse level greater than that at which the etch rate of the polymer begins to level off. For example, copper of a thickness less than 5 microns is rapidly etched in one or two pulses while adjacent polyimide layers are substantially unetched by the application of ultraviolet pulses of wave-lengths 248-351 nm, at energy fluences per pulse in excess of approximately 3 or 4 J/cm.sup.2.

Abstract: This patent specification describes a technique for protectively coating the electrodes in a plasma patterning device so as to minimize the effect of backscattering of electrode material.The potentials present in a patterning chamber are such that electrode sputtering material may occur. If the material of the electrode where the sample is mounted (RIE mode) or the material of the counterelectrode (plasma etch mode) of the reaction chamber is not etchable in the etchant present, electrode material can be sputtered off, backscattered on the polymer surface, and cause incomplete etching.Polymer films, patterned in fine dimensions by masking and etching, are widely used in microelectronics. If backscattered material present in the etch area cannot be etched as fast as the polymer film, the back-scattered material on the polymer film surface will cause partial masking and incomplete etching, leaving spikes of polymer.