Patents by Inventor James Thomas Fahey

James Thomas Fahey has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Antireflective coating for microlithography
    Patent number: 6207787
    Abstract: A co-polymer of benzophenone and bisphenol A has been shown to have DUV absorption properties. Therefore, the co-polymer has particular utility as an antireflective coating in microlithography applications. Incorporating anthracene into the co-polymer backbone enhances absorption at 248 nm. The endcapper used for the co-polymer can vary widely depending on the needs of the user and can be selected to promote adhesion, stability, and absorption of different wavelengths.
    Type: Grant
    Filed: November 20, 1998
    Date of Patent: March 27, 2001
    Assignee: International Business Machines Corporation
    Inventors: James Thomas Fahey, Brian Wayne Herbst, Leo Lawrence Linehan, Wayne Martin Moreau, Gary Thomas Spinillo, Kevin Michael Welsh, Robert Lavin Wood
  • Making of microlithographic structures with an underlayer film containing a thermolyzed azide compound
    Patent number: 5795701
    Abstract: Microlithographic methods for the use of improved underlayers for chemically amplified deep UV photoresist compositions and structures produced thereby are disclosed. The compositions comprise, in admixture, a polymeric binder, and an azide which is thermolyzed during microlithographic processing to form an amine. Films formed from the underlayer compositions of the present invention, when applied immediately under and proximate to a chemically amplified photoresist film reduce the resist structure sidewall foot or undercut caused by an adverse contact reaction.
    Type: Grant
    Filed: November 26, 1996
    Date of Patent: August 18, 1998
    Assignee: International Business Machines Corporation
    Inventors: Willard Earl Conley, James Thomas Fahey, Wayne Martin Moreau, Ratnam Sooriyakumaran, Kevin Michael Welsh
  • Microlithographic structure with an underlayer film containing a thermolyzed azide compound
    Patent number: 5783361
    Abstract: Microlithographic methods for the use of improved underlayers for chemically amplified deep UV photoresist compositions and structures produced thereby are disclosed. The compositions comprise, in admixture, a polymeric binder, and an azide which is thermolyzed during microlithographic processing to form an amine. Films formed from the underlayer compositions of the present invention, when applied immediately under and proximate to a chemically amplified photoresist film reduce the resist structure sidewall foot or undercut caused by an adverse contact reaction.
    Type: Grant
    Filed: February 4, 1997
    Date of Patent: July 21, 1998
    Assignee: International Business Machines Corporation
    Inventors: Willard Earl Conley, James Thomas Fahey, Wayne Martin Moreau, Ratnam Sooriyakumaran, Kevin Michael Welsh
  • Method for patterning a photoresist material wherein an anti-reflective coating comprising a copolymer of bisphenol A and benzophenone is used
    Patent number: 5736301
    Abstract: A co-polymer of benzophenone and bisphenol A has been shown to have DUV absorption properties. Therefore, the co-polymer has particular utility as an antireflective coating in microlithography applications. Incorporating anthracene into the co-polymer backbone enhances absorption at 248 nm. The endcapper used for the co-polymer can vary widely depending on the needs of the user and can be selected to promote adhesion, stability, and absorption of different wavelengths.
    Type: Grant
    Filed: October 1, 1996
    Date of Patent: April 7, 1998
    Assignee: International Business Machines Corporation
    Inventors: James Thomas Fahey, Brian Wayne Herbst, Leo Lawrence Linehan, Wayne Martin Moreau, Gary Thomas Spinillo, Kevin Michael Welsh, Robert Lavin Wood
  • Microlithographic structure with an underlayer film comprising a thermolyzed azide
    Patent number: 5663036
    Abstract: Microlithographic methods for the use of improved underlayers for chemically amplified deep UV photoresist compositions and structures produced thereby are disclosed. The compositions comprise, in admixture, a polymeric binder, and an azide which is thermolyzed during microlithographic processing to form an amine. Films formed from the underlayer compositions of the present invention, when applied immediately under and proximate to a chemically amplified photoresist film reduce the resist structure sidewall foot or undercut caused by an adverse contact reaction.
    Type: Grant
    Filed: December 13, 1994
    Date of Patent: September 2, 1997
    Assignee: International Business Machines Corporation
    Inventors: Willard Earl Conley, James Thomas Fahey, Wayne Martin Moreau, Ratnam Sooriyakumaran, Kevin Michael Welsh