Patents by Inventor James Tsacoyeanes

James Tsacoyeanes has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8013979
    Abstract: An illuminator with substantially reduced telecentricity error relative to conventional illuminators includes one or more modules having movable optical elements with low telecentricity error that may be adjusted to compensate for telecentricity errors. The modules may include a zoom zoom axicon, a condenser, and a multi field relay. The zoom zoom axicon may include one or more lenses adjustable in up to six degrees of freedom. The condenser and the multi field relay may include one or more lenses adjustable in up to six degrees of freedom or a set of two or more mirrors with one or more of the mirrors adjustable in up to six degrees of freedom. The illuminator may also include a control system to control the adjustments of the movable optical elements. A lithography system including such an illuminator is also presented, along with a method of providing illumination with low telecentricity error.
    Type: Grant
    Filed: November 1, 2007
    Date of Patent: September 6, 2011
    Assignee: ASML Holding N.V.
    Inventors: Lev Ryzhikov, James Tsacoyeanes, Roberto B. Wiener, Scott D. Coston
  • Publication number: 20090046373
    Abstract: An illuminator with substantially reduced telecentricity error relative to conventional illuminators includes one or more modules having movable optical elements with low telecentricity error that may be adjusted to compensate for telecentricity errors. The modules may include a zoom zoom axicon, a condenser, and a multi field relay. The zoom zoom axicon may include one or more lenses adjustable in up to six degrees of freedom. The condenser and the multi field relay may include one or more lenses adjustable in up to six degrees of freedom or a set of two or more mirrors with one or more of the mirrors adjustable in up to six degrees of freedom. The illuminator may also include a control system to control the adjustments of the movable optical elements. A lithography system including such an illuminator is also presented, along with a method of providing illumination with low telecentricity error.
    Type: Application
    Filed: November 1, 2007
    Publication date: February 19, 2009
    Applicant: ASML Holding N.V.
    Inventors: Lev Ryzhikov, James Tsacoyeanes, Roberto B. Wiener, Scott D. Coston
  • Publication number: 20070146674
    Abstract: A system for microlithography comprises an illumination source; an illumination optical system including, in order from an objective side, (a) a first diffractive optical element that receives illumination from the illumination source, (b) a zoom lens, (c) a second diffractive optical element, (d) a condenser lens, (e) a relay lens, and (f) a reticle, and a projection optical system for imaging the reticle onto a substrate, wherein the system for microlithography provides a zoomable numerical aperture.
    Type: Application
    Filed: March 6, 2007
    Publication date: June 28, 2007
    Applicant: ASML Holding N.V.
    Inventors: Mark Oskotsky, Lev Ryzhikov, Scott Coston, James Tsacoyeanes, Walter Augustyn
  • Patent number: 7187430
    Abstract: A system for microlithography comprises an illumination source; an illumination optical system including, in order from an objective side, (a) a first diffractive optical element that receives illumination from the illumination source, (b) a zoom lens, (c) a second diffractive optical element, (d) a condenser lens, (e) a relay lens, and (f) a reticle, and a projection optical system for imaging the reticle onto a substrate, wherein the system for microlithography provides a zoomable numerical aperture.
    Type: Grant
    Filed: July 22, 2004
    Date of Patent: March 6, 2007
    Assignee: ASML Holding N.V.
    Inventors: Mark Oskotsky, Lev Ryzhikov, Scott Coston, James Tsacoyeanes, Walter Augustyn
  • Publication number: 20060164711
    Abstract: A system and method utilize an array of dynamically controllable optical elements to adjust one or more portions of a beam propagating therethrough. For example, the adjustments can be to change a ratio of horizontally and vertically polarized light in the portions of the beam. The adjustments can be made through application of an appropriate electric field to each of the optical elements, which forms an electrooptic modulator. In one example, a polarizer/analyzer is positioned after the array, such that only desired orientations are transmitted. The polarizing provides a desired light intensity profile, which can, for example, make the intensity inform across the beam or be used to partially or fully attenuate (e.g., block) the beam.
    Type: Application
    Filed: January 24, 2005
    Publication date: July 27, 2006
    Applicant: ASML Holding N.V.
    Inventors: Pradeep Govil, James Tsacoyeanes
  • Publication number: 20060121375
    Abstract: A system and method utilize a dynamically controllable optical element that receives an electrical field, which changes an index of refraction in at least one direction within the optical element. The change in index of refraction imparts a change to a beam of radiation passing through the optical element. The electric field is controlled by a feedback/control signal from a feedback system that includes a detector positioned proximate an image plane in the system. The optical element can be positioned in various places within the system depending on what light characteristics need to be adjusted, for example after an illumination system or after a light patterning system. In this manner, the optical element, under control of the dynamic electric field, can dynamically change its propagation characteristics to dynamically change either a beam of illumination from the illumination system or a patterned beam of radiation from the patterning system, such that they exhibit desired light characteristics.
    Type: Application
    Filed: December 7, 2004
    Publication date: June 8, 2006
    Inventors: James Tsacoyeanes, Pradeep Govil
  • Publication number: 20060087720
    Abstract: A system and method utilize an optical element that receives an electrical field, which changes an index of refraction in at least one direction within the optical element. The change in index of refraction imparts a change to a beam of radiation passing through the optical element. A material used to form the optical element exhibits characteristics, such that wavelengths of the beam of radiation above about 155 nanometers are transmitted through the optical element with little or not absorption or attenuation.
    Type: Application
    Filed: October 26, 2004
    Publication date: April 27, 2006
    Applicant: ASML Holding N.V.
    Inventors: James Tsacoyeanes, Pradeep Govil
  • Patent number: 7006198
    Abstract: The present invention relates to a method and system for expanding a laser beam. An illumination system includes a horizontal reflective multiplexer and a vertical reflective multiplexer. The horizontal reflective multiplexer replicates the input beam along a first dimension to form a first multiplexed beam. The vertical reflective multiplexer replicates the first multiplexed beam along a second dimension to form a second multiplexed beam. In one example, the horizontal reflective multiplexer includes a first beam splitter, second beam splitter, and mirror. The vertical reflective multiplexer includes a beam splitter and mirror.
    Type: Grant
    Filed: October 22, 2004
    Date of Patent: February 28, 2006
    Assignee: ASML Holding N.V.
    Inventors: Walter Augustyn, James Tsacoyeanes
  • Patent number: 6922230
    Abstract: Linewidth variations and bias that result from MEF changes and reticle linewidth variations in a printed substrate are controlled by correcting exposure dose and partial coherence at different spatial locations. In a photolithographic device for projecting an image of a reticle onto a photosensitive substrate, an adjustable slit is used in combination with a partial coherence adjuster to vary at different spatial locations the exposure dose received by the photosensitive substrate and partial coherence of the system. The linewidth variance and horizontal and vertical or orientation bias are calculated or measured at different spatial locations with reference to a reticle, and a corrected exposure dose and partial coherence is determined at the required spatial locations to compensate for the variance in linewidth and bias on the printed substrate. Improved printing of an image is obtained, resulting in the manufacture of smaller feature size semiconductor devices and higher yields.
    Type: Grant
    Filed: April 21, 2003
    Date of Patent: July 26, 2005
    Assignee: ASML Holding N.V.
    Inventors: Pradeep K. Govil, James Tsacoyeanes
  • Publication number: 20050083505
    Abstract: The present invention relates to a method and system for expanding a laser beam. An illumination system includes a horizontal reflective multiplexer and a vertical reflective multiplexer. The horizontal reflective multiplexer replicates the input beam along a first dimension to form a first multiplexed beam. The vertical reflective multiplexer replicates the first multiplexed beam along a second dimension to form a second multiplexed beam. In one example, the horizontal reflective multiplexer includes a first beam splitter, second beam splitter, and mirror. The vertical reflective multiplexer includes a beam splitter and mirror.
    Type: Application
    Filed: October 22, 2004
    Publication date: April 21, 2005
    Inventors: Walter Augustyn, James Tsacoyeanes
  • Publication number: 20050046921
    Abstract: A spatial light modulator (SLM) includes an integrated circuit actuator that can be fabricated using photolithography or other similar techniques. The actuator includes actuator elements, which can be made from piezoelectric materials. An electrode array is coupled to opposite walls of each of the actuator elements is an electrode array. Each array of electrodes can have one or more electrode sections. The array of reflective devices forms the SLM.
    Type: Application
    Filed: August 29, 2003
    Publication date: March 3, 2005
    Inventors: Pradeep Govil, James Tsacoyeanes
  • Publication number: 20040263821
    Abstract: A system for microlithography comprises an illumination source; an illumination optical system including, in order from an objective side, (a) a first diffractive optical element that receives illumination from the illumination source, (b) a zoom lens, (c) a second diffractive optical element, (d) a condenser lens, (e) a relay lens, and (f) a reticle, and a projection optical system for imaging the reticle onto a substrate, wherein the system for microlithography provides a zoomable numerical aperture.
    Type: Application
    Filed: July 22, 2004
    Publication date: December 30, 2004
    Applicant: ASML Holding N.V.
    Inventors: Mark Oskotsky, Lev Ryzhikov, Scott Coston, James Tsacoyeanes, Walter Augustyn
  • Patent number: 6819402
    Abstract: The present invention relates to a method and system for expanding a laser beam. An illumination system includes a horizontal reflective multiplexer and a vertical reflective multiplexer. The horizontal reflective multiplexer replicates the input beam along a first dimension to form a first multiplexed beam. The vertical reflective multiplexer replicates the first multiplexed beam along a second dimension to form a second multiplexed beam. In one example, the horizontal reflective multiplexer includes a first beam splitter, second beam splitter, and mirror. The vertical reflective multiplexer includes a beam splitter and mirror.
    Type: Grant
    Filed: October 16, 2002
    Date of Patent: November 16, 2004
    Assignee: ASML Holding N.V.
    Inventors: Walter Augustyn, James Tsacoyeanes
  • Patent number: 6813003
    Abstract: A system for microlithography comprises an illumination source; an illumination optical system including, in order from an objective side, (a) a first diffractive optical element that receives illumination from the illumination source, (b) a zoom lens, (c) a second diffractive optical element, (d) a condenser lens, (e) a relay lens, and (f) a reticle, and a projection optical system for imaging the reticle onto a substrate, wherein the system for microlithography provides a zoomable numerical aperture.
    Type: Grant
    Filed: June 11, 2002
    Date of Patent: November 2, 2004
    Inventors: Mark Oskotsky, Lev Ryzhikov, Scott Coston, James Tsacoyeanes, Walter Augustyn
  • Patent number: 6775069
    Abstract: The present invention relates to an illumination system including an illumination source, a beam conditioner placed in an optical path with the illumination source, a first diffractive array, a condenser system and a second diffractive array. The illumination source directs light through the beam conditioner onto the first diffractive array. The light is then directed to the condenser system placed in an optical path between the first diffractive array and second diffractive array. The condenser system includes a plurality of stationary optical elements and a plurality of movable optical elements. The plurality of movable optical elements are placed in an optical path with the plurality of stationary optical elements. The movable optical elements are capable of translation between the plurality of stationary optical element to zoom the light received from the first diffractive array.
    Type: Grant
    Filed: October 16, 2002
    Date of Patent: August 10, 2004
    Assignee: ASML Holding N.V.
    Inventors: Mark Oskotsky, Lev Ryzhikov, Scott Coston, James Tsacoyeanes, Peter J. Baumgartner, Walter Augustyn
  • Publication number: 20040066496
    Abstract: Linewidth variations and bias that result from MEF changes and reticle linewidth variations in a printed substrate are controlled by correcting exposure dose and partial coherence at different spatial locations. In a photolithographic device for projecting an image of a reticle onto a photosensitive substrate, an adjustable slit is used in combination with a partial coherence adjuster to vary at different spatial locations the exposure dose received by the photosensitive substrate and partial coherence of the system. The linewidth variance and horizontal and vertical or orientation bias are calculated or measured at different spatial locations with reference to a reticle, and a corrected exposure dose and partial coherence is determined at the required spatial locations to compensate for the variance in linewidth and bias on the printed substrate. Improved printing of an image is obtained, resulting in the manufacture of smaller feature size semiconductor devices and higher yields.
    Type: Application
    Filed: April 21, 2003
    Publication date: April 8, 2004
    Inventors: Pradeep K. Govil, James Tsacoyeanes
  • Publication number: 20030227609
    Abstract: A system for microlithography comprises an illumination source; an illumination optical system including, in order from an objective side, (a) a first diffractive optical element that receives illumination from the illumination source, (b) a zoom lens, (c) a second diffractive optical element, (d) a condenser lens, (e) a relay lens, and (f) a reticle, and a projection optical system for imaging the reticle onto a substrate, wherein the system for microlithography provides a zoomable numerical aperture.
    Type: Application
    Filed: June 11, 2002
    Publication date: December 11, 2003
    Applicant: ASML US, Inc.
    Inventors: Mark Oskotsky, Lev Ryzhikov, Scott Coston, James Tsacoyeanes, Walter Augustyn
  • Publication number: 20030117606
    Abstract: The present invention relates to a method and system for expanding a laser beam. An illumination system includes a horizontal reflective multiplexer and a vertical reflective multiplexer. The horizontal reflective multiplexer replicates the input beam along a first dimension to form a first multiplexed beam. The vertical reflective multiplexer replicates the first multiplexed beam along a second dimension to form a second multiplexed beam. In one example, the horizontal reflective multiplexer includes a first beam splitter, second beam splitter, and mirror. The vertical reflective multiplexer includes a beam splitter and mirror.
    Type: Application
    Filed: October 16, 2002
    Publication date: June 26, 2003
    Applicant: ASML US, Inc.
    Inventors: Walter Augustyn, James Tsacoyeanes
  • Patent number: 6573975
    Abstract: Linewidth variations and bias that result from MEF changes and reticle linewidth variations in a printed. substrate are controlled by correcting exposure dose and partial coherence at different spatial locations. In a photolithographic device for projecting an image of a reticle onto a photosensitive substrate, an adjustable slit is used in combination with a partial coherence adjuster to vary at different spatial locations the exposure dose received by the photosensitive substrate and partial coherence of the system. The linewidth variance and horizontal and vertical or orientation bias are calculated or measured at different spatial locations with reference to a reticle, and a corrected exposure dose and partial coherence is determined at the required spatial locations to compensate for the variance in linewidth and bias on the printed substrate. Improved printing of an image is obtained, resulting in the manufacturer of smaller feature size semiconductor devices and higher yields.
    Type: Grant
    Filed: April 4, 2001
    Date of Patent: June 3, 2003
    Inventors: Pradeep K. Govil, James Tsacoyeanes
  • Publication number: 20030076679
    Abstract: The present invention relates to an illumination system including an illumination source, a beam conditioner placed in an optical path with the illumination source, a first diffractive array, a condenser system and a second diffractive array. The illumination source directs light through the beam conditioner onto the first diffractive array. The light is then directed to the condenser system placed in an optical path between the first diffractive array and second diffractive array. The condenser system includes a plurality of stationary optical elements and a plurality of movable optical elements. The plurality of movable optical elements are placed in an optical path with the plurality of stationary optical elements. The movable optical elements are capable of translation between the plurality of stationary optical element to zoom the light received from the first diffractive array.
    Type: Application
    Filed: October 16, 2002
    Publication date: April 24, 2003
    Applicant: ASML US, Inc.
    Inventors: Mark Oskotsky, Lev Ryzhikov, Scott Coston, James Tsacoyeanes, Peter J. Baumgartner, Walter Augustyn