Abstract: An illuminator with substantially reduced telecentricity error relative to conventional illuminators includes one or more modules having movable optical elements with low telecentricity error that may be adjusted to compensate for telecentricity errors. The modules may include a zoom zoom axicon, a condenser, and a multi field relay. The zoom zoom axicon may include one or more lenses adjustable in up to six degrees of freedom. The condenser and the multi field relay may include one or more lenses adjustable in up to six degrees of freedom or a set of two or more mirrors with one or more of the mirrors adjustable in up to six degrees of freedom. The illuminator may also include a control system to control the adjustments of the movable optical elements. A lithography system including such an illuminator is also presented, along with a method of providing illumination with low telecentricity error.

Abstract: An illuminator with substantially reduced telecentricity error relative to conventional illuminators includes one or more modules having movable optical elements with low telecentricity error that may be adjusted to compensate for telecentricity errors. The modules may include a zoom zoom axicon, a condenser, and a multi field relay. The zoom zoom axicon may include one or more lenses adjustable in up to six degrees of freedom. The condenser and the multi field relay may include one or more lenses adjustable in up to six degrees of freedom or a set of two or more mirrors with one or more of the mirrors adjustable in up to six degrees of freedom. The illuminator may also include a control system to control the adjustments of the movable optical elements. A lithography system including such an illuminator is also presented, along with a method of providing illumination with low telecentricity error.

Abstract: A system for microlithography comprises an illumination source; an illumination optical system including, in order from an objective side, (a) a first diffractive optical element that receives illumination from the illumination source, (b) a zoom lens, (c) a second diffractive optical element, (d) a condenser lens, (e) a relay lens, and (f) a reticle, and a projection optical system for imaging the reticle onto a substrate, wherein the system for microlithography provides a zoomable numerical aperture.

Abstract: A system for microlithography comprises an illumination source; an illumination optical system including, in order from an objective side, (a) a first diffractive optical element that receives illumination from the illumination source, (b) a zoom lens, (c) a second diffractive optical element, (d) a condenser lens, (e) a relay lens, and (f) a reticle, and a projection optical system for imaging the reticle onto a substrate, wherein the system for microlithography provides a zoomable numerical aperture.

Abstract: A system and method utilize an array of dynamically controllable optical elements to adjust one or more portions of a beam propagating therethrough. For example, the adjustments can be to change a ratio of horizontally and vertically polarized light in the portions of the beam. The adjustments can be made through application of an appropriate electric field to each of the optical elements, which forms an electrooptic modulator. In one example, a polarizer/analyzer is positioned after the array, such that only desired orientations are transmitted. The polarizing provides a desired light intensity profile, which can, for example, make the intensity inform across the beam or be used to partially or fully attenuate (e.g., block) the beam.

Abstract: A system and method utilize a dynamically controllable optical element that receives an electrical field, which changes an index of refraction in at least one direction within the optical element. The change in index of refraction imparts a change to a beam of radiation passing through the optical element. The electric field is controlled by a feedback/control signal from a feedback system that includes a detector positioned proximate an image plane in the system. The optical element can be positioned in various places within the system depending on what light characteristics need to be adjusted, for example after an illumination system or after a light patterning system. In this manner, the optical element, under control of the dynamic electric field, can dynamically change its propagation characteristics to dynamically change either a beam of illumination from the illumination system or a patterned beam of radiation from the patterning system, such that they exhibit desired light characteristics.

Abstract: A system and method utilize an optical element that receives an electrical field, which changes an index of refraction in at least one direction within the optical element. The change in index of refraction imparts a change to a beam of radiation passing through the optical element. A material used to form the optical element exhibits characteristics, such that wavelengths of the beam of radiation above about 155 nanometers are transmitted through the optical element with little or not absorption or attenuation.

Abstract: The present invention relates to a method and system for expanding a laser beam. An illumination system includes a horizontal reflective multiplexer and a vertical reflective multiplexer. The horizontal reflective multiplexer replicates the input beam along a first dimension to form a first multiplexed beam. The vertical reflective multiplexer replicates the first multiplexed beam along a second dimension to form a second multiplexed beam. In one example, the horizontal reflective multiplexer includes a first beam splitter, second beam splitter, and mirror. The vertical reflective multiplexer includes a beam splitter and mirror.

Abstract: Linewidth variations and bias that result from MEF changes and reticle linewidth variations in a printed substrate are controlled by correcting exposure dose and partial coherence at different spatial locations. In a photolithographic device for projecting an image of a reticle onto a photosensitive substrate, an adjustable slit is used in combination with a partial coherence adjuster to vary at different spatial locations the exposure dose received by the photosensitive substrate and partial coherence of the system. The linewidth variance and horizontal and vertical or orientation bias are calculated or measured at different spatial locations with reference to a reticle, and a corrected exposure dose and partial coherence is determined at the required spatial locations to compensate for the variance in linewidth and bias on the printed substrate. Improved printing of an image is obtained, resulting in the manufacture of smaller feature size semiconductor devices and higher yields.

Abstract: The present invention relates to a method and system for expanding a laser beam. An illumination system includes a horizontal reflective multiplexer and a vertical reflective multiplexer. The horizontal reflective multiplexer replicates the input beam along a first dimension to form a first multiplexed beam. The vertical reflective multiplexer replicates the first multiplexed beam along a second dimension to form a second multiplexed beam. In one example, the horizontal reflective multiplexer includes a first beam splitter, second beam splitter, and mirror. The vertical reflective multiplexer includes a beam splitter and mirror.

Abstract: A spatial light modulator (SLM) includes an integrated circuit actuator that can be fabricated using photolithography or other similar techniques. The actuator includes actuator elements, which can be made from piezoelectric materials. An electrode array is coupled to opposite walls of each of the actuator elements is an electrode array. Each array of electrodes can have one or more electrode sections. The array of reflective devices forms the SLM.

Abstract: A system for microlithography comprises an illumination source; an illumination optical system including, in order from an objective side, (a) a first diffractive optical element that receives illumination from the illumination source, (b) a zoom lens, (c) a second diffractive optical element, (d) a condenser lens, (e) a relay lens, and (f) a reticle, and a projection optical system for imaging the reticle onto a substrate, wherein the system for microlithography provides a zoomable numerical aperture.

Abstract: The present invention relates to a method and system for expanding a laser beam. An illumination system includes a horizontal reflective multiplexer and a vertical reflective multiplexer. The horizontal reflective multiplexer replicates the input beam along a first dimension to form a first multiplexed beam. The vertical reflective multiplexer replicates the first multiplexed beam along a second dimension to form a second multiplexed beam. In one example, the horizontal reflective multiplexer includes a first beam splitter, second beam splitter, and mirror. The vertical reflective multiplexer includes a beam splitter and mirror.

Abstract: A system for microlithography comprises an illumination source; an illumination optical system including, in order from an objective side, (a) a first diffractive optical element that receives illumination from the illumination source, (b) a zoom lens, (c) a second diffractive optical element, (d) a condenser lens, (e) a relay lens, and (f) a reticle, and a projection optical system for imaging the reticle onto a substrate, wherein the system for microlithography provides a zoomable numerical aperture.

Abstract: The present invention relates to an illumination system including an illumination source, a beam conditioner placed in an optical path with the illumination source, a first diffractive array, a condenser system and a second diffractive array. The illumination source directs light through the beam conditioner onto the first diffractive array. The light is then directed to the condenser system placed in an optical path between the first diffractive array and second diffractive array. The condenser system includes a plurality of stationary optical elements and a plurality of movable optical elements. The plurality of movable optical elements are placed in an optical path with the plurality of stationary optical elements. The movable optical elements are capable of translation between the plurality of stationary optical element to zoom the light received from the first diffractive array.

Abstract: Linewidth variations and bias that result from MEF changes and reticle linewidth variations in a printed substrate are controlled by correcting exposure dose and partial coherence at different spatial locations. In a photolithographic device for projecting an image of a reticle onto a photosensitive substrate, an adjustable slit is used in combination with a partial coherence adjuster to vary at different spatial locations the exposure dose received by the photosensitive substrate and partial coherence of the system. The linewidth variance and horizontal and vertical or orientation bias are calculated or measured at different spatial locations with reference to a reticle, and a corrected exposure dose and partial coherence is determined at the required spatial locations to compensate for the variance in linewidth and bias on the printed substrate. Improved printing of an image is obtained, resulting in the manufacture of smaller feature size semiconductor devices and higher yields.

Abstract: A system for microlithography comprises an illumination source; an illumination optical system including, in order from an objective side, (a) a first diffractive optical element that receives illumination from the illumination source, (b) a zoom lens, (c) a second diffractive optical element, (d) a condenser lens, (e) a relay lens, and (f) a reticle, and a projection optical system for imaging the reticle onto a substrate, wherein the system for microlithography provides a zoomable numerical aperture.

Abstract: The present invention relates to a method and system for expanding a laser beam. An illumination system includes a horizontal reflective multiplexer and a vertical reflective multiplexer. The horizontal reflective multiplexer replicates the input beam along a first dimension to form a first multiplexed beam. The vertical reflective multiplexer replicates the first multiplexed beam along a second dimension to form a second multiplexed beam. In one example, the horizontal reflective multiplexer includes a first beam splitter, second beam splitter, and mirror. The vertical reflective multiplexer includes a beam splitter and mirror.

Abstract: Linewidth variations and bias that result from MEF changes and reticle linewidth variations in a printed. substrate are controlled by correcting exposure dose and partial coherence at different spatial locations. In a photolithographic device for projecting an image of a reticle onto a photosensitive substrate, an adjustable slit is used in combination with a partial coherence adjuster to vary at different spatial locations the exposure dose received by the photosensitive substrate and partial coherence of the system. The linewidth variance and horizontal and vertical or orientation bias are calculated or measured at different spatial locations with reference to a reticle, and a corrected exposure dose and partial coherence is determined at the required spatial locations to compensate for the variance in linewidth and bias on the printed substrate. Improved printing of an image is obtained, resulting in the manufacturer of smaller feature size semiconductor devices and higher yields.

Abstract: The present invention relates to an illumination system including an illumination source, a beam conditioner placed in an optical path with the illumination source, a first diffractive array, a condenser system and a second diffractive array. The illumination source directs light through the beam conditioner onto the first diffractive array. The light is then directed to the condenser system placed in an optical path between the first diffractive array and second diffractive array. The condenser system includes a plurality of stationary optical elements and a plurality of movable optical elements. The plurality of movable optical elements are placed in an optical path with the plurality of stationary optical elements. The movable optical elements are capable of translation between the plurality of stationary optical element to zoom the light received from the first diffractive array.