Abstract: A multi-cavity optical device allowing selective control of a bandpass characteristic thereof . Fabry-Perot structures are coherently coupled together to form a narrow bandpass structure. At least one of the spacer regions in the device includes an active material that changes the optical thickness of the spacer to de-tune the device. In one embodiment, the active material is transparent and lies along the optical path through the device. In another embodiment, an active material that lies outside of the optical path tunes an air gap. Altering the first or last spacer in a multi-cavity structure provides variation in the transmission loss while generally retaining a flattop filter response with low passband ripple. Altering interior spacer regions provides high sensitivity to variations in the optical thickness of the spacer.

Abstract: The absorption of a spacer material in a Fabry-Perot type structure is changed to achieve an optical switching function. In one embodiment, the spacer material is a semiconductor material and an electronic control signal changes the Fabry-Perot between a transmissive state and a reflective state. In the reflective state, the device operates as a switch can be modeled as a mirror on a substrate of quasi-infinite thickness. In a further embodiment, a wavelength-selective optical component is placed between the input of the switch and the Fabry-Perot structure to improve the spectral response of the switch.

Abstract: The present invention is directed to methods and apparatus for enhancing the performance of visual display units which utilize plasma display panels. More specifically, the present invention provides methods and apparatus for providing an electrical noise suppressing/chromaticity enhancing accessory device for positioning in front of the viewing surface of a plasma display panel. In its most basic embodiment, the accessory device of the present invention comprises a first and a second rigid substrate laminated together by a laminating layer; an optically selective coating providing high photopic transmittance, continuous high electrical conductivity for RFI shielding, and reflectivity specifically within the near-IR region that is mechanically protected by being sandwiched between one rigid substrate and the laminating layer; and, a multiple-dye coating for selectively absorbing IR energy emissions and selectively balancing the chromaticity of the PDP display.

Abstract: The present invention is directed to apparatus for enhancing the performance of visual display units which utilize plasma display panels. More specifically, the present invention provides apparatus for providing an electrical noise suppressing/chromaticity enhancing accessory device for positioning in front of the viewing surface of a plasma display panel (PDP). In its most basic embodiment, the accessory device of the present invention comprises an optically selective coating providing high photopic transmittance, continuous high electrical conductivity for RFI shielding, and reflectivity specifically within the near-IR region. It also preferably includes a multiple-dye coating for selectively absorbing IR energy emissions and selectively balancing the chromaticity of the PDP display and a plastic substrate layer to provide impact resistance.

Abstract: A thin film coating system incorporates separate, separately-controlled deposition and reaction zones for depositing materials such as refractory metals and forming oxides and other compounds and alloys of such materials. The associated process involves rotating or translating workpieces past the differentially pumped, atmospherically separated, sequentially or simultaneously operated deposition and reaction zones and is characterized by the ability to form a wide range of materials, by high throughput, and by controlled coating thickness, including both constant and selectively varied thickness profiles.

Abstract: The present invention is directed to methods and apparatus for enhancing the performance of visual display units which utilize plasma display panels. More specifically, the present invention provides methods and apparatus for providing an optically enhancing/noise suppressing device for positioning in front of the viewing surface of a plasma display panel. The device also increases the impact resistance of the PDP. The device of the present invention is manufactured separately from the PDP. The device may be provided with attachment means for securing the device to the surface of the visual display unit in a position in front of the viewing surface of the PDP or may be designed to be free-hanging, i.e., suspended, or otherwise positioned in front of the viewing surface of the PDP.

Abstract: A rotary cylindrical sputtering system incorporates separate, separately-controlled linear magnetron sputter deposition and reaction zones for sputter depositing materials such as refractory metals and forming oxides and other compounds and alloys of such materials. In one aspect, the associated process involves rotating or translating workpieces past the differentially pumped, atmospherically separated, sequentially or simultaneously operated deposition and reaction zones and is characterized by the ability to form a wide range of materials, by high throughput, and by the ability to form durable optical quality thin films of nominal refractive indices and controlled coating thickness, including both constant and selectively varied thickness profiles.

Abstract: A thin film coating system incorporates separate, separately-controlled deposition and reaction zones for depositing materials such as refractory metals and forming oxides and other compounds and alloys of such materials. The associated process involves rotating or translating workpieces past the differentially pumped, atmospherically separated, sequentially or simultaneously operated deposition and reaction zones and is characterized by the ability to form a wide range of materials, by high throughput, and by controlled coating thickness, including both constant and selectively varied thickness profiles.

Abstract: A rotary cylindrical sputtering system incorporates separate, separately-controlled linear magnetron sputter deposition and reaction zones for sputter depositing materials such as refractory metals and forming oxides and other compounds and alloys of such materials. In one aspect, the associated process involves rotating or translating workpieces past the differentially pumped, atmospherically separated, sequentially or simultaneously operated deposition and reaction zones and is characterized by the ability to form a wide range of materials, by high throughput, and by the ability to form durable optical quality thin films of nominal refractive indices and controlled coating thickness, including both constant and selectively varied thickness profiles.

Abstract: A rotary cylindrical sputtering system incorporates separate, separately-controlled linear magnetron sputter cathode and reaction zones for sputter depositing materials such as refractory metals and forming oxides and other compounds and alloys of such materials. The associated process involves rotating or translating workpieces past the differentially pumped, atmospherically separated, sequentially or simultaneously operated cathode and reaction zones and is characterized by the ability to form a wide range of materials, by high throughput, and by controlled coating thickness, including both constant and selectively varied thickness profiles.