Patents by Inventor James W. Thackeray

James W. Thackeray has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11947258
    Abstract: A monomer has the structure wherein R is an organic group comprising a polymerizable carbon-carbon double bond or carbon-carbon triple bond; X and Y are independently at each occurrence hydrogen or a non-hydrogen substituent; EWG1 and EWG2 are independently at each occurrence an electron-withdrawing group; p is 0, 1, 2, 3, or 4; n is 1, 2, 3, or 4; and M+ is an organic cation. A polymer prepared from monomer is useful as a component of a photoresist composition.
    Type: Grant
    Filed: February 24, 2023
    Date of Patent: April 2, 2024
    Assignee: ROHM AND HASS ELECTRONIC MATERIALS LLC
    Inventors: Emad Aqad, James W. Thackeray, James F. Cameron
  • Patent number: 11932713
    Abstract: New monomer and polymer materials that comprise one or more Te atoms. In one aspect, tellurium-containing monomers and polymers are provided that are useful for Extreme Ultraviolet Lithography.
    Type: Grant
    Filed: December 31, 2018
    Date of Patent: March 19, 2024
    Assignee: ROHM AND HAAS ELECTRONIC MATERIALS LLC
    Inventors: Emad Aqad, James F. Cameron, James W. Thackeray
  • Patent number: 11880134
    Abstract: New Te-salt compounds, including photoactive tellurium compounds useful for Extreme Ultraviolet Lithography.
    Type: Grant
    Filed: November 29, 2018
    Date of Patent: January 23, 2024
    Assignee: ROHM AND HAAS ELECTRONIC MATERIALS LLC
    Inventors: Emad Aqad, James F. Cameron, James W. Thackeray
  • Patent number: 11852972
    Abstract: A photoresist composition, comprising an acid-sensitive polymer comprising a repeating unit having an acid-labile group; an iodonium salt comprising an anion and a cation, the iodonium salt having Formula (1): wherein Z? is an organic anion; Ar1 is substituted or unsubstituted C4-60 heteroaryl group comprising a furan heterocycle; and R1 is substituted or unsubstituted hydrocarbon group as provided herein, wherein the cation optionally comprises an acid-labile group, wherein Ar1 and R1 are optionally connected to each other via a single bond or one or more divalent linking groups to form a ring, and wherein the iodonium salt is optionally covalently bonded through Ar1 or substituent thereof as a pendant group to a polymer, the iodonium salt is optionally covalently bonded through R1 or substituent thereof as a pendant group to a polymer, or the iodonium salt is optionally covalently bonded through Z? as a pendant group to a polymer; and a solvent.
    Type: Grant
    Filed: October 30, 2020
    Date of Patent: December 26, 2023
    Assignee: ROHM AND HAAS ELECTRONIC MATERIALS LLC
    Inventors: Tomas Marangoni, Emad Aqad, James W. Thackeray, James F. Cameron, Xisen Hou, ChoongBong Lee
  • Publication number: 20230212112
    Abstract: A monomer has the structure wherein R is an organic group comprising a polymerizable carbon-carbon double bond or carbon-carbon triple bond; X and Y are independently at each occurrence hydrogen or a non-hydrogen substituent; EWG1 and EWG2 are independently at each occurrence an electron-withdrawing group; p is 0, 1, 2, 3, or 4; n is 1, 2, 3, or 4; and M+ is an organic cation. A polymer prepared from monomer is useful as a component of a photoresist composition.
    Type: Application
    Filed: February 24, 2023
    Publication date: July 6, 2023
    Inventors: Emad Aqad, James W. Thackeray, James F. Cameron
  • Patent number: 11613519
    Abstract: A monomer has the structure wherein R is an organic group comprising a polymerizable carbon-carbon double bond or carbon-carbon triple bond; X and Y are independently at each occurrence hydrogen or a non-hydrogen substituent; EWG1 and EWG2 are independently at each occurrence an electron-withdrawing group; p is 0, 1, 2, 3, or 4; n is 1, 2, 3, or 4; and M+ is an organic cation. A polymer prepared from monomer is useful as a component of a photoresist composition.
    Type: Grant
    Filed: April 18, 2016
    Date of Patent: March 28, 2023
    Assignee: ROHM AND HAAS ELECTRONIC MATERIALS LLC
    Inventors: Emad Aqad, James W. Thackeray, James F. Cameron
  • Patent number: 11505565
    Abstract: New Te-zwitterion compounds are provided, including photoactive tellurium salt compounds useful for Extreme Ultraviolet Lithography.
    Type: Grant
    Filed: November 29, 2018
    Date of Patent: November 22, 2022
    Assignee: ROHM AND HAAS ELECTRONIC MATERIALS LLC
    Inventors: Emad Aqad, James F. Cameron, James W. Thackeray
  • Patent number: 11448960
    Abstract: New Te-salts are provided, including photoactive tellurium salt compounds useful for Extreme Ultraviolet Lithography.
    Type: Grant
    Filed: November 29, 2018
    Date of Patent: September 20, 2022
    Assignee: ROHM AND HAAS ELECTRONIC MATERIALS LLC
    Inventors: Emad Aqad, James F. Cameron, James W. Thackeray
  • Publication number: 20220137506
    Abstract: A photoresist composition, comprising an acid-sensitive polymer comprising a repeating unit having an acid-labile group; an iodonium salt comprising an anion and a cation, the iodonium salt having Formula (1): wherein Z? is an organic anion; Ar1 is substituted or unsubstituted C4-60 heteroaryl group comprising a furan heterocycle; and R1 is substituted or unsubstituted hydrocarbon group as provided herein, wherein the cation optionally comprises an acid-labile group, wherein Ar1 and R1 are optionally connected to each other via a single bond or one or more divalent linking groups to form a ring, and wherein the iodonium salt is optionally covalently bonded through Ar1 or substituent thereof as a pendant group to a polymer, the iodonium salt is optionally covalently bonded through R1 or substituent thereof as a pendant group to a polymer, or the iodonium salt is optionally covalently bonded through Z? as a pendant group to a polymer; and a solvent.
    Type: Application
    Filed: October 30, 2020
    Publication date: May 5, 2022
    Inventors: Tomas Marangoni, Emad Aqad, James W. Thackeray, James F. Cameron, Xisen Hou, ChoongBong Lee
  • Publication number: 20220091506
    Abstract: A photoresist composition comprises a first polymer comprising a first repeating unit comprising a hydroxy-aryl group and a second repeating unit comprising an acid-labile group, wherein the first polymer does not comprise a lactone group; a second polymer comprising a first repeating unit comprising a hydroxy-aryl group, a second repeating unit comprising an acid-labile group, and a third repeating unit comprising a lactone group; a photoacid generator; and a solvent.
    Type: Application
    Filed: August 31, 2021
    Publication date: March 24, 2022
    Inventors: Ke Yang, Emad Aqad, James F. Cameron, Suzanne M. Coley, Manibarsha Goswami, ChoongBong Lee, Bhooshan Popere, James W. Thackeray, Brandon Wenning
  • Publication number: 20220019143
    Abstract: A photoresist composition comprising: a first polymer comprising a first repeating unit comprising a hydroxy-aryl group and a second repeating unit comprising an acid-labile group; a second polymer comprising a first repeating unit comprising an acid-labile group, a second repeating unit comprising a lactone group, and a third repeating unit comprising a base-soluble group, wherein the base-soluble group has a pKa of less than or equal to 12, and wherein the base-soluble group does not comprise a hydroxy-substituted aryl group; a photoacid generator; and a solvent, wherein the first polymer and the second polymer are different from each other.
    Type: Application
    Filed: June 4, 2021
    Publication date: January 20, 2022
    Inventors: Emad Aqad, Brandon Wenning, Choong-Bong Lee, James W. Thackeray, Ke Yang, James F. Cameron
  • Publication number: 20210108065
    Abstract: A polymer comprising: a first repeating unit comprising a tertiary ester acid labile group; and a second repeating unit of Formula (1): wherein R1 to R5 are as provided herein; R2 and R3 together do not form a ring; each A is independently a halogen, a carboxylic acid or ester, a thiol, a straight chain or branched C1-20 alkyl, a monocyclic or polycyclic C3-20 cycloalkyl, a monocyclic or polycyclic C3-20 fluorocycloalkenyl, a monocyclic or polycyclic C3-20 heterocycloalkyl, a monocyclic or polycyclic C6-20 aryl, or a monocyclic or polycyclic C4-20 heteroaryl, each of which is substituted or unsubstituted; and m is an integer of 0 to 4.
    Type: Application
    Filed: October 15, 2019
    Publication date: April 15, 2021
    Inventors: Yang SONG, Jong Keun PARK, Emad AQAD, Mingqi LI, Colin LIU, James W. THACKERAY, Peter TREFONAS, III
  • Patent number: 10901316
    Abstract: A monomer having formula (I): wherein in formula (I), groups and variables are the same as described in the specification.
    Type: Grant
    Filed: November 12, 2019
    Date of Patent: January 26, 2021
    Assignee: ROHM AND HAAS ELECTRONIC MATERIALS LLC
    Inventors: Emad Aqad, James W. Thackeray, James F. Cameron
  • Patent number: 10831100
    Abstract: A photoacid generator compound having formula (I): wherein, in formula (I), groups and variables are the same as described in the specification.
    Type: Grant
    Filed: November 20, 2017
    Date of Patent: November 10, 2020
    Assignee: ROHM AND HAAS ELECTRONIC MATERIALS, LLC
    Inventors: Emad Aqad, James W. Thackeray
  • Publication number: 20200218149
    Abstract: A monomer having formula (I): wherein in formula (I), groups and variables are the same as described in the specification.
    Type: Application
    Filed: November 12, 2019
    Publication date: July 9, 2020
    Inventors: Emad Aqad, James W. Thackeray, James F. Cameron
  • Patent number: 10495968
    Abstract: A monomer having formula (I): wherein in formula (I), groups and variables are the same as described in the specification.
    Type: Grant
    Filed: June 15, 2017
    Date of Patent: December 3, 2019
    Assignee: ROHM AND HAAS ELECTRONIC MATERIALS LLC
    Inventors: Emad Aqad, James W. Thackeray, James F. Cameron
  • Publication number: 20190227433
    Abstract: Acid generator compounds are provided that are particularly useful as a photoresist composition component. In one preferred aspect, photoresists are provided that comprise (i) a polymer; (ii) a first onium salt acid generator that produces a first acid upon exposure of the photoresist composition to activating radiation; and (iii) a second onium salt acid generator that 1) comprises a covalently bound acid-labile moiety and 2) produces a second acid upon exposure of the photoresist composition to activating radiation, wherein the first acid and second acid have pKa values that differ by at least 0.5.
    Type: Application
    Filed: April 1, 2019
    Publication date: July 25, 2019
    Inventors: James W. Thackeray, Paul J. Labeaume, James F. Cameron
  • Publication number: 20190202955
    Abstract: New monomer and polymer materials that comprise one or more Te atoms. In one aspect, tellurium-containing monomers and polymers are provided that are useful for Extreme Ultraviolet Lithography.
    Type: Application
    Filed: December 31, 2018
    Publication date: July 4, 2019
    Inventors: Emad Aqad, James F. Cameron, James W. Thackeray
  • Publication number: 20190161509
    Abstract: New Te-zwitterion compounds are provided, including photoactive tellurium salt compounds useful for Extreme Ultraviolet Lithography.
    Type: Application
    Filed: November 29, 2018
    Publication date: May 30, 2019
    Inventors: Emad Aqad, James F. Cameron, James W. Thackeray
  • Publication number: 20190163058
    Abstract: New Te-salt compounds are provided, including photoactive tellurium salt compounds useful for Extreme Ultraviolet Lithography.
    Type: Application
    Filed: November 29, 2018
    Publication date: May 30, 2019
    Inventors: Emad Aqad, James F. Cameron, James W. Thackeray