Patents by Inventor James W. Thackeray

James W. Thackeray has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10365069
    Abstract: Firearm accessories and associated methods. A firearm accessory includes a mount for mounting the firearm accessory on a firearm. The mount can be adjustable to customize the mounting of the firearm accessory on the firearm. Electronic firearm accessories can include a longitudinally extending circuit structure having one or more electronic switches thereon facing laterally. A switch assembly can include a push member and a finger extending therefrom for actuating an associated electronic switch. Battery compartment features are also disclosed.
    Type: Grant
    Filed: March 30, 2018
    Date of Patent: July 30, 2019
    Assignee: Battenfeld Technologies, Inc.
    Inventors: James Tayon, Matthew Kinamore, James Gianladis, Michael Cottrell, Tim Kinney, Dennis W. Cauley, Jr., Mark Dalton, Justin Burke, Anthony Vesich, Erik S. Helland, Chad M. Thackeray, Yu King Wai
  • Publication number: 20190227433
    Abstract: Acid generator compounds are provided that are particularly useful as a photoresist composition component. In one preferred aspect, photoresists are provided that comprise (i) a polymer; (ii) a first onium salt acid generator that produces a first acid upon exposure of the photoresist composition to activating radiation; and (iii) a second onium salt acid generator that 1) comprises a covalently bound acid-labile moiety and 2) produces a second acid upon exposure of the photoresist composition to activating radiation, wherein the first acid and second acid have pKa values that differ by at least 0.5.
    Type: Application
    Filed: April 1, 2019
    Publication date: July 25, 2019
    Inventors: James W. Thackeray, Paul J. Labeaume, James F. Cameron
  • Publication number: 20190202955
    Abstract: New monomer and polymer materials that comprise one or more Te atoms. In one aspect, tellurium-containing monomers and polymers are provided that are useful for Extreme Ultraviolet Lithography.
    Type: Application
    Filed: December 31, 2018
    Publication date: July 4, 2019
    Inventors: Emad Aqad, James F. Cameron, James W. Thackeray
  • Publication number: 20190163055
    Abstract: New Te-salts are provided, including photoactive tellurium salt compounds useful for Extreme Ultraviolet Lithography.
    Type: Application
    Filed: November 29, 2018
    Publication date: May 30, 2019
    Applicant: Rohm and Haas Electronic Materials LLC
    Inventors: Emad Aqad, James F. Cameron, James W. Thackeray
  • Publication number: 20190161509
    Abstract: New Te-zwitterion compounds are provided, including photoactive tellurium salt compounds useful for Extreme Ultraviolet Lithography.
    Type: Application
    Filed: November 29, 2018
    Publication date: May 30, 2019
    Inventors: Emad Aqad, James F. Cameron, James W. Thackeray
  • Publication number: 20190163058
    Abstract: New Te-salt compounds are provided, including photoactive tellurium salt compounds useful for Extreme Ultraviolet Lithography.
    Type: Application
    Filed: November 29, 2018
    Publication date: May 30, 2019
    Inventors: Emad Aqad, James F. Cameron, James W. Thackeray
  • Publication number: 20190155152
    Abstract: A photoacid generator compound having formula (I): wherein, in formula (I), groups and variables are the same as described in the specification.
    Type: Application
    Filed: November 20, 2017
    Publication date: May 23, 2019
    Inventors: Emad Aqad, James W. Thackeray
  • Patent number: 10248020
    Abstract: Acid generator compounds are provided that are particularly useful as a photoresist composition component. In one preferred aspect, photoresists are provided that comprise (i) a polymer; (ii) a first onium salt acid generator that produces a first acid upon exposure of the photoresist composition to activating radiation; and (iii) a second onium salt acid generator that 1) comprises a covalently bound acid-labile moiety and 2) produces a second acid upon exposure of the photoresist composition to activating radiation, wherein the first acid and second acid have pKa values that differ by at least 0.5.
    Type: Grant
    Filed: December 28, 2012
    Date of Patent: April 2, 2019
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: James W. Thackeray, Paul J. LaBeaume, James F. Cameron
  • Publication number: 20180362752
    Abstract: A monomer having formula (I): wherein in formula (I), groups and variables are the same as described in the specification.
    Type: Application
    Filed: June 15, 2017
    Publication date: December 20, 2018
    Inventors: Emad Aqad, James W. Thackeray, James F. Cameron
  • Patent number: 10095109
    Abstract: A monomer having formula (I): wherein in formula (I), groups and variables are the same as described in the specification.
    Type: Grant
    Filed: March 31, 2017
    Date of Patent: October 9, 2018
    Assignee: ROHM AND HAAS ELECTRONIC MATERIALS LLC
    Inventors: Emad Aqad, James W. Thackeray
  • Publication number: 20180284605
    Abstract: A monomer having formula (I): wherein in formula (I), groups and variables are the same as described in the specification.
    Type: Application
    Filed: March 31, 2017
    Publication date: October 4, 2018
    Inventors: Emad Aqad, James W. Thackeray
  • Patent number: 10078261
    Abstract: Disclosed herein is a graft block copolymer comprising a first block polymer; the first block polymer comprising a backbone polymer and a first graft polymer; where the first graft polymer comprises a surface energy reducing moiety that comprises a halocarbon moiety, a silicon containing moiety, or a combination of a halocarbon moiety and a silicon containing moiety; a second block polymer; the second block polymer being covalently bonded to the first block; wherein the second block comprises the backbone polymer and a second graft polymer; where the second graft polymer comprises a functional group that is operative to undergo acid-catalyzed deprotection causing a change of solubility of the graft block copolymer in a developer solvent.
    Type: Grant
    Filed: September 6, 2013
    Date of Patent: September 18, 2018
    Assignees: ROHM AND HAAS ELECTRONIC MATERIALS LLC, THE TEXAS A&M UNIVERSITY SYSTEM
    Inventors: Sangho Cho, Guorong Sun, Karen L. Wooley, James W. Thackeray, Peter Trefonas, III
  • Publication number: 20180252645
    Abstract: A copolymer is prepared by the polymerization of monomers that include an ultraviolet absorbing monomer, and a base-solubility-enhancing monomer. The copolymer is useful for forming a topcoat layer for electron beam and extreme ultraviolet lithographies. Also described are a layered article including the topcoat layer, and an associated method of forming an electronic device.
    Type: Application
    Filed: March 27, 2018
    Publication date: September 6, 2018
    Inventors: James W. Thackeray, Ke Du, Peter Trefonas, III, Idriss Blakey, Andrew Keith Whittaker
  • Patent number: 9983477
    Abstract: The invention relates to new polymers that comprise units that contain one or more photoacid generator groups and photoresists that contain the polymers. Preferred polymers of the invention are suitable for use in photoresists imaged at short wavelengths such as sub-250 nm or sub-200 nm, particularly 248 nm and 193 nm.
    Type: Grant
    Filed: November 22, 2010
    Date of Patent: May 29, 2018
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: James W. Thackeray, Roger A. Nassar
  • Patent number: 9957339
    Abstract: A copolymer is prepared by the polymerization of monomers that include an ultraviolet absorbing monomer, and a base-solubility-enhancing monomer. The copolymer is useful for forming a topcoat layer for electron beam and extreme ultraviolet lithographies. Also described are a layered article including the topcoat layer, and an associated method of forming an electronic device.
    Type: Grant
    Filed: August 7, 2015
    Date of Patent: May 1, 2018
    Assignees: ROHM AND HAAS ELECTRONIC MATERIALS LLC, THE UNIVERSITY OF QUEENSLAND
    Inventors: James W. Thackeray, Ke Du, Peter Trefonas, III, Idriss Blakey, Andrew Keith Whittaker
  • Patent number: 9815930
    Abstract: A block copolymer useful in electron beam and extreme ultraviolet photolithography includes a first block with units derived from a base-solubility-enhancing monomer and an out-of-band absorbing monomer, and a second block having a low surface energy. Repeat units derived from the out-of-ban absorbing monomer allow the copolymer to absorb significantly in the wavelength range 150 to 400 nanometers. When incorporated into a photoresist composition with a photoresist random polymer, the block copolymer self-segregates to form a top layer that effectively screens out-of-band radiation.
    Type: Grant
    Filed: August 7, 2015
    Date of Patent: November 14, 2017
    Assignees: ROHM AND HAAS ELECTRONIC MATERIALS LLC, THE UNIVERSITY OF QUEENSLAND
    Inventors: James W. Thackeray, Ke Du, Peter Trefonas, III, Idriss Blakey, Andrew Keith Whittaker
  • Publication number: 20170261853
    Abstract: A composite, which is a blend comprising: a nanoparticle comprising a core and a coating surrounding the core; and a polymer, wherein the coating of the nanoparticle comprises a ligand, wherein the ligand is a substituted or unsubstituted C1-C16 carboxylic acid or a salt thereof, a substituted or unsubstituted C1-C16 amino acid or a salt thereof, a substituted or unsubstituted C1-C16 dialkyl phosphonate, or a combination thereof; and wherein the polymer is a polymerization product of a photoacid generator comprising a polymerizable group; at least one unsaturated monomer, which is different from the photoacid generator comprising a polymerizable group; and a chain transfer agent of formula (I); wherein: Z is a y valent C1-20 organic group, x is 0 or 1, and Rd is a substituted or unsubstituted C1-20 alkyl, C3-20 cycloalkyl, C6-20 aryl, or C7-20 aralkyl.
    Type: Application
    Filed: May 25, 2017
    Publication date: September 14, 2017
    Inventors: James W. Thackeray, Meiliana Siauw, Peter Trefonas, III, Idriss Blakey, Andrew Keith Whittaker
  • Publication number: 20170248844
    Abstract: A monomer has the structure wherein R is an organic group comprising a polymerizable carbon-carbon double bond or carbon-carbon triple bond; X and Y are independently at each occurrence hydrogen or a non-hydrogen substituent; EWG1 and EWG2 are independently at each occurrence an electron-withdrawing group; p is 0, 1, 2, 3, or 4; n is 1, 2, 3, or 4; and M+ is an organic cation. A polymer prepared from monomer is useful as a component of a photoresist composition.
    Type: Application
    Filed: April 18, 2016
    Publication date: August 31, 2017
    Inventors: Emad Aqad, James W. Thackeray, James F. Cameron
  • Patent number: 9696624
    Abstract: A composite, which is a blend comprising: a nanoparticle comprising a core and a coating surrounding the core; and a polymer, wherein the coating of the nanoparticle comprises a ligand, wherein the ligand is a substituted or unsubstituted C1-C16 carboxylic acid or a salt thereof, a substituted or unsubstituted C1-C16 amino acid or a salt thereof, a substituted or unsubstituted C1-C16 dialkyl phosphonate, or a combination thereof; and wherein the polymer is a polymerization product of a photoacid generator comprising a polymerizable group; at least one unsaturated monomer, which is different from the photoacid generator comprising a polymerizable group; and a chain transfer agent of formula (I); wherein: Z is a y valent C1-20 organic group, x is 0 or 1, and Rd is a substituted or unsubstituted C1-20 alkyl, C3-20 cycloalkyl, C6-20 aryl, or C7-20 aralkyl.
    Type: Grant
    Filed: July 29, 2015
    Date of Patent: July 4, 2017
    Assignees: ROHM AND HAAS ELECTRONIC MATERIALS LLC, THE UNIVERSITY OF QUEENSLAND
    Inventors: James W. Thackeray, Meiliana Siauw, Peter Trefonas, III, Idriss Blakey, Andrew Keith Whittaker
  • Patent number: 9606434
    Abstract: A polymer includes repeat units, most of which are photoacid-generating repeat units. Each of the photoacid-generating repeat units includes photoacid-generating functionality and base-solubility-enhancing functionality. Each of the photoacid-generating repeat units comprises an anion and a photoacid-generating cation that collectively have structure (I) wherein q, r, R1, m, X, and Z? are defined herein. The polymer is useful as a component of a photoresist composition that further includes a second polymer that exhibits a change in solubility in an alkali developer under action of acid.
    Type: Grant
    Filed: August 24, 2015
    Date of Patent: March 28, 2017
    Assignee: ROHM AND HAAS ELECTRONIC MATERIALS, LLC
    Inventors: Paul J. LaBeaume, Vipul Jain, James W. Thackeray, James F. Cameron, Suzanne M. Coley, Amy M. Kwok, David A. Valeri