Patents by Inventor James Williams, III
James Williams, III has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 12155673Abstract: A system including a deep learning processor obtains response data of at least two data types from a set of process stations performing operations as part of a manufacturing process. The system analyzes factory operation and control data to generate expected behavioral pattern data. Further, the system uses the response data to generate actual behavior pattern data for the process stations. Based on an analysis of the actual behavior pattern data in relation to the expected behavioral pattern data, the system determines whether anomalous activity has occurred as a result of the manufacturing process. If it is determined that anomalous activity has occurred, the system provides an indication of this anomalous activity.Type: GrantFiled: June 23, 2021Date of Patent: November 26, 2024Assignee: Nanotronics Imaging, Inc.Inventors: Matthew C. Putman, John B. Putman, Vadim Pinskiy, Damas Limoge, Andrew Sundstrom, James Williams, III
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Patent number: 12120131Abstract: A system including a deep learning processor obtains response data of at least two data types from a set of process stations performing operations as part of a manufacturing process. The system analyzes factory operation and control data to generate expected behavioral pattern data. Further, the system uses the response data to generate actual behavior pattern data for the process stations. Based on an analysis of the actual behavior pattern data in relation to the expected behavioral pattern data, the system determines whether anomalous activity has occurred as a result of the manufacturing process. If it is determined that anomalous activity has occurred, the system provides an indication of this anomalous activity.Type: GrantFiled: June 23, 2021Date of Patent: October 15, 2024Assignee: Nanotronics Imaging, Inc.Inventors: Matthew C. Putman, John B. Putman, Vadim Pinskiy, Damas Limoge, Andrew Sundstrom, James Williams, III
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Patent number: 12111922Abstract: A controller emulator, coupled to an interface that exposes the controller emulator to inputs from external sources, provides one or more control signals to a process simulator and a deep learning process. In response, the process simulator simulates response data that is provided to the deep learning processor. The deep learning processor generates expected response data and expected behavioral pattern data for the one or more control signals, as well as actual behavioral pattern data for the simulated response data. A comparison of at least one of the simulated response data to the expected response data and the actual behavioral pattern data to the expected behavioral pattern data is performed to determine whether anomalous activity is detected. As a result of detecting anomalous activity, one or more operations are performed to address the anomalous activity.Type: GrantFiled: May 26, 2023Date of Patent: October 8, 2024Assignee: Nanotronics Imaging, Inc.Inventors: Matthew C. Putman, John B. Putman, Vadim Pinskiy, Andrew Sundstrom, James Williams, III
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Patent number: 12111923Abstract: A system including a deep learning processor receives one or more control signals from one or more of a factory's process, equipment and control (P/E/C) systems during a manufacturing process. The processor generates expected response data and expected behavioral pattern data for the control signals. The processor receives production response data from the one or more of the factory's P/E/C systems and generates production behavioral pattern data for the production response data. The process compares at least one of: the production response data to the expected response data, and the production behavioral pattern data to the expected behavioral pattern data to detect anomalous activity. As a result of detecting anomalous activity, the processor performs one or more operations to provide notice or cause one or more of the factory's P/E/C systems to address the anomalous activity.Type: GrantFiled: June 28, 2023Date of Patent: October 8, 2024Assignee: Nanotronics Imaging, Inc.Inventors: Matthew C. Putman, John B. Putman, Vadim Pinskiy, Damas Limoge, Andrew Sundstrom, James Williams, III
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Patent number: 12072972Abstract: A system including a deep learning processor receives one or more control signals from one or more of a factory's process, equipment and control (P/E/C) systems during a manufacturing process. The processor generates expected response data and expected behavioral pattern data for the control signals. The processor receives production response data from the one or more of the factory's P/E/C systems and generates production behavioral pattern data for the production response data. The process compares at least one of: the production response data to the expected response data, and the production behavioral pattern data to the expected behavioral pattern data to detect anomalous activity. As a result of detecting anomalous activity, the processor performs one or more operations to provide notice or cause one or more of the factory's P/E/C systems to address the anomalous activity.Type: GrantFiled: June 28, 2023Date of Patent: August 27, 2024Assignee: Nanotronics Imaging, Inc.Inventors: Matthew C. Putman, John B. Putman, Vadim Pinskiy, Damas Limoge, Andrew Sundstrom, James Williams, III
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Patent number: 12034742Abstract: A system including a deep learning processor obtains response data of at least two data types from a set of process stations performing operations as part of a manufacturing process. The system analyzes factory operation and control data to generate expected behavioral pattern data. Further, the system uses the response data to generate actual behavior pattern data for the process stations. Based on an analysis of the actual behavior pattern data in relation to the expected behavioral pattern data, the system determines whether anomalous activity has occurred as a result of the manufacturing process. If it is determined that anomalous activity has occurred, the system provides an indication of this anomalous activity.Type: GrantFiled: June 23, 2021Date of Patent: July 9, 2024Assignee: Nanotronics Imaging, Inc.Inventors: Matthew C. Putman, John B. Putman, Vadim Pinskiy, Damas Limoge, Andrew Sundstrom, James Williams, III
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Patent number: 12026251Abstract: A system including a deep learning processor receives one or more control signals from one or more of a factory's process, equipment and control (P/E/C) systems during a manufacturing process. The processor generates expected response data and expected behavioral pattern data for the control signals. The processor receives production response data from the one or more of the factory's P/E/C systems and generates production behavioral pattern data for the production response data. The process compares at least one of: the production response data to the expected response data, and the production behavioral pattern data to the expected behavioral pattern data to detect anomalous activity. As a result of detecting anomalous activity, the processor performs one or more operations to provide notice or cause one or more of the factory's P/E/C systems to address the anomalous activity.Type: GrantFiled: June 28, 2023Date of Patent: July 2, 2024Assignee: Nanotronics Imaging, Inc.Inventors: Matthew C. Putman, John B. Putman, Vadim Pinskiy, Damas Limoge, Andrew Sundstrom, James Williams, III
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Patent number: 11989288Abstract: A system including a deep learning processor receives one or more control signals from one or more of a factory's process, equipment and control (P/E/C) systems during a manufacturing process. The processor generates expected response data and expected behavioral pattern data for the control signals. The processor receives production response data from the one or more of the factory's P/E/C systems and generates production behavioral pattern data for the production response data. The process compares at least one of: the production response data to the expected response data, and the production behavioral pattern data to the expected behavioral pattern data to detect anomalous activity. As a result of detecting anomalous activity, the processor performs one or more operations to provide notice or cause one or more of the factory's P/E/C systems to address the anomalous activity.Type: GrantFiled: June 28, 2023Date of Patent: May 21, 2024Assignee: Nanotronics Imaging, Inc.Inventors: Matthew C. Putman, John B. Putman, Vadim Pinskiy, Damas Limoge, Andrew Sundstrom, James Williams, III
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Publication number: 20230359730Abstract: A system including a deep learning processor receives one or more control signals from one or more of a factory's process, equipment and control (P/E/C) systems during a manufacturing process. The processor generates expected response data and expected behavioral pattern data for the control signals. The processor receives production response data from the one or more of the factory's P/E/C systems and generates production behavioral pattern data for the production response data. The process compares at least one of: the production response data to the expected response data, and the production behavioral pattern data to the expected behavioral pattern data to detect anomalous activity. As a result of detecting anomalous activity, the processor performs one or more operations to provide notice or cause one or more of the factory's P/E/C systems to address the anomalous activity.Type: ApplicationFiled: June 28, 2023Publication date: November 9, 2023Applicant: Nanotronics Imaging, Inc.Inventors: Matthew C. Putman, John B. Putman, Vadim Pinskiy, Damas Limoge, Andrew Sundstrom, James Williams, III
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Publication number: 20230297668Abstract: A controller emulator, coupled to an interface that exposes the controller emulator to inputs from external sources, provides one or more control signals to a process simulator and a deep learning process. In response, the process simulator simulates response data that is provided to the deep learning processor. The deep learning processor generates expected response data and expected behavioral pattern data for the one or more control signals, as well as actual behavioral pattern data for the simulated response data. A comparison of at least one of the simulated response data to the expected response data and the actual behavioral pattern data to the expected behavioral pattern data is performed to determine whether anomalous activity is detected. As a result of detecting anomalous activity, one or more operations are performed to address the anomalous activity.Type: ApplicationFiled: May 26, 2023Publication date: September 21, 2023Applicant: Nanotronics Imaging, Inc.Inventors: Matthew C. Putman, John B. Putman, Vadim Pinskiy, Andrew Sundstrom, James Williams, III
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Patent number: 11693956Abstract: A system including a deep learning processor receives one or more control signals from one or more of a factory's process, equipment and control (P/E/C) systems during a manufacturing process. The processor generates expected response data and expected behavioral pattern data for the control signals. The processor receives production response data from the one or more of the factory's P/E/C systems and generates production behavioral pattern data for the production response data. The process compares at least one of: the production response data to the expected response data, and the production behavioral pattern data to the expected behavioral pattern data to detect anomalous activity. As a result of detecting anomalous activity, the processor performs one or more operations to provide notice or cause one or more of the factory's P/E/C systems to address the anomalous activity.Type: GrantFiled: August 23, 2021Date of Patent: July 4, 2023Assignee: Nanotronics Imaging, Inc.Inventors: Matthew C. Putman, John B. Putman, Vadim Pinskiy, Damas Limoge, Andrew Sundstrom, James Williams, III
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Patent number: 11663327Abstract: A controller emulator, coupled to an interface that exposes the controller emulator to inputs from external sources, provides one or more control signals to a process simulator and a deep learning process. In response, the process simulator simulates response data that is provided to the deep learning processor. The deep learning processor generates expected response data and expected behavioral pattern data for the one or more control signals, as well as actual behavioral pattern data for the simulated response data. A comparison of at least one of the simulated response data to the expected response data and the actual behavioral pattern data to the expected behavioral pattern data is performed to determine whether anomalous activity is detected. As a result of detecting anomalous activity, one or more operations are performed to address the anomalous activity.Type: GrantFiled: August 6, 2021Date of Patent: May 30, 2023Assignee: Nanotronics Imaging, Inc.Inventors: Matthew C. Putman, John B. Putman, Vadim Pinskiy, Andrew Sundstrom, James Williams, III
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Publication number: 20210387421Abstract: Additive manufacturing systems using artificial intelligence can identify an anomaly in a printed layer of an object from a generated topographical image of the printed layer. The additive manufacturing systems can also use artificial intelligence to determine a correlation between the identified anomaly and one or more print parameters, and adaptively adjust one or more print parameters. The additive manufacturing systems can also use artificial intelligence to optimize one or more printing parameters to achieve desired mechanical, optical and/or electrical properties.Type: ApplicationFiled: August 23, 2021Publication date: December 16, 2021Applicant: Nanotronics Imaging, Inc.Inventors: Matthew C. Putman, Vadim Pinskiy, James Williams, III, Damas Limoge, Aswin Raghav Nirmaleswaran, Mario Chris
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Publication number: 20210382990Abstract: A system including a deep learning processor receives one or more control signals from one or more of a factory's process, equipment and control (P/E/C) systems during a manufacturing process. The processor generates expected response data and expected behavioral pattern data for the control signals. The processor receives production response data from the one or more of the factory's P/E/C systems and generates production behavioral pattern data for the production response data. The process compares at least one of: the production response data to the expected response data, and the production behavioral pattern data to the expected behavioral pattern data to detect anomalous activity. As a result of detecting anomalous activity, the processor performs one or more operations to provide notice or cause one or more of the factory's P/E/C systems to address the anomalous activity.Type: ApplicationFiled: August 23, 2021Publication date: December 9, 2021Applicant: Nanotronics Imaging, Inc.Inventors: Matthew C. Putman, John B. Putman, Vadim Pinskiy, Damas Limoge, Andrew Sundstrom, James Williams, III
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Publication number: 20210365549Abstract: A controller emulator, coupled to an interface that exposes the controller emulator to inputs from external sources, provides one or more control signals to a process simulator and a deep learning process. In response, the process simulator simulates response data that is provided to the deep learning processor. The deep learning processor generates expected response data and expected behavioral pattern data for the one or more control signals, as well as actual behavioral pattern data for the simulated response data. A comparison of at least one of the simulated response data to the expected response data and the actual behavioral pattern data to the expected behavioral pattern data is performed to determine whether anomalous activity is detected. As a result of detecting anomalous activity, one or more operations are performed to address the anomalous activity.Type: ApplicationFiled: August 6, 2021Publication date: November 25, 2021Applicant: Nanotronics Imaging, Inc.Inventors: Matthew C. Putman, John B. Putman, Vadim Pinskiy, Andrew Sundstrom, James Williams, III
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Publication number: 20210320931Abstract: A system including a deep learning processor obtains response data of at least two data types from a set of process stations performing operations as part of a manufacturing process. The system analyzes factory operation and control data to generate expected behavioral pattern data. Further, the system uses the response data to generate actual behavior pattern data for the process stations. Based on an analysis of the actual behavior pattern data in relation to the expected behavioral pattern data, the system determines whether anomalous activity has occurred as a result of the manufacturing process. If it is determined that anomalous activity has occurred, the system provides an indication of this anomalous activity.Type: ApplicationFiled: June 23, 2021Publication date: October 14, 2021Applicant: Nanotronics Imaging, Inc.Inventors: Matthew C. Putman, John B. Putman, Vadim Pinskiy, Damas Limoge, Andrew Sundstrom, James Williams, III
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Publication number: 20210271753Abstract: A controller emulator, coupled to an interface that exposes the controller emulator to inputs from external sources, provides one or more control signals to a process simulator and a deep learning process. In response, the process simulator simulates response data that is provided to the deep learning processor. The deep learning processor generates expected response data and expected behavioral pattern data for the one or more control signals, as well as actual behavioral pattern data for the simulated response data. A comparison of at least one of the simulated response data to the expected response data and the actual behavioral pattern data to the expected behavioral pattern data is performed to determine whether anomalous activity is detected. As a result of detecting anomalous activity, one or more operations are performed to address the anomalous activity.Type: ApplicationFiled: June 12, 2020Publication date: September 2, 2021Inventors: Matthew C. Putman, John B. Putman, Vadim Pinskiy, Andrew Sundstrom, James Williams, III
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Patent number: 11100221Abstract: A system including a deep learning processor receives one or more control signals from one or more of a factory's process, equipment and control (P/E/C) systems during a manufacturing process. The processor generates expected response data and expected behavioral pattern data for the control signals. The processor receives production response data from the one or more of the factory's P/E/C systems and generates production behavioral pattern data for the production response data. The process compares at least one of: the production response data to the expected response data, and the production behavioral pattern data to the expected behavioral pattern data to detect anomalous activity. As a result of detecting anomalous activity, the processor performs one or more operations to provide notice or cause one or more of the factory's P/E/C systems to address the anomalous activity.Type: GrantFiled: June 18, 2020Date of Patent: August 24, 2021Assignee: Nanotronics Imaging, Inc.Inventors: Matthew C. Putman, John B. Putman, Vadim Pinskiy, Damas Limoge, Andrew Sundstrom, James Williams, III
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Patent number: 11097490Abstract: Additive manufacturing systems using artificial intelligence can identify an anomaly in a printed layer of an object from a generated topographical image of the printed layer. The additive manufacturing systems can also use artificial intelligence to determine a correlation between the identified anomaly and one or more print parameters, and adaptively adjust one or more print parameters. The additive manufacturing systems can also use artificial intelligence to optimize one or more printing parameters to achieve desired mechanical, optical and/or electrical properties.Type: GrantFiled: December 20, 2019Date of Patent: August 24, 2021Assignee: Nanotronics Imaging, Inc.Inventors: Matthew C. Putman, Vadim Pinskiy, James Williams, III, Damas Limoge, Aswin Raghav Nirmaleswaran, Mario Chris
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Patent number: 11086988Abstract: A controller emulator, coupled to an interface that exposes the controller emulator to inputs from external sources, provides one or more control signals to a process simulator and a deep learning process. In response, the process simulator simulates response data that is provided to the deep learning processor. The deep learning processor generates expected response data and expected behavioral pattern data for the one or more control signals, as well as actual behavioral pattern data for the simulated response data. A comparison of at least one of the simulated response data to the expected response data and the actual behavioral pattern data to the expected behavioral pattern data is performed to determine whether anomalous activity is detected. As a result of detecting anomalous activity, one or more operations are performed to address the anomalous activity.Type: GrantFiled: June 12, 2020Date of Patent: August 10, 2021Assignee: Nanotronics Imaging, Inc.Inventors: Matthew C. Putman, John B. Putman, Vadim Pinskiy, Andrew Sundstrom, James Williams, III