Patents by Inventor Jamila BOUDADEN

Jamila BOUDADEN has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • CO2 sensor and method for manufacturing same
    Patent number: 11435308
    Abstract: A sensor device for sensing CO2 comprises a hybrid sensing material and a transducer. The hybrid sensing material comprises at least amines and nanoparticles, wherein the hybrid sensing material has a property and is configured to change the property dependent on a current CO2 concentration in the surrounding. The transducer is configured to output an electrical sensor signal dependent on the property of the hybrid sensing material.
    Type: Grant
    Filed: August 2, 2018
    Date of Patent: September 6, 2022
    Assignee: Fraunhofer-Gesellschaft zur Foerderung der angewandten Forschung e.V.
    Inventors: Jamila Boudaden, Benjamin Gruber
  • Process for etching, and chamber cleaning and a gas therefor
    Patent number: 11149347
    Abstract: The present invention relates to a process for cleaning chambers of apparatus used for semiconductor manufacturing with a gas mixture comprising or consisting of fluorine, nitrogen and argon as well as said gas mixtures.
    Type: Grant
    Filed: May 4, 2016
    Date of Patent: October 19, 2021
    Assignees: Solvay SA, FRAUNHOFER-GESELLSCHAFT ZUR FÖRDERUNG DER ANGEW ANDTEN FORSCHUNG E.V.
    Inventors: Michael Pittroff, Robert Wieland, Jamila Boudaden
  • CO2 Sensor and Method for Manufacturing Same
    Publication number: 20180372662
    Abstract: A sensor device for sensing CO2 comprises a hybrid sensing material and a transducer. The hybrid sensing material comprises at least amines and nanoparticles, wherein the hybrid sensing material has a property and is configured to change the property dependent on a current CO2 concentration in the surrounding. The transducer is configured to output an electrical sensor signal dependent on the property of the hybrid sensing material.
    Type: Application
    Filed: August 2, 2018
    Publication date: December 27, 2018
    Inventors: Jamila BOUDADEN, Benjamin GRUBER
  • PROCESS FOR ETCHING, AND CHAMBER CLEANING AND A GAS THEREFOR
    Publication number: 20180163300
    Abstract: The present invention relates to a process for cleaning chambers of apparatus used for semiconductor manufacturing with a gas mixture comprising or consisting of fluorine, nitrogen and argon as well as said gas mixtures.
    Type: Application
    Filed: May 4, 2016
    Publication date: June 14, 2018
    Inventors: Michael PITTROFF, Robert WIELAND, Jamila BOUDADEN