Abstract: A method is provided for subtractively processing a layer of etchable material formed over an electrically conductive surface region of a workpiece. The workpiece is immersed in a liquid solution, generally but not exclusively a conductive solution, that comprises an etchant for the etchable material, so that etching of the etchable material is initiated. An electric circuit is connected to include a control electrode, a reference electrode, and the electrically conductive surface region of the workpiece. The electric circuit is used to monitor the development process dynamically at each of a plurality of intervals during the etching. The etching is terminated when the electrochemical signal satisfies a criterion indicating that the etching is complete.

Abstract: A magnetoelastically actuated device includes a microscale cantilever arm supported at a standoff distance from a substrate. The cantilever arm is formed as a laminar magnetic actuator configured to bend when it is subjected to a magnetic field. The cantilever arm includes a film of magnetostrictive material. Also provided is a method for fabricating the magnetoelastically actuated device. The method includes defining an actuator mold in a layer of photoresist on a structural layer of the cantilever arm and electrodepositing a layer of a magnetostrictive alloy containing cobalt and iron onto the structural layer within the actuator mold.

Abstract: A microfabricated magnetic resonator is provided. The microfabricated magnetic resonator has one or more resonator portions, each of which is a magnetoelastic resonating structure having a maximum circumference or maximum linear dimension in at least one direction that is less than 1000 ?m. At least one of the resonator portions comprises an electrodeposited material comprising at least a cobalt constituent and an iron constituent.

Abstract: A microfabricated magnetic resonator is provided. The microfabricated magnetic resonator has one or more resonator portions, each of which is a magnetoelastic resonating structure having a maximum circumference or maximum linear dimension in at least one direction that is less than 1000 ?m. At least one of the resonator portions comprises an electrodeposited material comprising at least a cobalt constituent and an iron constituent.

Abstract: The present invention relates to magnetoelastic resonators, sensors, and tunable devices, as well as methods for making such components. The resonators can be used as tags and/or sensors. In general, the resonators include one or more micron-sized resonator portions affixed on a substrate. For use as a tag, each tag includes a plurality of resonator portions that allow for multiplexed coding, and methods for making tags and arrays of such tags include use of electrodeposition processes. In particular embodiments, these components include an electrodeposited material that exhibits magnetostrictive properties.

Abstract: The present invention relates to magnetoelastic resonators, sensors, and tunable devices, as well as methods for making such components. The resonators can be used as tags and/or sensors. In general, the resonators include one or more micron-sized resonator portions affixed on a substrate. For use as a tag, each tag includes a plurality of resonator portions that allow for multiplexed coding, and methods for making tags and arrays of such tags include use of electrodeposition processes. In particular embodiments, these components include an electrodeposited material that exhibits magnetostrictive properties.